67 results about "Low exposure" patented technology

The invention discloses a combined denoising and demosaicing method for a low-exposure original image under low light, and the method is divided into two stages: in the first stage, introducing a high and low frequency fusion module based on wavelet transform, and generating relatively clean pseudo long exposure data to reduce noise; and in the second stage, through a color space attention subnet, image reconstruction is carried out by using the pseudo long exposure data generated in the first stage, the color is recovered, and texture details are enhanced. In addition, the invention also provides a wavelet loss function to balance detail recovery and noise suppression, and discusses the influence of three different training strategies on the performance of the model. Experimental results show that the method provided by the invention is superior to most advanced algorithms in the aspects of quantitative indexes, color accuracy, detail retention and the like.

The embodiment of the present application provides a motion capture method and an electronic device, wherein the electronic device reduces the exposure time and enters a short exposure mode when a moving object is detected during preview, rather than reducing the exposure time after the user presses the shutter. In this way, the cached preview frame has an exposure reduction effect, and once a photo operation is detected, the electronic device can obtain the photo to be saved based on the cached preview frame without waiting for the short exposure time to take effect before the photo is output, thereby improving the problems of slow imaging speed and shutter lag during motion capture.

The invention discloses an exposure pattern compensation method after lens aging, and the method comprises the steps: 1, exposing a mask pattern A to form an exposure pattern, and comparing the exposure pattern with the mask pattern A to form an X compensation table and a Y compensation table; 2, traversing each edge of the mask pattern to be exposed, and obtaining coordinates of end points of each edge; 3, finding out corresponding compensation values in the X compensation table and the Y compensation table according to the coordinates of the end points, compensating and modifying the coordinates of the end points of the mask pattern according to the compensation values, and calculating the compensation values for compensating and modifying when the X coordinates and / or the Y coordinates of the end points are located between the ith coordinates and the (i + 1) th coordinates recorded in the X compensation table and the Y compensation table; and 4, performing exposure processing on the mask pattern to obtain an exposed pattern, and performing linear interpolation compensation on the mask pattern to be exposed by using the X compensation table and the Y compensation table, so that the difference between the pattern after exposure and the mask pattern can be well reduced, and a high-quality guarantee is provided for effective industrial production.

The present invention provides a resin that has liquid repellency and that can be insolubilized with respect to a solvent by photocrosslinking with a low exposure amount. A resin according to the present invention comprises a repeating unit that is represented by formula (1) and a repeating unit that contains a silicon atom but does not contain a fluorine atom. (In formula (1), R1 represents a methyl group or the like, L1 represents a divalent linking group or the like, A represents an m-valent linking group, and R2 to R6 each represent a hydrogen atom or the like. m represents an integer of not less than 2, and n represents an integer of m-1.)

To provide a resist composition having high sensitivity and being able to form a pattern with a low exposure amount. A resist composition containing an organic tin compound and an organic boron compound represented by the following formula. (In the formula, R1, R2, and R3 each independently represent an organic group that bonds to boron by a carbon atom, an oxygen-containing organic group that bonds to boron by an oxygen atom, or OH. The oxygen-containing organic group may contain a boron atom. Two groups selected from the group consisting of R1, R2, and R3 may link to form a ring structure.)

The invention relates to the technical field of image processing, and discloses an image processing method, a shooting method, a storage medium, equipment and a program product, electronic equipment collects a collection scene to obtain multiple frames of to-be-fused images, and when the judgment result shows that the multiple frames of to-be-fused images comprise a first shooting element of which the position changes in different to-be-fused images, a second shooting element of which the position changes in the different to-be-fused images, and a third shooting element of which the position changes in the different to-be-fused images; when the brightness of the first shooting element meets the first brightness condition and the brightness of the second shooting element meets the first brightness condition, the electronic equipment improves the brightness of the dark frame with the low exposure value in the multiple frames of images to be fused, so that the brightened dark frame serves as an output image. Due to the fact that the exposure value of the dark frame is low, the brightness of the second shooting element with the high brightness in the dark frame can be reduced, overexposure cannot occur, and the abnormal phenomenon of overexposure of the output image can be avoided; moreover, the electronic equipment does not perform fusion processing on the multiple frames of images to be fused, but takes the brightened dark frame as the output image, so that the abnormal phenomenon of ghosting of the output image can be avoided.

The present invention belongs to the technical field of polymer materials, and specifically relates to a photosensitive adhesive liquid, a preparation method thereof and an application thereof. The photosensitive adhesive liquid of the present invention comprises, by weight, 48-65 parts of a polymer, 36-50 parts of a monomer, 1-4 parts of a powder, 0.1-4 parts of an additive, and 5-25 parts of a solvent. The present invention can improve the exposure resolution of a photosensitive dry film, improve the substrate adhesion of the photosensitive dry film, reduce exposure energy, improve the exposure efficiency of the dry film, reduce the film removal time of the substrate surface, and avoid dry film residue in small holes.

This invention discloses a control method for a vertical screen printing exposure device, comprising: a co-position motor driving a first lens module and a second lens module to simultaneously occupy the initial scanning position; during exposure, a linkage motor driving the first lens module to move downward from the highest exposure point, while simultaneously driving the second lens module to move upward from the lowest exposure point; during the movement of the first and second lens modules, the first lens module exposes the screen at the first exposure station according to the exposure pattern of the first exposure station, and the second lens module exposes the screen at the second exposure station according to the exposure pattern of the second exposure station. By driving the first and second lens modules to move synchronously and in opposite directions using a linkage motor, the requirement for synchronous processing at two stations is met, and the self-weight of the downward-moving first lens module can be used to effectively reduce the load on the linkage motor during operation, thereby increasing the scanning speed and plate-making efficiency of the first and second lens modules.

The application discloses a kind of automatic exposure control methods based on structured light stripe, comprising: S1, a group of four-step phase shift grating is collected, and is solved;S2, to modulation and background light are double down-sampling, eliminate oversaturated sampling value is sorted and is histogram;S3, find the modulation value and background light intensity value of the mark position on histogram;S4, according to step S3, the relationship between exposure time and background light is obtained, to find the most suitable exposure time of current frame;S5, the most suitable exposure time of current frame is compared with current frame exposure time, and output stable value;S6, set the most suitable exposure time of current frame, point cloud generation.The application solves the problem that exposure time is not adjusted for point value during camera exposure process, which leads to high or low exposure time, affecting measurement efficiency and quality.

The invention provides a projection objective and exposure equipment. The projection objective comprises a first lens group, a second lens group, an aperture diaphragm, a third lens group and a fourth lens group, the first lens group is configured to match the maximum static exposure field-of-view diameter and the maximum numerical aperture; the second lens group is configured to correct field curvature and distortion, the second lens group has positive focal power, and the second lens group comprises at least two lenses with Abbe numbers greater than or equal to 65; the third lens group is configured to compensate chromatic aberration, the third lens group has negative focal power, and the third lens group comprises at least two lenses of which the Abbe number is greater than or equal to 65 and at least one lens of which the Abbe number is less than 50; the fourth lens group is configured to compensate for aberration related to a view field or compensate for second-order field curvature and astigmatism; all the lenses of the first lens group, the second lens group and the fourth lens group are all spherical lenses. According to the invention, the view field size of the exposure system can be effectively increased, the view field is increased, the exposure time is shortened, and a smaller exposure resolution is realized.

The invention discloses a content identification method and a related device. The method comprises the following steps: acquiring to-be-processed interaction data generated by interaction of to-be-identified content; and performing first exposure determination on the to-be-identified content corresponding to the to-be-processed interaction data to obtain a first exposure. And performing object type identification on a to-be-identified object corresponding to the to-be-processed interaction data to obtain an object identification result. If it is determined that the to-be-recognized object is the target object based on the object recognition result, the target object concentration of the to-be-recognized content is determined. And if the first exposure reaches an exposure threshold value and the target object concentration reaches a concentration threshold value, determining the to-be-identified content as the target content. Whether the to-be-recognized content is the target content or not is determined by combining the first exposure and the target object concentration, the set exposure threshold is reduced to a certain extent, the target content can be found under the lower exposure under the same human input, the situation that a large number of users touch uncomfortable content due to the fact that the exposure threshold is set to be too high is avoided, and the user experience is improved. And therefore, great influence is avoided.

This invention provides a photolithography process and a semiconductor structure. In the photolithography process, during the soft baking of the photoresist layer, the baking temperature is increased to enhance the performance of the liquid barrier layer and reduce the defect formation rate. Furthermore, during exposure, the exposure speed of defect-prone areas is reduced, which also helps to reduce the defect formation rate and improve exposure quality. Further, during the rinsing process after development, the defect removal effect is enhanced by lengthening the rinsing time for the central region and slowing down the rinsing scanning speed from the central region towards the edge regions. Based on this, the photolithography process provided by this invention alleviates defect problems at their root cause, not only reducing the probability of downtime due to defects and shortening defect verification time, thus improving process efficiency, but also avoiding the expansion of the impact range due to detection rate issues, and significantly improving product yield.

The present disclosure provides a module for creating a metal-containing film, including a reactor chamber; an inlet for providing an organo-metallic precursor to the reactor chamber; and an inlet for providing a reactive gaseous species to react with the organo-metallic precursor to form a metal-containing film. The reactive gaseous species includes an element having three to five valence electrons and one or more radicals selected from hydrogen, C1-C3 alkyl, and C1-C3 alkoxyl. The present disclosure further relates to a method of creating the metal-containing film and a semiconductor structure associated therewith.

This disclosure provides a method and system for enhancing low-exposure images based on embedded McLaurin and convolution, relating to the field of image processing technology. The method involves acquiring a low-exposure image to be enhanced, processing and decomposing the low-exposure image, inputting the low-exposure image into a backbone network to extract multi-scale features, introducing a dynamic adjustment factor into the backbone network, using the dynamic adjustment factor to learn a convolution weight calibration map, calibrating the convolution weights of the backbone network with the learned weight calibration map, performing convolution operations on the features using the calibrated convolution kernels to obtain the luminance component of the low-exposure image, and outputting a long-exposure enhanced image that varies with the dynamic adjustment factor using the luminance component.

The present invention relates to an amide-based compound, and a composition for resist underlayer film formation and a resist underlayer film which comprise same, the amide-based compound being capable of forming a resist underlayer film enabling formation of a high-quality pattern even with low exposure energy.

The invention relates to the field of bar code recognition and reading, in particular to a distance measuring method based on focusing light spot imaging and a recognition and reading device thereof. A theoretical formula is obtained by analyzing a theoretical relationship between coordinates in an image and an actual distance, high-precision fitting is directly carried out on the theoretical formula after data are acquired by utilizing high-precision displacement equipment, F1 / 2-P1 = (A1 / D-B1) * F1 / 2, D is a distance, A1 = d1 / tan alpha 1, B1 = + / -tan beta 1 / tan alpha 1, alpha 1 is a horizontal field half angle, and alpha 2 is a horizontal field half angle. Beta1 is the deflection angle of the laser axis and the view field axis in the X direction, and F1 is the horizontal pixel value of the image sensor; p1 is the X coordinate value of the mass center of the laser point. The error between the fitted curve and the actually tested curve is extremely small, a standard is provided for subsequent centroid detection errors, and a basis is also provided for high-precision distance measurement. In addition, the mass center of the light spot is reliably and precisely positioned, and the light-supplementing-free high-brightness small-circle laser light spot low exposure is used for photographing, so that the interference is reduced to the maximum extent.

The embodiment of the present application provides a kind of infrared light supplementing self-adaptive adjustment method based on exposure index and its related equipment, comprising: when detecting that target device enters night vision light supplementing state, exposure control parameter of target device is handled with exposure constraint, and after exposure constraint processing, current exposure index data of target device is collected according to preset sampling period;Current exposure index data is compared with target exposure index interval of target device pre-marking, and the adjustment direction of light supplementing parameter is determined;Based on adjustment direction and preset adjustment limited condition, the light supplementing output parameter of target device is limitedly adjusted, and after each limited adjustment, inhibition processing is carried out, so that light supplementing output parameter is updated according to current exposure index data.Through the above method steps, the interference of exposure control parameter change on infrared light supplementing feedback judgment can be reduced, the repeated fluctuation of light supplementing output parameter is inhibited, and the stability and imaging effect of night vision light supplementing adjustment are improved.

This application discloses an image processing method, an electronic device, and a readable storage medium, belonging to the field of terminal technology. Applied to an electronic device, the method includes: during image acquisition via a first camera of the electronic device, if the zoom ratio of the first camera is greater than or equal to a first zoom ratio threshold, then performing moon detection on a first preview image acquired by the first camera; if the moon is present in the first preview image, displaying a second preview image acquired by a second camera of the electronic device in a picture-in-picture manner within the first preview image; updating the first preview image to a third preview image with lower exposure, where other objects besides the moon in the second preview image have higher clarity; and, in response to a shooting operation, processing the third preview image based on the second preview image to obtain a target image. This application improves the imaging clarity of other background objects within the same frame as the moon, and also improves the image shooting effect.

An exposure device and an exposure method of the exposure device. The exposure device (1) comprises an upper exposure assembly (10) and a lower exposure assembly (20). The upper exposure assembly (10) comprises an upper workbench (11), upper suction members (12) and an upper exposure member (13), the upper suction members (12) are vertically movably arranged on the upper workbench (11), and the upper exposure member (13) is arranged on the upper workbench (11). The lower exposure assembly (20) comprises a lower workbench (21), lower suction members (22) and a lower exposure member (23), the lower workbench (21) and the upper workbench (11) are oppositely arranged in a vertical direction, the lower suction members (22) are vertically movably arranged on the lower workbench (21), and the lower exposure member (23) is arranged on the lower workbench (21). The lower exposure assembly (20) is located below the upper exposure assembly (10), and the lower exposure assembly (20) and the upper exposure assembly (10) can move relative to each other.

The invention discloses an endoscope imaging system and a method for automatically adjusting image exposure parameters, and belongs to the technical field of image processing.The method comprises the steps that a first endoscope image is collected and subjected to resolution reduction processing, and a second endoscope image is obtained; identifying an effective operation area of the surgery and calculating the area overexposure degree; and adaptively adjusting the endoscope video brightness based on the overexposure degree. Effective operation area identification and overexposure degree calculation can be realized by adopting a deep learning model or a traditional image processing method. Brightness adjustment judges whether overexposure exists or not according to the overexposure degree; if not, automatic exposure is kept; and if overexposure exists, sequentially switching to an exposure mode of intelligent photometry, reducing light source brightness, adjusting a Gamma curve and reducing exposure brightness so as to eliminate overexposure and restore image details. The system comprises a light source device, a camera device, a brightness adjusting device, a storage device and a display device, can automatically detect overexposure and prompt a user, and realizes intelligent adjustment of endoscope image brightness.

The application provides an exposure dose control method based on an exposure dose control system, which comprises the following steps: controlling a shutter to open; receiving an energy value collected by an energy sensor, determining an accumulated exposure dose value based on the energy value; determining whether the accumulated exposure dose value is not less than a target dose value; if the accumulated exposure dose value is not less than the target dose value, controlling the shutter to start to close; taking the accumulated exposure dose value corresponding to a shake delay end moment after the shutter is completely closed as an actual accumulated exposure dose value; determining an exposure dose error value based on the actual accumulated exposure dose value; determining whether the exposure dose error value meets a requirement; if the exposure dose error value does not meet the requirement, updating an equivalent dose value and returning to execute the first step; if the exposure dose error value meets the requirement, applying the equivalent dose value to an exposure system. Through the exposure dose control method based on the exposure dose control system, the problem of low exposure dose control precision is solved.

To provide a technique capable of reducing unevenness of an exposure amount even if overlapping accuracy of a plurality of line beams formed of a plurality of light sources is low.SOLUTION: An exposure device 100 includes a stage 10, an illumination optical system 53, a spatial light modulator 41, a projection optical system 43, and a control part 90. The stage 10 holds a substrate W. The spatial light modulator 41 forms light from a plurality of light sources into a plurality of line beams, and makes the line beams overlap with a predetermined focal position. The spatial light modulator 41 subjects a synthesis line beam formed by overlapping the plurality of line beams by the illumination optical system 53 to spatial modulation. The projection optical system 43 projects the synthesis line beam subjected to the spatial modulation by the spatial light modulator onto the substrate held by the stage 10. An exposure amount adjustment part of the control part 90 adjusts an exposure amount of the substrate W by the synthesis line beam, according to a line width in a minor axis direction of the synthesis line beam.SELECTED DRAWING: Figure 1

The utility model relates to the technical field of cell pole detection, in particular to a cell pole defect detection device which comprises a detection device body and a cell pole body, one side of the detection device body is fixedly provided with a detection shell, the detection shell is hollow, a plurality of cameras are arranged between the detection device body and the detection shell, and the cameras are arranged on the detection shell. According to the utility model, through the arrangement of the adjusting assembly and the cooperation of the plurality of cameras and the lenses, different positions and different defects of the battery cell pole column body can be detected at the same time; meanwhile, the exposure time can be greatly shortened through a high-brightness strip-shaped light source and a high-brightness annular light source, so that the product detection speed is increased, the detection efficiency is improved, meanwhile, the angle of the camera can be adjusted by sliding a sliding block in an adjusting groove, so that debugging personnel can conveniently and rapidly carry out installation and debugging, and the debugging efficiency is improved. The mounting efficiency is improved.

The invention discloses an exposure device, an exposure system and an exposure method thereof, and relates to the technical field of exposure. The exposure device comprises a rack, a driving mechanism, a light-transmitting plate, a liquid dropping mechanism and a bearing disc, the bearing disc is installed on the rack, the driving mechanism is connected with the light-transmitting plate, the liquid dropping mechanism is installed on the light-transmitting plate, the light-transmitting plate is provided with a receding groove, and the light-transmitting plate and the bearing disc are arranged in a spaced mode; the liquid dropping mechanism is used for enabling the refraction liquid to penetrate through the receding groove and drop onto the bearing disc, the bearing disc is used for bearing the glass sheet, the liquid dropping mechanism is further used for enabling the refraction liquid to penetrate through the receding groove and drop onto the glass sheet, and the driving mechanism is used for driving the light-transmitting plate to be pressed on the glass sheet. The exposure device provided by the invention can cancel a polishing process, is time-saving and labor-saving, shortens the exposure period, improves the exposure efficiency, reduces the exposure cost and improves the economic benefit.

The present invention provides an image processing method, device and electronic system, which obtains a plurality of images to be processed whose exposure corresponding to a target scene is lower than a preset exposure threshold and whose exposure is the same; performs image registration processing on the plurality of images to be processed; and performs image fusion processing on the plurality of images to be processed after image registration to obtain an image processing result. In this method, in a scene with insufficient lighting such as at night, a plurality of images to be processed whose exposure is lower than a preset exposure threshold and whose exposure is the same are captured, and the plurality of images to be processed are processed by image registration and image fusion. This method can keep the image brightness of the plurality of images to be processed consistent, which is conducive to improving the image registration effect, avoiding ghosting of the fused image, and thus improving the overall image effect.

A photosensitive composition which can change polarity of a surface of the film by exposure even under low exposure dose and low post-baking temperature conditions, a photosensitive film, a lower layer film, a method for producing a structure having a phase-separated structure, and a compound. The photosensitive composition includes an acid-degradable compound and a photoacid generating agent, and the acid-degradable compound (A) is one or more compounds represented by any of Formulae (A1) to (A4) below:Ra1—(—CH2—CRa2Ra3—)n—Ra4—O—(—CO—Ra5—CO—)—O—Ra6—Ra7  (A1)Ra1—(—CH2—CRa2Ra3—)n—Ra4—O—(—CO—Ra5—O—)—CO—Ra6—Ra7  (A2)Ra1—(—CH2—CRa2Ra3—)n—Ra4—CO—(—O—Ra5—CO—)—O—Ra6—Ra7  (A3)Ra1—(—CH2—CRa2Ra3—)n—Ra4—CO—(—O—Ra5—O—)—CO—Ra6—Ra7  (A4).

The application belongs to the technical field of image processing, and particularly relates to a multi-exposure fusion method for separating illumination and motion; low-exposure images, medium-exposure images and high-exposure images are subjected to illumination preprocessing and input into a fusion model; the low-exposure images and the high-exposure images are mapped to the illumination level of the medium-exposure images and normalized according to first gamma values and second gamma values, to obtain first new medium-exposure images and second new medium-exposure images, and the new medium-exposure images are subjected to motion alignment with the medium-exposure images; the first new medium-exposure images and the second new medium-exposure images are subjected to inverse gamma transformation respectively, to obtain new low-exposure images and new high-exposure images, and the new low-exposure images and the new high-exposure images are subjected to illumination fusion with the medium-exposure images to obtain a high dynamic range image, loss is calculated, and model parameters are trained by back propagation; a to-be-processed image is obtained, and a corresponding high dynamic range image of the to-be-processed image is obtained by using the trained fusion model; the application adopts the idea of separating illumination and motion, so that the high dynamic range image retains more information of the input image, and ghosting is reduced.

The invention discloses a single-exposure-based three-dimensional reconstruction method for an object with a high reflective surface. The method comprises the following steps of: firstly, collecting a single group of phase shift fringe images under relatively low exposure for avoiding pixel saturation so as to preserve highlight area information; and then, a Retinex image enhancement algorithm based on guide filtering is adopted to process the image, the algorithm estimates an incident component through multi-scale guide filtering and performs gamma correction, principal component analysis weighted fusion with a multi-scale Retinex enhancement result is performed, dark region details are effectively recovered, and the overall contrast is improved. And then, extracting a wrapped phase from the enhanced image, and performing phase unwrapping through a multi-frequency heterodyne method to obtain an absolute phase. And finally, calculating to obtain a three-dimensional point cloud of the object in combination with system calibration parameters. According to the invention, the problem of low efficiency caused by the need of additional hardware or multiple exposure in the traditional technology is solved, and high-efficiency and high-precision reconstruction under single exposure is realized.

The utility model discloses an exposure device for circuit board surface pattern manufacturing, and particularly relates to the technical field of circuit board surface pattern manufacturing exposure, which comprises a placing table, and a circuit board surface pattern manufacturing exposure auxiliary device is arranged at the upper end of the placing table. The circuit board surface pattern manufacturing exposure auxiliary device comprises an exposure assembly and a moving and transferring assembly. Compared with the prior art, the exposure device for manufacturing the surface pattern of the circuit board has the advantages that after the upper exposure machine body and the lower exposure machine body complete exposure of the circuit board, the upper exposure glass frame and the lower exposure glass frame continuously move to the upper end of the material placing table to wait for subsequent processing work of a worker; according to the device, the circuit board is subjected to fixed and movable exposure work through simple feeding and discharging, the feeding and discharging exposure efficiency of the whole device is greatly improved, meanwhile, the operation difficulty of the whole device is further reduced, and the applicability and the use stability of the whole device are effectively enhanced.

The invention provides an exposure method and an exposure assembly of a metal mask substrate. The exposure method comprises the following steps: placing a metal mask substrate between a movable side photomask and a reference side photomask which are arranged opposite to each other, and respectively arranging breaking assemblies at the upper end and the lower end of the surface of the movable side photomask and outside an effective exposure area. The breaking assembly is made of soft materials, and the length of the breaking assembly is not smaller than the width of the metal mask base material. When the movable side photomask is attached to the metal mask base material, the thickness of the breaking assembly enables the breaking assembly and the movable side photomask to make contact with the metal mask base material at the same time. According to the technical scheme provided by the invention, the tension which is generated when the metal mask base material is extruded and points to the outside of the effective exposure area is blocked by additionally arranging the tension breaking assembly on the movable side photomask, the inconsistency of internal tensile stress is reduced, and the sliding extension of the metal mask base material is reduced, so that the size deviation value of an exposure pattern is reduced.