The invention provides an automatic identification
processing method and
system for errors of a photoetching
machine. The method comprises the following steps: sequentially performing position coarse alignment, inclination amount detection, position fine alignment and
exposure on a
wafer of the photoetching
machine; replacing an alignment
image acquisition area, an alignment mode and an alignment mark if position coarse alignment or fine alignment is unsuccessful, and replacing an
exposure focal plane position, a focusing mode and a focusing position if inclination amount detection reports errors; if
exposure is abnormal and fine alignment is performed on the complete acquisition area, the focusing mode and the focusing position are replaced, and if fine alignment is performed on the incomplete acquisition area, the previous
exposure value is used; and if the action of the photoetching
machine is abnormal, stopping the action and giving an alarm. According to the invention, detection parameters of coarse alignment, inclination amount detection, fine alignment and exposure abnormity of the
wafer of the photoetching machine are automatically adjusted, the unnecessary
error reporting downtime frequency of the machine is reduced, and the influence of shutdown of the machine on the running amount and the
wafer quality is avoided; and meanwhile, the standing time,
batch number and error signals of the wafer are monitored to find machine abnormity in time, so that the loss caused by abnormity of a certain module of the machine is reduced.