25 results about "Low exposure" patented technology

The present invention provides a resin that has liquid repellency and that can be insolubilized with respect to a solvent by photocrosslinking with a low exposure amount. A resin according to the present invention comprises a repeating unit that is represented by formula (1) and a repeating unit that contains a silicon atom but does not contain a fluorine atom. (In formula (1), R1 represents a methyl group or the like, L1 represents a divalent linking group or the like, A represents an m-valent linking group, and R2 to R6 each represent a hydrogen atom or the like. m represents an integer of not less than 2, and n represents an integer of m-1.)

To provide a resist composition having high sensitivity and being able to form a pattern with a low exposure amount. A resist composition containing an organic tin compound and an organic boron compound represented by the following formula. (In the formula, R1, R2, and R3 each independently represent an organic group that bonds to boron by a carbon atom, an oxygen-containing organic group that bonds to boron by an oxygen atom, or OH. The oxygen-containing organic group may contain a boron atom. Two groups selected from the group consisting of R1, R2, and R3 may link to form a ring structure.)

The invention relates to the technical field of image processing, and discloses an image processing method, a shooting method, a storage medium, equipment and a program product, electronic equipment collects a collection scene to obtain multiple frames of to-be-fused images, and when the judgment result shows that the multiple frames of to-be-fused images comprise a first shooting element of which the position changes in different to-be-fused images, a second shooting element of which the position changes in the different to-be-fused images, and a third shooting element of which the position changes in the different to-be-fused images; when the brightness of the first shooting element meets the first brightness condition and the brightness of the second shooting element meets the first brightness condition, the electronic equipment improves the brightness of the dark frame with the low exposure value in the multiple frames of images to be fused, so that the brightened dark frame serves as an output image. Due to the fact that the exposure value of the dark frame is low, the brightness of the second shooting element with the high brightness in the dark frame can be reduced, overexposure cannot occur, and the abnormal phenomenon of overexposure of the output image can be avoided; moreover, the electronic equipment does not perform fusion processing on the multiple frames of images to be fused, but takes the brightened dark frame as the output image, so that the abnormal phenomenon of ghosting of the output image can be avoided.

This invention discloses a control method for a vertical screen printing exposure device, comprising: a co-position motor driving a first lens module and a second lens module to simultaneously occupy the initial scanning position; during exposure, a linkage motor driving the first lens module to move downward from the highest exposure point, while simultaneously driving the second lens module to move upward from the lowest exposure point; during the movement of the first and second lens modules, the first lens module exposes the screen at the first exposure station according to the exposure pattern of the first exposure station, and the second lens module exposes the screen at the second exposure station according to the exposure pattern of the second exposure station. By driving the first and second lens modules to move synchronously and in opposite directions using a linkage motor, the requirement for synchronous processing at two stations is met, and the self-weight of the downward-moving first lens module can be used to effectively reduce the load on the linkage motor during operation, thereby increasing the scanning speed and plate-making efficiency of the first and second lens modules.

The invention provides a projection objective and exposure equipment. The projection objective comprises a first lens group, a second lens group, an aperture diaphragm, a third lens group and a fourth lens group, the first lens group is configured to match the maximum static exposure field-of-view diameter and the maximum numerical aperture; the second lens group is configured to correct field curvature and distortion, the second lens group has positive focal power, and the second lens group comprises at least two lenses with Abbe numbers greater than or equal to 65; the third lens group is configured to compensate chromatic aberration, the third lens group has negative focal power, and the third lens group comprises at least two lenses of which the Abbe number is greater than or equal to 65 and at least one lens of which the Abbe number is less than 50; the fourth lens group is configured to compensate for aberration related to a view field or compensate for second-order field curvature and astigmatism; all the lenses of the first lens group, the second lens group and the fourth lens group are all spherical lenses. According to the invention, the view field size of the exposure system can be effectively increased, the view field is increased, the exposure time is shortened, and a smaller exposure resolution is realized.

This invention provides a photolithography process and a semiconductor structure. In the photolithography process, during the soft baking of the photoresist layer, the baking temperature is increased to enhance the performance of the liquid barrier layer and reduce the defect formation rate. Furthermore, during exposure, the exposure speed of defect-prone areas is reduced, which also helps to reduce the defect formation rate and improve exposure quality. Further, during the rinsing process after development, the defect removal effect is enhanced by lengthening the rinsing time for the central region and slowing down the rinsing scanning speed from the central region towards the edge regions. Based on this, the photolithography process provided by this invention alleviates defect problems at their root cause, not only reducing the probability of downtime due to defects and shortening defect verification time, thus improving process efficiency, but also avoiding the expansion of the impact range due to detection rate issues, and significantly improving product yield.

This disclosure provides a method and system for enhancing low-exposure images based on embedded McLaurin and convolution, relating to the field of image processing technology. The method involves acquiring a low-exposure image to be enhanced, processing and decomposing the low-exposure image, inputting the low-exposure image into a backbone network to extract multi-scale features, introducing a dynamic adjustment factor into the backbone network, using the dynamic adjustment factor to learn a convolution weight calibration map, calibrating the convolution weights of the backbone network with the learned weight calibration map, performing convolution operations on the features using the calibrated convolution kernels to obtain the luminance component of the low-exposure image, and outputting a long-exposure enhanced image that varies with the dynamic adjustment factor using the luminance component.

The present invention relates to an amide-based compound, and a composition for resist underlayer film formation and a resist underlayer film which comprise same, the amide-based compound being capable of forming a resist underlayer film enabling formation of a high-quality pattern even with low exposure energy.

This application discloses an image processing method, an electronic device, and a readable storage medium, belonging to the field of terminal technology. Applied to an electronic device, the method includes: during image acquisition via a first camera of the electronic device, if the zoom ratio of the first camera is greater than or equal to a first zoom ratio threshold, then performing moon detection on a first preview image acquired by the first camera; if the moon is present in the first preview image, displaying a second preview image acquired by a second camera of the electronic device in a picture-in-picture manner within the first preview image; updating the first preview image to a third preview image with lower exposure, where other objects besides the moon in the second preview image have higher clarity; and, in response to a shooting operation, processing the third preview image based on the second preview image to obtain a target image. This application improves the imaging clarity of other background objects within the same frame as the moon, and also improves the image shooting effect.

The invention discloses an endoscope imaging system and a method for automatically adjusting image exposure parameters, and belongs to the technical field of image processing.The method comprises the steps that a first endoscope image is collected and subjected to resolution reduction processing, and a second endoscope image is obtained; identifying an effective operation area of the surgery and calculating the area overexposure degree; and adaptively adjusting the endoscope video brightness based on the overexposure degree. Effective operation area identification and overexposure degree calculation can be realized by adopting a deep learning model or a traditional image processing method. Brightness adjustment judges whether overexposure exists or not according to the overexposure degree; if not, automatic exposure is kept; and if overexposure exists, sequentially switching to an exposure mode of intelligent photometry, reducing light source brightness, adjusting a Gamma curve and reducing exposure brightness so as to eliminate overexposure and restore image details. The system comprises a light source device, a camera device, a brightness adjusting device, a storage device and a display device, can automatically detect overexposure and prompt a user, and realizes intelligent adjustment of endoscope image brightness.

The application provides an exposure dose control method based on an exposure dose control system, which comprises the following steps: controlling a shutter to open; receiving an energy value collected by an energy sensor, determining an accumulated exposure dose value based on the energy value; determining whether the accumulated exposure dose value is not less than a target dose value; if the accumulated exposure dose value is not less than the target dose value, controlling the shutter to start to close; taking the accumulated exposure dose value corresponding to a shake delay end moment after the shutter is completely closed as an actual accumulated exposure dose value; determining an exposure dose error value based on the actual accumulated exposure dose value; determining whether the exposure dose error value meets a requirement; if the exposure dose error value does not meet the requirement, updating an equivalent dose value and returning to execute the first step; if the exposure dose error value meets the requirement, applying the equivalent dose value to an exposure system. Through the exposure dose control method based on the exposure dose control system, the problem of low exposure dose control precision is solved.

The invention discloses an exposure device, an exposure system and an exposure method thereof, and relates to the technical field of exposure. The exposure device comprises a rack, a driving mechanism, a light-transmitting plate, a liquid dropping mechanism and a bearing disc, the bearing disc is installed on the rack, the driving mechanism is connected with the light-transmitting plate, the liquid dropping mechanism is installed on the light-transmitting plate, the light-transmitting plate is provided with a receding groove, and the light-transmitting plate and the bearing disc are arranged in a spaced mode; the liquid dropping mechanism is used for enabling the refraction liquid to penetrate through the receding groove and drop onto the bearing disc, the bearing disc is used for bearing the glass sheet, the liquid dropping mechanism is further used for enabling the refraction liquid to penetrate through the receding groove and drop onto the glass sheet, and the driving mechanism is used for driving the light-transmitting plate to be pressed on the glass sheet. The exposure device provided by the invention can cancel a polishing process, is time-saving and labor-saving, shortens the exposure period, improves the exposure efficiency, reduces the exposure cost and improves the economic benefit.

The application belongs to the technical field of image processing, and particularly relates to a multi-exposure fusion method for separating illumination and motion; low-exposure images, medium-exposure images and high-exposure images are subjected to illumination preprocessing and input into a fusion model; the low-exposure images and the high-exposure images are mapped to the illumination level of the medium-exposure images and normalized according to first gamma values and second gamma values, to obtain first new medium-exposure images and second new medium-exposure images, and the new medium-exposure images are subjected to motion alignment with the medium-exposure images; the first new medium-exposure images and the second new medium-exposure images are subjected to inverse gamma transformation respectively, to obtain new low-exposure images and new high-exposure images, and the new low-exposure images and the new high-exposure images are subjected to illumination fusion with the medium-exposure images to obtain a high dynamic range image, loss is calculated, and model parameters are trained by back propagation; a to-be-processed image is obtained, and a corresponding high dynamic range image of the to-be-processed image is obtained by using the trained fusion model; the application adopts the idea of separating illumination and motion, so that the high dynamic range image retains more information of the input image, and ghosting is reduced.

The invention discloses a single-exposure-based three-dimensional reconstruction method for an object with a high reflective surface. The method comprises the following steps of: firstly, collecting a single group of phase shift fringe images under relatively low exposure for avoiding pixel saturation so as to preserve highlight area information; and then, a Retinex image enhancement algorithm based on guide filtering is adopted to process the image, the algorithm estimates an incident component through multi-scale guide filtering and performs gamma correction, principal component analysis weighted fusion with a multi-scale Retinex enhancement result is performed, dark region details are effectively recovered, and the overall contrast is improved. And then, extracting a wrapped phase from the enhanced image, and performing phase unwrapping through a multi-frequency heterodyne method to obtain an absolute phase. And finally, calculating to obtain a three-dimensional point cloud of the object in combination with system calibration parameters. According to the invention, the problem of low efficiency caused by the need of additional hardware or multiple exposure in the traditional technology is solved, and high-efficiency and high-precision reconstruction under single exposure is realized.

The application provides an exposure method and an exposure assembly for a metal mask substrate. The exposure method comprises: placing the metal mask substrate between a moving side mask and a reference side mask arranged opposite to each other, and arranging a tension breaking assembly on both ends of the surface of the moving side mask outside the effective exposure area. The tension breaking assembly is made of soft material and has a length not shorter than the width of the metal mask substrate. When the moving side mask is attached to the metal mask substrate, the thickness of the tension breaking assembly enables it to contact the metal mask substrate at the same time as the moving side mask. The technical solution provided by the application adds a tension breaking assembly to the moving side mask to block the tension generated when the metal mask substrate is pressed and directed outside the effective exposure area, reduce the inconsistency of the internal tensile stress, reduce the sliding extension of the metal mask substrate, and thus reduce the size deviation of the exposure pattern.

The invention discloses a method for preventing copper nodules from being formed at the edge of board-level packaging, which comprises the following steps of: forming a circle of ring with lateral erosion or undercutting, which protrudes upwards, at the edge of the top of a polyimide insulating layer by adopting a polyimide material in an exposure and over-development mode, and placing an electroplating clamp at the top of the polyimide insulating layer at the inner side of the ring for electroplating. According to the invention, through the arrangement of the ring protruding upwards, the seed layer is discontinuous in the sputtering process, so that current transmission is influenced; in addition, the exposure amount of the ring is reduced in the exposure process, so that the bottom of the ring is not sufficiently cured to form lateral erosion or undercutting under the attack of developing liquid, current transmission is further blocked, the electroplating clamp is arranged at the top of the polyimide insulating layer on the inner side of the ring for electroplating, and the ring is arranged to prevent the periphery of the electroplating clamp from conducting electricity so as not to grow copper nodules.

The invention relates to the technical field of photoetching processing equipment, in particular to a high-precision exposure machine which comprises a feeding mechanism, a pre-positioning mechanism, a conveying mechanism, a discharging mechanism, a first visual positioning mechanism, a second visual positioning mechanism, an exposure mechanism, a first transfer manipulator and a second transfer manipulator, the conveying mechanism comprises a linear track module and a bearing frame, and the linear track module is sequentially provided with a positioning station, an exposure station and a discharging transition station in the conveying direction; a floating plate and an adjustment driving assembly are arranged in the exposure station; the first visual positioning mechanism is arranged at the bottom of the positioning station and is used for positioning the product and the lower mother board; the second visual positioning mechanism is arranged at the top of the floating plate and is used for positioning the upper mother board and the lower mother board; the exposure mechanism comprises an upper exposure unit and a lower exposure unit and is used for simultaneously photoetching the front and back surfaces of the product; according to the invention, high-precision double-sided exposure processing can be realized through double vision positioning, and the automation degree and the production efficiency are high.

The invention provides a liquid-state high-refractive-index monomer as well as a preparation method and application thereof. The liquid-state high-refractive-index monomer has a structure as shown in a formula G1 or a formula G2, the liquid-state high-refractive-index monomer has a high refractive index and is easy to migrate and diffuse in an exposure process, and the photopolymer material prepared from the liquid-state high-refractive-index monomer has the excellent properties of high sensitivity, high diffraction efficiency of a recording grating, high refractive index modulation degree, low exposure and the like.

Provided are an anti-plating composition and a dry film which have low exposure energy and high sensitivity, and a cured product which is formed therefrom, has excellent plating resistance, high resolution, and is free of lateral erosion and diffusion plating, and an electrode of a solar cell using the same. The electroplating-resistant composition comprises (A) a carboxyl group-containing resin, (B) a photosensitive monomer and (C) a photopolymerization initiator, and the photopolymerization initiator (C) comprises 4, 4 '-diphenyl-1, 3, 4, 5-tetramethyl-1, 3, 5-tetramethyl-1, the invention relates to an oxime ester photopolymerization initiator, which is prepared from 4, 4 '-bis (diethylamino) benzophenone, 2-isopropyl thioxanthone, 2, 4, 6-trimethylbenzoyl diphenyl phosphine oxide, 2-methyl-1-(4-methylthiophenyl)-2-morpholinyl propane-1-one and an oxime ester photopolymerization initiator as shown in a formula (1),

The application relates to an image synthesis method and device, computer equipment, a storage medium and a computer program product. The method comprises the following steps: acquiring a group of images, including a first to-be-synthesized image with a low exposure level and at least two second to-be-synthesized images with a high exposure level; determining an overexposure area in a high-luminance image after fusing the at least two to-be-synthesized images; determining a non-moving area in the overexposure area of the high-luminance image by comparing the at least two second to-be-synthesized images; determining a to-be-synthesized area in the first to-be-synthesized image based on the non-moving area; replacing the non-moving area in the overexposure area of the high-luminance image with an image of the to-be-synthesized area; and obtaining a synthesized image. Compared with a traditional method of synthesizing multiple images based on a high-luminance image, the method replaces the non-moving area in the overexposure area with an image with a low exposure level during synthesis, and the moving area in the overexposure area is not replaced, thereby preventing ghosting in the synthesized image and improving image definition.

The invention relates to a negative developing photoresist containing hydrophobic resin as well as a preparation method and application of the negative developing photoresist. When the photoresist composition containing the hydrophobic resin is used for forming a film, the hydrophobic resin can be automatically separated to the surface of the film to form a protective layer. A photoresist film formed by the photoresist composition has low surface energy, a high receding contact angle (for example, greater than or equal to 85 degrees), a low sliding angle (for example, less than 15 degrees) and an advancing contact angle not exceeding 100 degrees, and is beneficial to reduction of exposure defects and improvement of exposure efficiency.

The application relates to a large glass frame automatic lifting and overturning device, which comprises a supporting table, an upper glass frame for fixing the upper glass, a lower glass frame for fixing the lower glass, a lifting driving mechanism for driving the upper glass frame to lift and an overturning driving mechanism for driving the upper glass frame to overturn, the lower glass frame is installed on the supporting table, and the upper glass is located above the lower glass. The lifting and overturning device is ingenious in structure and convenient to operate, the exposure material is placed between the upper glass and the lower glass through the large glass frame, the stability of the exposure material in the exposure process can be effectively ensured, the upper glass and the lower glass can be quickly separated through the lifting driving mechanism, the winding and unwinding speed of the exposure material is improved, the probability of problems such as splicing and misplacement of the exposure material is reduced, the waste of the exposure material is reduced, the yield of the exposure process is ensured, the use cost is reduced, and the use experience of users is improved.

This invention discloses a method for optical plane calibration of a multi-line laser 3D measurement system. The method includes acquiring multiple sets of checkerboard calibration images at different locations, capturing clear checkerboard images under normal exposure, capturing laser stripe images of various orders falling on the checkerboard plane under low exposure parameters, and calibrating the camera's intrinsic and extrinsic parameter matrices using the set of clear checkerboard images acquired under normal exposure. The method generates line structured light through grating diffraction, adjusts the aperture width to select the working laser stripe diffraction order, redistributes laser stripe brightness using a phase plate, and achieves system calibration using the diffraction equation of the multi-line laser. This improves the calibration accuracy of the optical plane of the multi-line laser system, thereby enhancing measurement accuracy and efficiency. The diffraction grating generates multiple diffracted laser lines on the object, allowing simultaneous acquisition of surface 3D information at multiple line positions on the object's surface. Furthermore, the diffraction order can be selected based on the object's surface shape.

Various implementations disclosed herein improve the appearance of captured video by accounting for motion-induced blur, noise, lighting, and / or other factors related to the appearance of video captured by rotating or otherwise moving wearable electronic device. Some implementations reduce or eliminate camera motion blur during video capture by dynamically adjusting the exposure used to capture the video based on user motion. For example, exposure may be reduced to reduce the amount of blur during motion. Since such a reduced exposure captures a lesser amount of light, gain may be increased such that the captured video maintains a relatively constant image brightness in spite of the changing exposure over time.

The utility model relates to the technical field of chip application, in particular to a gold bump structure for a chip with both pressing area and stability, which comprises a substrate, a bonding pad, a protective layer and a metal layer. One side of the substrate is connected with a bonding pad, one side of the substrate is connected with a protective layer at equal intervals, and the protective layer is provided with an opening corresponding to the bonding pad; a metal layer is arranged on one side, far away from the substrate, of the bonding pad; by utilizing photoetching exposure (reducing exposure capability and finely adjusting exposure key points), development (prolonging development time or secondary development) and plasma technologies, the bottom of a photoresist window after development is etched outwards and electroplated to form a foundation, so that a gold bump structure can compensate for drilling and etching by using a bottom bump foundation, the aim of miniature bump size is fulfilled, and the cost is reduced. In addition, the bottom foundation of the bump is stable, the gold bump is stable in structure, the gold bump is not prone to toppling and deforming due to chip vibration and shaking and rear-section cutting and washing, and the actual use requirement is met.