192 results about "Low exposure" patented technology

This invention relates to a process for regulating the exposure time of a light sensor, characterized in that it comprises the following steps:

• • a) setting the exposure time of the sensor to a value selected in a first range of M prefixed values defined between a minimum and a maximum value;
  • b) acquiring an image of an object on the sensor, such image comprising a plurality of luminous pixels;
  • c) analyzing the acquired image in order to detect its level of luminosity;
  • d) comparing the detected level of luminosity with a prefixed higher (lower) global threshold level representative of a condition of overexposure (under-exposure) of the image;
  • e) varying the exposure time of the sensor and iteratively repeating the previous steps until an optimum exposure time equal to the highest (lowest) exposure time is found, amongst the ones set, for which the image presents a level of luminosity which is smaller (greater) than the prefixed higher (lower) global threshold level.

The invention relates to a grinding tool, in particular to a brazing-hot pressing diamond tool. The diamond tool consists of a steel matrix and a diamond tool bit, wherein the diamond tool bit consists of a plurality of alloy layers which are vertical to a working surface of the tool bit; the alloy layers are prepared from two alloy matrixes with different formulas by a vacuum hot pressing method; a prearranged diamond abrasive particle layer is arranged inside each alloy matrix layer; outer layers on two sides of the tool bit are brazing alloy matrix layers (1); a single-layer prearranged diamond abrasive particle layer is arranged inside each brazing alloy matrix layer (1); an intermediate layer of the tool bit is a pre-alloying matrix layer (2); and a single-layer or multi-layer prearranged diamond abrasive particle layer is arranged inside the pre-alloying matrix layer (2). The brazing-hot pressing diamond tool solves the problem that a multi-layer brazing tool is covered by a thick solder layer so as to cause low exposure effect and also solves the problem that a sintered diamond tool is insufficient in diamond holding force so as to make the diamond fall off too early. Therefore, the service life of the diamond tool is greatly prolonged and the processing efficiency thereof is greatly improved.

The invention discloses an adaptive camera exposure time adjustment device and a method. the method comprises steps: an exposure time grade sequence value and a unit time are preset; detection and data processing are carried out on an image photographed by the camera via an optical flow detection and processing system, and an exposure time grade which needs to be adjusted higher, an exposure time grade which needs to be adjusted lower and an exposure time which needs to be kept unchanged are judged and obtained; the optical flow detection and processing system sends an instruction for adjusting the exposure time grade higher or adjusting the exposure time grade lower, and an adjustment control module receives the instruction and adjusts the exposure time of the camera according to the instruction. According to the scheme of the invention, during a process during which the camera moves at a high speed along with an unmanned aerial vehicle, the exposure time of the camera can be adjusted adaptively in real time, and the number and the quality of the photographed images can be ensured.

The invention discloses a single image enhancement method based on a full convolution neural network. Firstly by considering that the lost information of a single exposure image can be described by amulti-exposure sequence, a low-exposure image and a high-exposure image different from the input image exposure are generated by using the constructed predictive exposure network, so as to construct amulti-exposure sequence. Secondly, in order to avoid the problem of low robustness caused by manual feature extraction, the exposure fusion network is used to complete feature extraction, feature fusion and image reconstruction. Finally, by considering that the deconvolution layer in the predictive exposure network will cause the chessboard artifacts, the structure anisotropy loss related to human perception is used to train the predictive exposure network to alleviate the artifacts. The invention has the advantages that the whole contrast of the image can be improved, and certain informationof the underexposed and over-exposed regions of the image can be recovered.

A method for regulating an image quality control parameter of an optical indicator comprises the steps of: establishing five pixel value distributing regions of an underexposure region, a low exposure region, a normal exposure region, a high exposure region and an overexposure region according to the image pixel value from small to large; obtaining a frame image of the surface by an image sensor of the indicator; calculating the pixel value of each pixel point of the frame image; counting the numbers of the pixel points of the image on each exposure region; retaining the prior image quality control parameter if the number of the pixel points in the normal exposure region exceeds a first limit value; regulating the exposure time of the light source according to the relationship of the numbers of pixel points in the high exposure region and the low exposure region if the amount of pixel points in the normal exposure region fails to exceed the first limit value, while the sum of the numbers of the pixel points in the normal exposure region, the high exposure region and the low exposure region exceeds the second limit value; and vice versa, regulating the image quality control parameter by a second method.

The invention discloses a photosensitive resin composition. The photosensitive resin composition comprises ultraviolet photosensitive prepolymer resin, an active diluent monomer, an oxime ether photoinitiator represented by the formula (I), and a colouring agent. The photosensitive resin composition has the good exposure sensibility and developing property; on the premise of low amount of a light-screening agent, or low exposure amount, a cured pattern is complete, clear to develop and high in resolution ratio; the adaptation between the cured pattern and a substrate is excellent; and the photosensitive resin composition has very good application prospects in the aspects of optical colour filters, light spacers, rib barriers and the like.

An image processing device include: an image obtaining unit for obtaining a plurality of images having different exposure values; an exposure adjustment unit for carrying out exposure adjustment processing by applying bit extension to each of the images and adjusting exposure values of the images to an exposure value of a first image, which has the lowest exposure value, of the images; and a composition unit for generating a composite image by combining the images subjected to the exposure adjustment processing.

The invention discloses a low-complexity and high-efficiency synthesis method for a high-dynamic digital image. The method comprises the steps of acquiring a high-exposure image and a low-exposure image, obtaining corresponding YCbCr components, working out the gradient values of the three components of the bright image and the gradient values of the three components of the dark image, comparing the gradient values of the same components of the two images to obtain the difference, obtaining the weight coefficient of the bright image and the weight coefficient of the dark image, and multiplying the weights by the weight of an original image to synthesize the high-dynamic image. The method has the advantages of being applied to high-dynamic implementation of hardware and increasing the processing speed on the premise of guaranteeing the high-dynamic effect.

A temporary adhesive material for a wafer includes a first temporary adhesive layer of a silicone-containing polymer layer containing a photo base generator and a second temporary adhesive layer of a silicone-containing polymer layer which is laminated on the first temporary adhesive layer, does not contain the photo base generator, and is different from the polymer layer. Thereby, there can be formed a temporary adhesive layer having high thickness uniformity, even on a wafer having a step. Because of the thickness uniformity, a thin wafer having a uniform thickness of 50 μm or less can be easily obtained. When a thin wafer is produced and then delaminated from a support, the wafer can be delaminated from the support by exposure at a low exposure dose without stress. Therefore, a brittle thin wafer can be easily handled without causing damage, and a thin wafer can be easily produced.

An image display method includes the steps of: acquiring a third image formed by applying dynamic range extension processing to a first image and a second image photographed with low sensitivity or low exposure with respect to the first image, or a fourth image without dynamic range extension processing; displaying the acquired image in a transmissive type display panel; and making backlight luminance of a segment corresponding to a high luminance portion in the third image higher than backlight luminance of a segment corresponding to a low luminance portion when the acquired image is determined to be the third image.

A method of extending the dynamic range of an imaging sensor including providing an image sensor having fast and slow pixels, wherein the fast pixels have a higher response to light exposure than the slow pixels; setting the dynamic range of the fast and slow pixels such that over an intermediate exposure range both fast and slow pixels produce an accurate representation of scene exposure but have different associated gains, while over a lower exposure range slow pixels produce a noise dominated signal, and over a higher exposure range fast pixels produce a saturated signal; and extending the dynamic range of the image sensor by adaptively adjusting higher exposure signals produced by fast pixels in response to higher exposure signals produced by slow pixels and by adaptively adjusting lower exposure signals produced by slow pixels in response to lower exposure signals produced by fast pixels.

The invention provides a ray sensitivity resin combination, spacer and protection film of liquid crystal display element and formation method thereof. The ray sensitivity resin combination has high ray sensitivity and is capable of manufacturing a pattern film with excellent dimensional accuracy and intension, no drop-off pattern in developing step and grinding step, high roasting-temperature resistance during forming liquid crystal orientation film and thermal endurance, good durability to the stripping solution of the liquid crystal orientation film and no 'image retention' even in low exposure and no sublimation product in heating step. The ray sensitivity resin combination comprises: (A) polymers comprising at least one group selected from matter group composed of carboxyl group and anhydride group and polymerization unsaturated bond in molecule; (B) monomer with polymerization unsaturated bond; (C) ray sensitivity polymerization initiator; and (D) compound with the structure represented by the formula (1), in formula (1), '*'represents bonding point.

The present invention relates to a coloring composition, a color filter and a color liquid crystal display element. The novel coloring composition provided by the invention has excellent binding firmness with transparent conductive film and inorganic film and can form the pixel with excellent solvent resistance with a low exposure amount. The coloring composition is characterized by comprising the following components: (A) a colorant, (B) an adhesive resin, (C) a multifunctional momomer and (D) a polyhedral oligomeric silsesquioxane with at least group selected from sulfhydryl and polymeric unsaturated group.

The invention relates to a radiation-sensitive linear composition for forming coloured layer, a colour filter and a colour liquid crystal display device. A radiation-sensitive linear composition for forming coloured layer is provided, which is able to forming pixel and black matrix with enough developing resistance and excellent solvent resistance even if in a low exposure quantity. The radiation-sensitive linear composition for forming coloured layer is characterized in that it contains (A) colouring agent, (B) polymer comprising oxygen heterocyclic butyl and polymerized unsaturated bond, and (C) photopolymerization initiator.

A photosensitive polyimide composition; the composition comprises a base agent and a curing agent comprising a photoinitiator. By applying an aliphatic diamine monomer, which has a long carbon chain, and a grafting monomer, which has a main carbon chain having a double bond and an epoxy group at two ends respectively, to a method of making the base agent, a mixture of the base agent and the curing agent can be screen printed to form a photosensitive polyimide film on a copper foil. Also, the photosensitive polyimide film can be exposed under low exposure energy, and can be developed to a solder-resistant polyimide thin film by a weak alkaline developer after exposed. In addition, the solder-resistant polyimide thin film has low dielectric constant, low dielectric loss, good flame resistance, good solder resistance, and good pencil hardness. Accordingly, the photosensitive polyimide composition is applicable to high density flexible printed circuit boards.

A photosensitive resin composition is provided which provides a high resolution even when a pattern is formed using a low exposure intensity (in particular, less than 200 mJ/cm²) and may inhibit deterioration in pattern rectangularity during a post baking process of a post treatment. The photosensitive resin composition includes: a resin; an oxime photopolymerization initiator; a UV absorbing agent; and a monomer containing a hydrogen bonding group, the amount of the monomer containing a hydrogen bonding group being 30 mass % or more with respect to the total solid content of the composition, and the photosensitive resin composition is used for forming a solid-state imaging device.

The invention discloses a double-exposure video imaging system based on a dynamic scene. The system comprises a double-exposure image collection module which is used for obtaining first sequence imagedata through controlling the exposure time, and the first sequence image data comprises a plurality of frames of first exposure images; an image transmission module, connected with the double-exposure image acquisition module and used for acquiring first sequence image data and performing fixed-interval frame extraction processing on the first sequence image data to obtain second sequence image data; and an image processing module, connected with the image transmission module and used for acquiring the second sequence image data and carrying out fusion processing on two adjacent second exposure images in the second sequence image data to obtain a fused image. According to the double-exposure video imaging system provided by the invention, high-exposure sequence images and low-exposure sequence images can be alternately acquired in sequence. Therefore, the problems that an existing HDR photographing or camera shooting system cannot process dynamic scene moving object information, a fused image generates a false contour due to the fact that the brightness information difference of different exposure images is too large, and detail information of the fused image is lost are solved.

A copper tube with copper end pieces for a water-cooled secondary winding of a welding transformer is an example of a brazed assembly having a potentially corrodible side, the water-cooled side, and a low-exposure side, the air side or dry side, of the joined pieces. By shaping contacting surfaces of the parts at the brazed joint it is useful to form a barrier, for example, between a special braze material required for the corrosive side and a conventional, easy to apply, braze material for use on the air side of the joint.

The present invention provides a light-sensitive resin combination, a solder resist combination for a printed wiring board and a printed wiring board; the invention also provides a liquid resin combination having less descend of reflection index and color degradation of a white coated film caused by irradiation of UV in a hot process and capable of forming a pattern by a low exposure amount. The light-sensitive resin combination contains (A) active energy ray curing resin obtained by reaction of alicyclic ring cage epoxide having ethylene unsaturated bond with copolymerization resin, wherein the copolymerization resin is selected from monomer of acroleic acid and acrylic ester, and copolymer of monomer of methacrylic acid and metacrylic acid ester; (B) mercaptan series coumpound; (C) lightpolymerization initiator; (D) diluting agent; (E) red schorl type titanium oxide; and (F) epoxy series thermoset coumpound.

The invention relates to a technology which collects light information in real environment and applied in virtual reality. The invention is technically characterized by not using artificial light or artificial light dot matrix to directly light, but collecting light information directly from real environment to implement indirect lighting. The invention aims at showing real, accurate and rich light effect in virtual reality. The technical scheme mainly includes the following operation steps: taking a digital camera as a centre of sphere, shooting to six directions including up and down, front and back as well as left and right (different exposure respectively means high exposure, normal exposure and low exposure), combining with the six directions to shoot eighteen digital images, using 32bit data storage format to completely keep the light information in the real environment during the integration process of computers, and finally applying the lighting information into a virtual world.

An organic photoreceptor and an electrophotographic image forming apparatus employing the organic photoreceptor are provided, where the organic photoreceptor has high photosensitivity with respect to light radiation at short wavelengths and low exposure potential. Specifically, an organic photoreceptor for short wavelengths having a photosensitive layer including a naphthalene tetracarboxylic acid diimide derivative is formed on an electrically conductive substrate.

A chemically amplified positive-type photosensitive resin composition for thick-film application capable of forming a resist pattern having a nonresist section with a good rectangular cross-sectional shape under a low exposure level even when a resist pattern having a film thickness of 10 μm or more is formed. A chemically amplified positive-type photosensitive resin composition for thick-film application comprising an acid generator and an organic solvent, in which an acrylic resin is added that contains a constituent unit derived from an acrylic acid ester comprising an —SO₂— containing cyclic group or a lactone-containing cyclic group as a resin whose solubility in alkali increases under the action of acid.

The invention discloses a high-reflection surface three-dimensional vision measurement system and method. The method comprises steps of building a model between light intensity of a projector and the imaging gray level of a camera, projecting a uniform saturated gray level image, collecting the image at a high exposure time and a low exposure time, marking saturated pixels, obtaining an imaging region of a high-reflection region of an object surface in a camera image, calculating the low-gray-scale projection intensity which enables the image not to be saturated; carrying out camera pixel absolute phase judgment to obtain one or more camera pixels corresponding to each to-be-adjusted pixel in the projection image, and calculating the gray level of the projection pixel and the average gray level of the corresponding camera pixel to form a gray level matching pair; fitting projection intensity model parameters by taking the matched projection pixel gray scale and the camera pixel gray scale as samples; calculating optimal projection intensity according to the projection intensity model, and generating a self-adaptive sine image; a projector projecting a self-adaptive sine image, an industrial camera collecting the image, a multi-frequency heterodyne phase solving method being used for phase solving, and the three-dimensional shape of an object being obtained according to a fringe projection profilometry vision measurement model.

The invention discloses a through silicon via (TSV) exposure process. After the back surface of a wafer substrate is ground and thinned mechanically, a chemical mechanical polishing (CMP) process is performed twice. In the first CMP process, a polishing solution without selection ratio is adopted, so that the total thickness variation (TTV) of the surface of the substrate is controlled to be less than 1 mu m, and the problem of low exposure uniformity caused by over-large TTV is solved. In the second CMP process, a polishing solution with high selection ratio among the substrate, a TSV medium layer and a TSV barrier layer is adopted, so that the etching is stopped at the TSV barrier layer, an internal conductive copper column is protected from being corroded, the etched substrate appearance is of a transition structure for the deposition of a seed layer, and the stability of a TSV during subsequent electric connection is improved.