479 results about "Chemical solution" patented technology

The present application relates to the technical field of contaminated soil cleaning, and particularly relates to a cleaning equipment for treating soil pollution, which comprises a base plate, a containing box is fixed on the top of the base plate, a metal mesh bag is fixed in communication at the bottom of the containing box, squeezing mechanisms are arranged around the metal mesh bag, the squeezing mechanism comprises a lead screw, an L-shaped rod one is in screw transmission on the outside of the lead screw, and a squeezing plate is fixed at one end of the L-shaped rod one. In the present application, the contaminated soil is contained by using the metal mesh bag, the two squeezing plates arranged relatively around the metal mesh bag can successively and staggeredly squeeze the soil, which is convenient for crushing the contaminated soil, makes the soil fully contact with the leaching agent for purification, and also facilitates fully crushing the soil to make it fall to the bottom of the chemical solution tank through the mesh holes of the metal mesh bag, the impurities such as plastics, stones and packaging bags which are not easy to be squeezed and crushed are left in the metal mesh bag, and the impurities in the contaminated soil are cleaned out.

The invention discloses a plastic part xenon lamp aging machine with a spraying system, and belongs to the technical field of material weather resistance testing equipment. The equipment comprises an aging chamber, a xenon lamp light source and a spraying system, and the spraying system realizes flexible switching spraying of pure water and a chemical solution through cooperative operation of a liquid supply unit (comprising double liquid storage tanks and a four-way switching valve), a nozzle unit (a multidirectional adjustable nozzle), a liquid recovery device (a collecting tank and a recovery pump) and a control unit. The control unit accurately controls the concentration and flow of the mixed solution by adjusting the opening degree of the flow valve, residual liquid is emptied through the four-way valve and the liquid drainage pipeline to avoid cross contamination, the spraying angle is dynamically adjusted through the multi-directional nozzle to ensure uniform coverage, and the recycling device recycles waste liquid in a classified mode to reduce resource consumption. The problems of single spraying mode, residual liquid pollution, uneven coverage and low waste liquid treatment efficiency of traditional equipment are solved, and the aging test accuracy, the environment simulation authenticity and the resource utilization rate are remarkably improved.

Devices and associated methods for storing and dispensing a chemical solution or mixture are disclosed and described. In one embodiment, such a device can comprise a liquid container including a first chamber operable to retain a first liquid and a second chamber operable to retain a second liquid. In one embodiment, the spray device can comprise a first pump partially within the first chamber operable to aspirate and retain the first liquid, and a second pump partially within the second chamber operable to aspirate and retain the second liquid. In another embodiment, the spray device can comprise a plurality of mixing spaces fluidly coupled to the first pump and the second pump and operable to allow mixing of the first liquid and the second liquid. In another aspect, the spray device can comprise a nozzle fluidly coupled to the plurality of mixing spaces.

The invention relates to the technical field of chemical solution treatment, in particular to a device for reducing the viscosity of a slurry solution and a using method thereof.The device for reducing the viscosity of the slurry solution comprises a bottom bearing table, a closed stirring tank and a stirring detection set used for reducing the viscosity of the slurry solution. Slurry is stirred through the stirring assembly in the stirring detection group, a physical treatment mode is adopted, additional chemical substances do not need to be added, interference of additional components on slurry components is avoided, and the use and maintenance cost of chemical additives is reduced; the slurry in treatment is periodically detected through a detection assembly in the stirring detection group, the slurry reaching the expected viscosity is found in time, the overall production efficiency is improved while the production cost is reduced, dual detection is performed on the neutralized slurry through mutual cooperation of the detection assembly and the central control system, and the production efficiency is improved. And the viscosity of the discharged slurry is guaranteed.

A solution applicator assembly comprises an upper body defining an upper channel. The upper body further includes a primary inlet fluidly connected to the upper channel. A lower body defines a lower channel being fluidly connectable to the upper channel to define a central channel. The lower body further defines a primary outlet fluidly connected to the lower channel. A flow control insert is removeably receivable in the central channel for receiving a chemical solution from the upper channel and releasing the solution into the lower channel. The upper body and the lower body are removeably connectable to one another to selectively allow the flow control insert to be removed and positioned in the central channel.

The invention relates to the technical field of display, and provides a photomask, a metal mask plate and a preparation method, the photomask comprises a pattern definition area, the pattern definition area is used for defining a pixel opening area of the metal mask plate, the pattern definition area is a closed pattern formed by four concave arcs and fillets connected with the concave arcs, the pixel opening area is a rounded rectangle, the center of the graph definition area coincides with the center of the pixel opening area, and the area of the graph definition area is smaller than that of the pixel opening area. The pattern of the pattern definition area transferred on the metal mask can enable the liquid medicine to be more uniformly distributed on the whole surface, effectively reduce the formation of eddy current and dead zones, and avoid the retention of the liquid medicine in a local area, thereby reducing the problems of impurity accumulation and incomplete reaction, reducing inconsistent etching caused by non-uniform flow, and improving the etching quality. Therefore, the etching uniformity of the fillet and the etching uniformity of the straight edge of the pixel opening area of the metal mask plate are improved.

The utility model discloses a wafer carrier for chemical plating, and relates to the field of wafer equipment. The wafer carrier for chemical plating comprises a carrier main body which is provided with a plurality of supporting grooves capable of supporting wafers; the matching piece is arranged above the carrier main body and connected with the carrier main body, and the matching piece is configured to be connected through a transferring mechanism so as to flow in the plurality of plating tanks; and the coating structure covers the plurality of supporting grooves, and the coating structure is configured to be in direct contact with the wafer when the wafer is loaded to the carrier main body. The wafer carrier for chemical plating provided by the utility model can reduce the influence on the flowing mode of a chemical solution and improve the quality of chemical plating.

A chemical agent according to one embodiment of the present invention contains a pH adjusting agent and at least one oxidant that is selected from the group consisting of metaperiodic acid, a metaperiodate salt, orthoperiodic acid, an orthoperiodate salt, permanganic acid, a permanganate salt and N-methylmorpholine N-oxide.

The invention relates to the field of integrated circuit manufacturing, in particular to the technical field of manufacturing of semiconductor device special equipment such as a photoetching machine and an etching machine special for production, and provides a through hole filling electroplating method and system for a printed circuit board. The method comprises the following steps: carrying out laser micro-through-hole processing on the printed circuit board; carrying out glue removal treatment on the printed circuit board with the micro through hole; carrying out black hole treatment or direct electroplating treatment on the degummed printed circuit board; performing porefilling electroplating on the treated printed circuit board by using an acidic copper plating porefilling special liquid medicine; in the hole filling electroplating process, a multi-stage electroplating current parameter program is adopted, in-hole pre-plating is carried out at low current density in the initial stage, it is ensured that hole walls are evenly covered, after the main hole filling stage is started, pulse or periodic reverse current is adopted, the current density is increased in a stepped mode, and through holes are filled with acid copper plating hole filling special liquid medicine; and parameters are adjusted at the last stage of filling to ensure that the copper thickness of the hole surface is uniform, and dished pits or excessive recesses are avoided.

This utility model relates to the field of water treatment technology, and in particular to an intelligent control dosing device, including a mixing tank. The inner wall of the mixing tank is equipped with dosing components, and a mounting plate is installed on one side wall of the mixing tank. This utility model controls the lifting stroke of a metering cylinder via an electric actuator. When the metering cylinder descends below the water level, it draws the chemical solution by gravity. After rising to a specific position, the chemical solution is again discharged under gravity through a corresponding cylindrical groove, a circular hole, and an outlet pipe, achieving quantitative dosing. Three sets of dosing components are arranged side-by-side on the crossbeam. According to actual needs, all three sets can be selected for simultaneous dosing, significantly improving work efficiency and meeting the needs of large-scale production scenarios. Alternatively, designated valves can be flexibly closed, allowing for individual dosing through designated outlet pipes, enhancing the device's versatility and practicality. The inlet pipe and dosing pipe independently transport water and chemicals. Combined with a bottom motor-driven stirring shaft, this ensures thorough mixing of the chemical solution within the mixing tank, effectively avoiding localized uneven concentrations.

The invention discloses a method for treating a metal surface through ethylene glycol butyl ether after a fire disaster. The treatment method comprises the following steps that modified ethylene glycol butyl ether is prepared; sequentially adding modified ethylene glycol butyl ether serving as a main chemical solution into the reaction kettle according to the quantitative percentage, and carrying out mixed reaction; standing the mixed chemical solution in the step S2 for 10-20 minutes, and adding water to dilute the mixed solution according to the remaining percentage of the volume of the reaction kettle; the ethylene glycol butyl ether is modified and serves as a main component of the cleaning solution, the sodium phosphate, the epichlorohydrin, the sodium pyrophosphate and the trichloroethylene are mixed according to a proper proportion, a proper amount of water is added for dilution, and the cleaning solution is obtained. Dirt formed by fire disasters on the metal surface can be effectively removed, and metal objects cannot be damaged.

To provide a chemical storage tank that is simple and inexpensive to construct, yet can adequately maintain the properties of the chemical solution. [Solution] A chemical storage tank comprising a chemical tank 1 for containing a separable chemical solution, a bubble discharge unit 2 for discharging bubbles into the chemical tank 1 to agitate the chemical solution, a gas supply means 3 for supplying gas to the bubble discharge unit 2, and a chemical injection means 4. The gas supply means 3 comprises a tube 6, a pressure regulating device 7, and a solenoid valve 8. The chemical injection means 4 comprises a suction pipe 11, a tube 12, and a chemical injection pump 13.

The invention relates to the field of semiconductor manufacturing, and discloses a semiconductor wafer wet etching device which comprises a shell, a working chamber and an inner chamber are arranged in the shell, an etching tank is fixedly installed in the inner chamber, a pump is installed at the bottom of the etching tank in a communicating mode, and a filter box is installed in an inner cavity of the inner chamber. And the water outlet end of the pump communicates with the filter box, and four sets of backflow pipes are fixedly connected to the bottom of the outer surface of the filter box. According to the device, through redesign, a chemical solution flowing back into the etching tank enters along the tangential direction of the etching tank and forms an anticlockwise vortex in the etching tank, and at the moment, the chemical solution in the whole etching tank starts to rotate, so that the chemical solution continuously passes through the surfaces of a plurality of groups of wafer bodies in a moving form; and the vortex accelerates the combination of the gas and forms bubbles to be discharged, so that the chemical solution can be more fully contacted and reacted with the surface of the wafer body.

The utility model relates to the technical field of knitting needle surface treatment, and discloses a knitting needle surface and corner angle high-precision chemical polishing device which comprises a working box, the inner wall of the working box is connected with a supporting frame in a sliding mode, the lower surface of the supporting frame is fixedly connected with a fixing sleeve, the upper surface of the fixing sleeve is fixedly connected with a stepping motor, and the stepping motor is connected with the working box in a sliding mode. And the output end of the stepping motor penetrates through the interior of the fixing sleeve and is fixedly provided with a fixing seat, the lower surface of the fixing seat is fixedly connected with a fixing plate, the outer wall of the fixing plate is fixedly connected with an electric push rod, and the output end of the electric push rod is fixedly connected with an L-shaped block. According to the knitting needle polishing device, the fixing base, the fixing plate, the electric push rod, the L-shaped block, the U-shaped frame, the L-shaped frame and the clamping block are matched with one another, the knitting needle body is clamped and fixed, the polishing stability of the knitting needle body in a chemical solution is improved, uniform chemical polishing of the surface and edges and corners of the knitting needle is achieved, and scratches and excessive abrasion are avoided.

To provide a technology that can reduce detachment of a catalyst layer due to the supply of an etching solution.SOLUTION: An etching apparatus according to an embodiment of the present disclosure includes a holder that holds a substrate having a catalytic layer containing a precious metal on its surface, a first slit nozzle that ejects an etching solution onto the substrate, and a first drive source that moves the first slit nozzle relative to the holder, and the etching solution is a chemical solution that etches an area of the substrate that comes into contact with the catalytic layer through a catalytic reaction with the catalytic layer.SELECTED DRAWING: Figure 1

The present application relates to the technical field of chemical experiment, and specifically relates to a chemical experiment table with chemical solution treatment function, which comprises a chemical experiment table composed of a table body, a water tank and a storage rack, a controller is arranged on the table body, the controller is signal connected with a touch display screen, neutralization cavities are symmetrically arranged in the middle of the table body, a PH sensor is arranged in each neutralization cavity, a fixing block is fixedly connected to the side wall of each neutralization cavity, vibration grooves are formed in the two sides of the inner wall of the table body, a neutralization pipe is slidably arranged in the middle of each neutralization cavity, a plurality of through holes are formed in the neutralization pipe, a waste liquid pipe is connected to the top of each neutralization cavity, a three-way pipe is connected to the bottom of each neutralization cavity, a collecting assembly and a sewage assembly are arranged at the other two ends of the three-way pipe respectively, and an auxiliary assembly is arranged in the vibration groove. The structure for preliminary neutralization treatment of chemical solution arranged below the chemical experiment table can avoid the leakage risk and high subsequent treatment cost caused by the temporary storage of the traditional experiment table relying on the collecting barrel.

The application relates to the technical field of circuit board processing, in particular to a surface treatment device for circuit board processing, which comprises a copper immersion tank, a walking structure, a control box, a lifting structure, a air-drying structure, a clamping structure, a hanging basket structure, an adjusting structure, a feeding structure, a conveying structure and a circuit board body; the lifting structure is used for lifting the hanging basket structure, meanwhile, the lifting of the lifting structure can adjust the air-sweeping range of the air-drying structure, the air-sweeping effect is improved, the air-drying process of the circuit board body is accelerated, the chemical solution in one copper immersion tank is prevented from entering another copper immersion tank, and the copper immersion effect is affected; the clamping structure can clamp the hanging basket structure and the circuit board body, and cooperates with the feeding structure to assist the feeding of the circuit board body, so that the feeding efficiency is improved; the position of the partition strip is adjusted through the adjusting structure, and the distance between the hanging basket top frame and the hanging basket bottom frame is adjusted at the same time, different sizes of circuit board bodies are conveniently loaded, and the applicability of the device is improved.

This invention discloses a water quality detection and treatment device based on intelligent water management, relating to the field of water technology. It includes a treatment tank, a detector, and a mixing assembly. The treatment tank is internally divided into a mixing chamber and a detection chamber by a partition hopper. The invention employs a transmission mechanism where a second electric actuator drives a first transmission assembly, which in turn drives a second transmission assembly upwards to seal the discharge port of the partition hopper. Water from the detection chamber flows into the mixing chamber. After a suitable amount of chemical solution is added through a dosing pipe, the first electric actuator drives a third transmission assembly, which in turn drives the mixing assembly to stir the water in the mixing chamber, ensuring thorough mixing of the water and chemical solution. After sealing the discharge port of the partition hopper, when cleaning water is added to the detection chamber, the second transmission assembly drives a cleaning assembly to clean the inner wall of the partition hopper, preventing residual substances in the water from affecting subsequent test data.

The invention relates to the technical field of sewage treatment, in particular to a gravel processing wastewater treatment system and method.The gravel processing wastewater treatment system comprises a sewage tank, a dosing pool and a control module, a water inlet pipe and a water outlet pipe are arranged on the sewage tank, the dosing pool is communicated with the sewage tank through a dosing pipe, and a dosing pump is arranged on the dosing pipe; a third detection unit, a fourth detection unit, a mixing cavity and a premixing chamber are arranged on the dosing tank. The premixing chamber and the mixing cavity are arranged on the dosing tank, after high-concentration liquid medicine is diluted to the preset concentration through the mixing cavity, new liquid medicine is continuously supplemented into the dosing tank, stirring and mixing actions in the dosing tank are omitted, continuous liquid supplementing is conducted on the dosing tank under the working condition, and the dosing efficiency is improved. The continuous automatic dosing work of one dosing pool in cooperation with the sewage tank is achieved, the dosing amount in the dosing work is matched with the wastewater treatment demand amount, and the production cost, the operation cost and the maintenance cost of the gravel processing wastewater treatment system are effectively reduced.

A handheld reactive electrochemical application system is provided. The handheld reactive electrochemical application system includes a power supply configured to be electrically coupled to a substrate and a hydrogel electrically coupled to the power supply. The hydrogel includes a reactive chemical solution. The hydrogel is configured to contact the substrate, the power supply is configured to pass a current through the hydrogel and the substrate, and the reactive chemical solution is configured to treat the substrate when the current is passed through the hydrogel and the substrate.

The invention provides a substrate processing apparatus capable of separating a chemical solution from a mixed solution of the chemical solution and an organic solvent with low energy. The substrate processing apparatus includes a processing unit, a recovery pipe (60a), and a recovery unit (6). The processing unit causes a mixed solution of the chemical solution and the organic solvent to act on the main surface of the substrate. The recovery pipe (60a) has an upstream end connected to the processing unit. The mixed liquid from the processing unit flows into a recovery pipe (60a). The recovery unit (6) includes a separation membrane (72c) that separates the chemical solution from the liquid mixture supplied through the recovery pipe (60a) and increases the concentration of the organic solvent in the liquid mixture.

The utility model discloses chemical solution filtering equipment, which relates to the technical field of filtering equipment, and comprises a filtrate bottle, a liquid storage bottle and a filter screen, the upper end of the liquid storage bottle is provided with a feed port, the liquid storage bottle is arranged at the upper end of the filtrate bottle, and the filter screen is arranged between the communicating ends of the liquid storage bottle and the filtrate bottle. A communicated exhaust pipe is fixedly connected to the side wall of the filtrate bottle, a motor is fixedly connected to the upper end of the liquid storage bottle, a rotating rod is fixedly connected to the output end of the motor, a stirring part is fixedly connected to the side wall of the rotating rod, and a placement groove is formed in the lower end of the rotating rod; the chemical solution filtering device; by arranging the stirring piece, the auxiliary discharging piece and the sealing piece, the guide rod rotates to drive the supporting rod, the supporting rod drives the pressing roller and the scraping plate to rotate on the filtering net, the scraping plate shovels up foreign matter on the filtering net, the pressing roller downwards presses the shoveled foreign matter, and therefore the solution penetrating efficiency of the filtering net can be improved.

An increase in voltage of a light-emitting device manufactured through a step of forming an aluminum oxide film in contact with an organic compound layer is inhibited. An organic compound film is formed over a first electrode. An organic mask film containing an organic compound which has low solubility to water or a chemical solution including water as a solvent is formed over the organic compound film. An inorganic mask layer is formed over the organic mask film. Shapes of the organic mask film and the organic compound film are processed with the use of the inorganic mask layer, whereby an organic mask layer and an organic compound layer are formed. At least parts of the inorganic mask layer and the organic mask layer are removed with the use of water or a liquid including water as a solvent.

The invention relates to the technical field of water treatment, in particular to a sludge dewatering agent preparing and adding system which comprises a tank body, a water inlet pipe and a water outlet pipe. The jacket is arranged on the outer side of the tank body, and a closed cavity is formed between the jacket and the tank body; the feeding device is arranged at the top of the tank body; the jet head is arranged on the inner wall of the tank body; the jet head is communicated with the closed cavity; the stirring device comprises a driving mechanism, a dispersing disc and a stirring rod; the driving mechanism is fixedly arranged at the top of the tank body; a driving shaft of the driving mechanism extends into the tank body; the top of the dispersion disc is of a circular truncated cone structure; diversion trenches are uniformly distributed on the inclined surface of the circular truncated cone structure; the diversion trench extends along the generatrix of the circular truncated cone structure; the dispersing disc is sleeved on the driving shaft, and the stirring rod is fixedly arranged at the bottom of the dispersing disc; the aeration device is arranged at the bottom of the inner side of the tank body; and the aeration device is communicated with the closed cavity. By adopting the chemical mixing device, the chemical mixing efficiency can be improved, the mixing uniformity and the chemical solution concentration stability are improved, and accurate chemical supply is guaranteed.

The environment-friendly technology for rubber paste production comprises the following steps that S1, pretreatment is conducted, specifically, waste water generated in the rubber paste production process enters a pretreatment pool to be pretreated, a grating and a screen are arranged in the pretreatment pool, and large suspended solids in the waste water are removed; s2, mixing reaction: introducing water into stirring equipment, adding a liquid medicine according to the quality of the wastewater, and rapidly mixing the liquid medicine with the wastewater through the stirring equipment to neutralize the pH value and the drug power in the wastewater. S4, precipitation: feeding the wastewater subjected to the mixed reaction into a precipitation tank, and standing for a certain time to obtain preliminarily clarified water. And S5, filtering: enabling the clarified water to pass through a filter tank, and intercepting residual fine suspended matters and colloidal substances. S6, disinfection: adding a disinfectant into the filtered water to kill pathogenic microorganisms such as bacteria and viruses in the water. The stirring equipment in the step S2 comprises a stirring tank, so that the liquid medicine can be quickly diffused in each layer and region of the water body.

To provide a boom folding / developing mechanism and a boom sprayer having the same which is down-sized while maintaining a boom crash mitigation function when a piston cylinder is extended and shrunk at a constant speed, and which can prevent a generation of scattered spots by protecting a chemical liquid supply hose for supplying chemical liquid.SOLUTION: A boom folding / developing mechanism 3 for folding and developing a boom 2 of a boom sprayer 1 includes: a folding axis support part 31 for axially supporting the boom in a foldable manner is arranged and divided into two in a direction perpendicular to a longitudinal direction of the boom 2; and a link member 32 arranged in a swinging manner which folds the boom 2 by swinging on a base end side and develops the boom 2 by swinging to a tip end side so as to fit between the two divided folding axis support part 31. Also, the link member 32 is covered and concealed by a first axial support cover 23 and a second axial support cover 24, and a chemical liquid supply hose 5 is provided above a chemical liquid spray nozzle 4.SELECTED DRAWING: Figure 1

This invention discloses a high-temperature chemical solution supply system for cleaning substrates. The system includes a solution tank for containing a chemical solution; a first pump, the inlet of which is connected to the solution tank, and the outlet of which is connected to a buffer tank; a buffer tank including a tank body, an exhaust pipe, and a needle valve, one end of which is connected to the tank body and the other end to the solution tank, and the needle valve mounted on the exhaust pipe for regulating the pressure within the buffer tank; and a second pump, the inlet of which is connected to the buffer tank, and the outlet of which is connected to a cleaning chamber for cleaning the substrate. When the second pump is in the open state, the first pump and the needle valve are also in the open state. The pressure within the buffer tank is regulated by the needle valve and the first pump, causing the chemical solution in the buffer tank to be forced into the inlet of the second pump. This invention also provides a substrate cleaning apparatus including a high-temperature chemical solution supply system and an ultrasonic / megasonite device, as well as a method for cleaning substrates.

The utility model relates to the technical field of pressure containers, and discloses a tower type pressure container which comprises a pressure tank, supporting legs are fixedly connected to the bottom of the pressure tank, a fixing disc is fixedly connected to the top of the pressure tank, a filtering mechanism is arranged at the top of the fixing disc, a deslagging mechanism is arranged at the top of the pressure tank, and a water tank is arranged at the bottom of the pressure tank. The filtering mechanism is composed of a mounting assembly and a filtering assembly, the filtering assembly comprises a connecting rod, the right side of the connecting rod is fixedly connected with a rotating shaft disc, the right side of the rotating shaft disc is rotatably connected with a contraction disc, the mounting assembly comprises a storage disc, and the surface of the storage disc is fixedly connected with a connecting disc. According to the utility model, the filter screen is designed at the filling port of the pressure container, so that the chemical solution does not need to be manually filtered in advance, the chemical solution is filtered before entering the container, the control connection with a production system is realized, the operation steps are reduced, the pretreatment time is shortened, and the pressure container is more efficiently put into use.

The reciprocating etching machine comprises an etching assembly, a movable assembly and a driving assembly, the etching assembly comprises an etching box, a supporting frame and a loading frame, the supporting frame is arranged in an inner cavity of the etching box, and the loading frame is arranged in an inner cavity of the supporting frame and used for loading glass; the movable assembly is connected with the etching box, and the supporting frame is erected on the movable assembly; and the driving assembly is arranged on one side of the movable assembly. According to the reciprocating etching machine, the driving assembly and the movable assembly are arranged, so that when glass is subjected to chemical etching, the movable assembly can be driven by the driving assembly to do reciprocating motion front and back, and therefore, the movable assembly drives the glass which is placed in the etching box and subjected to chemical etching treatment to do reciprocating motion synchronously; and furthermore, the chemical solution left between the glass and the loading frame can be shaken, so that the situation that the chemical solution is left, partial areas of the glass are etched deeper, water waves are generated on the surface of the glass, and the quality of the glass is influenced is avoided.

To provide a wiring board and a wiring member capable of suppressing corrosion of a wiring layer and peeling of an insulating layer by making it difficult for a chemical solution to enter between the insulating layer and the wiring layer.SOLUTION: The wiring layer 102 includes a connection wiring portion 113 between the wiring portion 111 and the pad portion 112. The connection wiring portion 113 includes a plurality of connection wirings 121. Each of the connection wirings 121 is separated by the plurality of holes 122. In the wiring portion 102, a plurality of hole portions 122 are formed such that a conductor region including the plurality of connection wirings 121 has a mesh structure in the connection wiring portion 113. At least one connection wiring 121 and at least one hole portion 122 can be arranged on a linear band connecting the connection area arranged on the wiring portion 111 side and the connection area arranged on the pad portion 112 side.SELECTED DRAWING: Figure 1