767 results about "Chemical solution" patented technology

Systems and techniques may include enhancing production of a natural resource from a reservoir in the earth.By pumping and circulating a material through a reservoir, where the material interacts with proppant or formation material in fracture zones, the interaction reduces permeability in an overproductive fracture zone and redirects flow to an underproductive fracture zone. Through this self-correcting feedback mechanism, flow redistributes more uniformly across multiple fracture zones over time, resulting in more even permeability distribution and improved reservoir performance. The systems and techniques enable passive treatment using chemical solutions that create self-correcting permeability changes, leading to more controlled and efficient resource recovery from subsurface reservoirs.

The invention provides welding equipment for photovoltaic support assembly, and belongs to the technical field of photovoltaic support welding, the welding equipment comprises a supporting frame and a processing table, the supporting frame is connected with a supporting seat, an electric sliding table is arranged on the inner side of the supporting seat, an air cylinder and a welding head are arranged on one side of the electric sliding table, and a pipeline assembly is arranged on the inner side of the supporting seat; the eliminating assembly is used for cleaning dirt on the inner wall of the pipeline assembly; the screening assembly is used for filtering the cooling water in the pipeline assembly; the cooling device has the beneficial effects that the extrusion block can extrude the pressure sensor by increasing the water pressure, so that a chemical solution is released into the spiral cooling pipe, adhesion of impurities to the inner wall of the spiral cooling pipe is reduced, the cooling effect on a welding head is guaranteed, heat damage to the welding head is relieved by timely heat dissipation and cooling, the service life is prolonged, and the production cost is reduced. Meanwhile, the filter cartridge is cleaned through the scraper, so that the blockage of the filter cartridge is reduced, and the filtering effect is improved.

The invention relates to a laser processing system and method for array micropores. The method comprises the following steps: selecting and preparing a chemical solution according to a to-be-processed material; determining the number of laser beams, the size of a galvanometer and machining parameters of each layer; a laser focus is positioned on the upper surface of the to-be-machined material, axial feeding machining is conducted on the first layer according to the determined machining parameters, the micropore morphology is obtained during machining, and machining of the next layer is conducted when set requirements are met; a laser focal plane is positioned to a machining plane after machining of the upper layer is finished, axial feeding machining is carried out on the current layer according to the determined machining parameters, machining of the next layer is carried out during machining when the micropore morphology meets the set requirement, and execution is repeated till the focal plane passes through the lower surface of the material to form a through hole; and the target material is moved to the next machining position, the laser beam is adjusted to the initial machining state, and repeated machining of the micropores is conducted. Through a variable-parameter layer-by-layer girdling technology, a focal plane is flush with the surface of a material to be processed, and light spot dispersion and energy density reduction caused by enlargement of laser light spots are avoided.

The invention discloses a photovoltaic TOPCon battery piece etching device, relates to the technical field of silicon piece etching, and aims to solve the technical problems that corrosives generated in the etching process easily pollute a chemical solution, so that the service life of the chemical solution is shortened, and the etching uniformity is reduced. The photovoltaic TOPCon battery piece etching device comprises a workbench, and an etching groove, a cleaning groove and a supporting frame are arranged at the top of the workbench; a movable frame is arranged on the supporting frame in a sliding mode, a movable unit is arranged in the movable frame, the movable end of the movable unit is connected with a lifting frame, an etching cover assembly and a silicon wafer frame assembly are arranged below the lifting frame, the silicon wafer frame assembly is movably arranged in the etching cover assembly, the etching cover assembly comprises a cover body frame, and a micropore filter screen is arranged at the bottom of the cover body frame. A plurality of baffles are movably arranged on the side wall of the cover body frame. The chemical solution in the etching tank can be kept pure, and the service life of the chemical solution is prolonged.

To provide a radiopharmaceutical production apparatus and the like capable of reducing the generation amount of radioactive waste.SOLUTION: A radiopharmaceutical production apparatus 51 comprises: a cassette 20 which has a reagent supply port, a radionuclide supply port, a drug solution outlet, a reaction unit, a purification column, and flow paths respectively connecting the reagent supply port and the reaction unit, the radionuclide supply port and the reaction unit, the reaction unit and the purification column, and the purification column and the drug solution outlet; and a cassette mounting unit to which the cassette 20 is attachable and detachable.SELECTED DRAWING: Figure 3

The present application relates to the technical field of contaminated soil cleaning, and particularly relates to a cleaning equipment for treating soil pollution, which comprises a base plate, a containing box is fixed on the top of the base plate, a metal mesh bag is fixed in communication at the bottom of the containing box, squeezing mechanisms are arranged around the metal mesh bag, the squeezing mechanism comprises a lead screw, an L-shaped rod one is in screw transmission on the outside of the lead screw, and a squeezing plate is fixed at one end of the L-shaped rod one. In the present application, the contaminated soil is contained by using the metal mesh bag, the two squeezing plates arranged relatively around the metal mesh bag can successively and staggeredly squeeze the soil, which is convenient for crushing the contaminated soil, makes the soil fully contact with the leaching agent for purification, and also facilitates fully crushing the soil to make it fall to the bottom of the chemical solution tank through the mesh holes of the metal mesh bag, the impurities such as plastics, stones and packaging bags which are not easy to be squeezed and crushed are left in the metal mesh bag, and the impurities in the contaminated soil are cleaned out.

The invention provides a temporary bonding adhesive and a preparation method and application thereof.The temporary bonding adhesive is prepared from organosilicone epoxy resin, a curing agent and an organic solvent, and the organosilicone epoxy resin is obtained after hydrogen-containing silicone oil and an alkenyl-terminated epoxy compound are subjected to an addition reaction and a hydrolytic condensation reaction; the organic silicon epoxy resin is selected as matrix resin, and is matched with the curing agent and the organic solvent, so that the obtained temporary bonding adhesive has high elastic modulus and excellent thermal stability, a wafer can be helped to pass through a multi-section complex manufacturing process, the temporary bonding adhesive can be separated from the wafer in a mechanical mode, and the yield of the wafer is improved. And the coating is very simple to use, has excellent chemical liquid corrosion resistance, and is very suitable for processing and manufacturing wafers.

The invention discloses a plastic part xenon lamp aging machine with a spraying system, and belongs to the technical field of material weather resistance testing equipment. The equipment comprises an aging chamber, a xenon lamp light source and a spraying system, and the spraying system realizes flexible switching spraying of pure water and a chemical solution through cooperative operation of a liquid supply unit (comprising double liquid storage tanks and a four-way switching valve), a nozzle unit (a multidirectional adjustable nozzle), a liquid recovery device (a collecting tank and a recovery pump) and a control unit. The control unit accurately controls the concentration and flow of the mixed solution by adjusting the opening degree of the flow valve, residual liquid is emptied through the four-way valve and the liquid drainage pipeline to avoid cross contamination, the spraying angle is dynamically adjusted through the multi-directional nozzle to ensure uniform coverage, and the recycling device recycles waste liquid in a classified mode to reduce resource consumption. The problems of single spraying mode, residual liquid pollution, uneven coverage and low waste liquid treatment efficiency of traditional equipment are solved, and the aging test accuracy, the environment simulation authenticity and the resource utilization rate are remarkably improved.

To provide a passenger conveyor liquid-medicine spray device that allows passengers to use the moving handrail with peace of mind.SOLUTION: A passenger conveyor liquid-medicine spray device comprises a liquid-medicine spray device body 21a provided in the section constituting the entrance in the moving direction of multiple steps 4 of a passenger conveyor 1 and spraying the liquid-medicine having at least one of antibacterial, germicidal and disinfectant properties from a first spray port 15a to a moving handrail 6, a first detection part 30a to detect the passenger boarding a passenger conveyor 1, a second detection part 31a installed closer to the passenger conveyor 1 side than the first detection part 30a and to detect the passenger boarding the passenger conveyor 1, a walking speed calculation part 43 to calculate the passenger walking speed based on the detected information by the first detection part 30a and by the second detection part 31a, and a liquid-medicine spray control part 46 to activate the liquid-medicine spray device body 21a based on the calculated walking speed by the walking speed calculation part 43 and to cause the device to spray the chemical solution.SELECTED DRAWING: Figure 2

Devices and associated methods for storing and dispensing a chemical solution or mixture are disclosed and described. In one embodiment, such a device can comprise a liquid container including a first chamber operable to retain a first liquid and a second chamber operable to retain a second liquid. In one embodiment, the spray device can comprise a first pump partially within the first chamber operable to aspirate and retain the first liquid, and a second pump partially within the second chamber operable to aspirate and retain the second liquid. In another embodiment, the spray device can comprise a plurality of mixing spaces fluidly coupled to the first pump and the second pump and operable to allow mixing of the first liquid and the second liquid. In another aspect, the spray device can comprise a nozzle fluidly coupled to the plurality of mixing spaces.

The utility model discloses a soil pollution detection device, which relates to the technical field of soil pollution detection, and comprises a base and a mounting box, a vessel for storing a chemical solution is arranged in the base, the mounting box is arranged at the top of the base, a soil crushing device is arranged in the mounting box, an electromagnetic seat is fixedly arranged in the base, and the vessel is fixedly arranged at the top of the electromagnetic seat. The soil crushing device comprises a rotating shaft and crushing rods, a crushing barrel is fixedly arranged in the mounting box, the rotating shaft is rotationally arranged in the crushing barrel, the multiple crushing rods are fixed to the outer side of the rotating shaft, a motor is arranged at the top of the mounting box, the output end of the motor is fixed to the rotating shaft, and a feeding port is formed in the top of the mounting box; according to the device, soil is crushed through the crushing rod, soil powder falls down through the screen holes and falls into the vessel, the stirrer is driven by magnetic force to rotate, a solution and the powder are stirred and mixed, and the soil and a chemical reagent are evenly and fully fused.

The invention relates to the technical field of chemical solution treatment, in particular to a device for reducing the viscosity of a slurry solution and a using method thereof.The device for reducing the viscosity of the slurry solution comprises a bottom bearing table, a closed stirring tank and a stirring detection set used for reducing the viscosity of the slurry solution. Slurry is stirred through the stirring assembly in the stirring detection group, a physical treatment mode is adopted, additional chemical substances do not need to be added, interference of additional components on slurry components is avoided, and the use and maintenance cost of chemical additives is reduced; the slurry in treatment is periodically detected through a detection assembly in the stirring detection group, the slurry reaching the expected viscosity is found in time, the overall production efficiency is improved while the production cost is reduced, dual detection is performed on the neutralized slurry through mutual cooperation of the detection assembly and the central control system, and the production efficiency is improved. And the viscosity of the discharged slurry is guaranteed.

A solution applicator assembly comprises an upper body defining an upper channel. The upper body further includes a primary inlet fluidly connected to the upper channel. A lower body defines a lower channel being fluidly connectable to the upper channel to define a central channel. The lower body further defines a primary outlet fluidly connected to the lower channel. A flow control insert is removeably receivable in the central channel for receiving a chemical solution from the upper channel and releasing the solution into the lower channel. The upper body and the lower body are removeably connectable to one another to selectively allow the flow control insert to be removed and positioned in the central channel.

The invention relates to the technical field of pollutant treatment and regeneration, in particular to a reaction tank sediment collection and centralized treatment system. The treatment system comprises a track, a carrier loader running along the track and a centralized treatment system located at one end of the track. A mud suction system is loaded on the carrier loader body, a mechanical arm is arranged on the carrier loader, and an adsorption head is installed at the tail end of the mechanical arm. The adsorption head comprises a sludge suction pipe, an adsorption opening is formed in the bottom of the sludge suction pipe, and a waterproof cover is arranged at the bottom of the sludge suction pipe and sleeves the sludge suction pipe. The sludge suction system comprises a positive pressure air source, a negative pressure air source, a separator and a temporary storage box, the negative pressure air source is connected with the separator, and the separator is communicated with the sludge suction pipe through a pipeline; the separator is connected with a temporary storage box; the positive pressure air source is communicated with the positive pressure cavity; and the centralized treatment system is used for collecting and treating sediments in the temporary storage box of the sludge suction system. According to the technical scheme, sediments at the bottom of the reaction tank can be cleaned in leisure time of production, and waste of chemical solutions can be reduced when the sediments are adsorbed.

The invention relates to the technical field of display, and provides a photomask, a metal mask plate and a preparation method, the photomask comprises a pattern definition area, the pattern definition area is used for defining a pixel opening area of the metal mask plate, the pattern definition area is a closed pattern formed by four concave arcs and fillets connected with the concave arcs, the pixel opening area is a rounded rectangle, the center of the graph definition area coincides with the center of the pixel opening area, and the area of the graph definition area is smaller than that of the pixel opening area. The pattern of the pattern definition area transferred on the metal mask can enable the liquid medicine to be more uniformly distributed on the whole surface, effectively reduce the formation of eddy current and dead zones, and avoid the retention of the liquid medicine in a local area, thereby reducing the problems of impurity accumulation and incomplete reaction, reducing inconsistent etching caused by non-uniform flow, and improving the etching quality. Therefore, the etching uniformity of the fillet and the etching uniformity of the straight edge of the pixel opening area of the metal mask plate are improved.

The utility model discloses a wafer carrier for chemical plating, and relates to the field of wafer equipment. The wafer carrier for chemical plating comprises a carrier main body which is provided with a plurality of supporting grooves capable of supporting wafers; the matching piece is arranged above the carrier main body and connected with the carrier main body, and the matching piece is configured to be connected through a transferring mechanism so as to flow in the plurality of plating tanks; and the coating structure covers the plurality of supporting grooves, and the coating structure is configured to be in direct contact with the wafer when the wafer is loaded to the carrier main body. The wafer carrier for chemical plating provided by the utility model can reduce the influence on the flowing mode of a chemical solution and improve the quality of chemical plating.

The utility model discloses a fly ash and slag salt leaching device which comprises a container, an annular plate is fixedly installed in the container, a filter plate is arranged in the container, the filter plate is annular and placed on the annular plate, a flow guide piece is arranged in the container, the flow guide piece is conical and located in the filter plate, a supporting piece is arranged at the lower end in the container, and the supporting piece is connected with the annular plate. According to the fly ash and slag salt leaching device, materials are put in from the center of the top of the flow guide piece, fall into the center of the top of the flow guide piece, are guided to the lower portion through the flow guide face of the top of the flow guide piece and are annularly distributed, and the materials are separated from the flow guide face of the top of the flow guide piece and are separated from the flow guide face of the top of the flow guide piece. The materials fall on different positions of the filter plate, and the chemical solution can be in more effective contact with the materials, so that salt and other impurities in fly ash and slag are more comprehensively removed. Therefore, the washing efficiency can be improved, and the washing time and energy consumption can be reduced.

Environmentally-clean wildfire inhibitor liquid biochemical solutions produced from an aqueous mixture of alkali metal salt derived from a non-polymerized saturated carboxylic acid such as butyric acid, and dissolved in water along with a dispersing and coalescing agent, realized as an ester of a non-polymerized saturated carboxylic acid, and dissolved in the water to provide a liquid fire inhibitor solution that can be sprayed on combustible surfaces to form thin alkali metal salt crystalline coatings on the combustible surfaces when and as water molecules in the liquid fire inhibitor evaporate to the environment during drying operations, to inhibit fire ignition, flame spread and smoke development.

A chemical agent according to one embodiment of the present invention contains a pH adjusting agent and at least one oxidant that is selected from the group consisting of metaperiodic acid, a metaperiodate salt, orthoperiodic acid, an orthoperiodate salt, permanganic acid, a permanganate salt and N-methylmorpholine N-oxide.

The invention relates to the field of integrated circuit manufacturing, in particular to the technical field of manufacturing of semiconductor device special equipment such as a photoetching machine and an etching machine special for production, and provides a through hole filling electroplating method and system for a printed circuit board. The method comprises the following steps: carrying out laser micro-through-hole processing on the printed circuit board; carrying out glue removal treatment on the printed circuit board with the micro through hole; carrying out black hole treatment or direct electroplating treatment on the degummed printed circuit board; performing porefilling electroplating on the treated printed circuit board by using an acidic copper plating porefilling special liquid medicine; in the hole filling electroplating process, a multi-stage electroplating current parameter program is adopted, in-hole pre-plating is carried out at low current density in the initial stage, it is ensured that hole walls are evenly covered, after the main hole filling stage is started, pulse or periodic reverse current is adopted, the current density is increased in a stepped mode, and through holes are filled with acid copper plating hole filling special liquid medicine; and parameters are adjusted at the last stage of filling to ensure that the copper thickness of the hole surface is uniform, and dished pits or excessive recesses are avoided.

A Method is provided for the hydrometallurgical production of Iron, Lead and Silver from Red Mud and Slug of pyrometallurgy and other similar type of secondary concentrates - residues of production processes, with high concentrations of Iron, Lead and Silver, as well as from residues of Copper White Dust -dust from converters. By applying the proposed method, it is possible to hydrometallurgical production of Iron, Lead and Silver efficiently, from the specific materials, which come from pyrometallurgical methods and other metal production. This specific method enables the hydrometallurgical extraction - production of iron, Lead and Silver from the specific residues of hydrometallurgical and pyrometallurgical processes, using new chemical solutions and processing lines, which until now could not be processed efficiently and essentially remained unutilized, due to low concentrations or due to the chemical compounds in which the metals were found, rendering them non-recoverable.

To provide a substrate processing system and a method for forming and removing a protective layer such that a metallic area of a substrate can be protected from oxidation.SOLUTION: A method for forming and removing a protective layer according to the present disclosure is a method for forming and removing the protective layer and has a step for forming the protective film on the surface of a substrate using a chemical solution, and a step for removing the protective film by irradiating the protective film with ultraviolet light.SELECTED DRAWING: Figure 1

This utility model relates to the field of water treatment technology, and in particular to an intelligent control dosing device, including a mixing tank. The inner wall of the mixing tank is equipped with dosing components, and a mounting plate is installed on one side wall of the mixing tank. This utility model controls the lifting stroke of a metering cylinder via an electric actuator. When the metering cylinder descends below the water level, it draws the chemical solution by gravity. After rising to a specific position, the chemical solution is again discharged under gravity through a corresponding cylindrical groove, a circular hole, and an outlet pipe, achieving quantitative dosing. Three sets of dosing components are arranged side-by-side on the crossbeam. According to actual needs, all three sets can be selected for simultaneous dosing, significantly improving work efficiency and meeting the needs of large-scale production scenarios. Alternatively, designated valves can be flexibly closed, allowing for individual dosing through designated outlet pipes, enhancing the device's versatility and practicality. The inlet pipe and dosing pipe independently transport water and chemicals. Combined with a bottom motor-driven stirring shaft, this ensures thorough mixing of the chemical solution within the mixing tank, effectively avoiding localized uneven concentrations.

The invention discloses a method for treating a metal surface through ethylene glycol butyl ether after a fire disaster. The treatment method comprises the following steps that modified ethylene glycol butyl ether is prepared; sequentially adding modified ethylene glycol butyl ether serving as a main chemical solution into the reaction kettle according to the quantitative percentage, and carrying out mixed reaction; standing the mixed chemical solution in the step S2 for 10-20 minutes, and adding water to dilute the mixed solution according to the remaining percentage of the volume of the reaction kettle; the ethylene glycol butyl ether is modified and serves as a main component of the cleaning solution, the sodium phosphate, the epichlorohydrin, the sodium pyrophosphate and the trichloroethylene are mixed according to a proper proportion, a proper amount of water is added for dilution, and the cleaning solution is obtained. Dirt formed by fire disasters on the metal surface can be effectively removed, and metal objects cannot be damaged.

To provide a droplet generation device capable of generating droplets from a liquid with an energy density higher than conventionally and preventing damaging of a component, an ink jet device, and a liquid medicine delivery device.SOLUTION: A droplet generation device 100 fully reflects an incident laser beam LSR 1 on a full-reflection surface 6A to apply evanescent light EVL seeping out from the full-reflection surface 6A to a liquid body 2 to conductive nanoparticles 7. The droplet generation device 100 excites plasmon resonance at the conductive nanoparticles 7 by means of the evanescent light EVL, increases field intensity at a position separated from the full-reflection surfacer 6A to apply energy to the liquid body 2, and forms the liquid body 2 into droplets.SELECTED DRAWING: Figure 1

To provide a chemical storage tank that is simple and inexpensive to construct, yet can adequately maintain the properties of the chemical solution. [Solution] A chemical storage tank comprising a chemical tank 1 for containing a separable chemical solution, a bubble discharge unit 2 for discharging bubbles into the chemical tank 1 to agitate the chemical solution, a gas supply means 3 for supplying gas to the bubble discharge unit 2, and a chemical injection means 4. The gas supply means 3 comprises a tube 6, a pressure regulating device 7, and a solenoid valve 8. The chemical injection means 4 comprises a suction pipe 11, a tube 12, and a chemical injection pump 13.

The invention relates to the field of semiconductor manufacturing, and discloses a semiconductor wafer wet etching device which comprises a shell, a working chamber and an inner chamber are arranged in the shell, an etching tank is fixedly installed in the inner chamber, a pump is installed at the bottom of the etching tank in a communicating mode, and a filter box is installed in an inner cavity of the inner chamber. And the water outlet end of the pump communicates with the filter box, and four sets of backflow pipes are fixedly connected to the bottom of the outer surface of the filter box. According to the device, through redesign, a chemical solution flowing back into the etching tank enters along the tangential direction of the etching tank and forms an anticlockwise vortex in the etching tank, and at the moment, the chemical solution in the whole etching tank starts to rotate, so that the chemical solution continuously passes through the surfaces of a plurality of groups of wafer bodies in a moving form; and the vortex accelerates the combination of the gas and forms bubbles to be discharged, so that the chemical solution can be more fully contacted and reacted with the surface of the wafer body.

An intermediate assembly (Sa) of a drug solution administration device (10) is provided with a first unit (U1) and a second unit (U2) attached to the first unit (U1). The first unit (U1) has a hollow cylindrical housing (12). The second unit (U2) has a drive unit (D) and is attached to a fixing part (27) of the housing (12) of the first unit (U1). In a state in which a syringe (16) is not accommodated inside the first unit (U1), the second unit (U2) is provisionally fixed to the fixing part (27) of the first unit (U1). In a state in which the second unit (U2) is removed from the first unit (U1) and the provisional fixed state is disengaged, and in which the syringe (16) is accommodated inside the housing (12) of the first unit (U1), the second unit (U2) and the first unit (U1) can be formally fixed.

The utility model relates to the technical field of knitting needle surface treatment, and discloses a knitting needle surface and corner angle high-precision chemical polishing device which comprises a working box, the inner wall of the working box is connected with a supporting frame in a sliding mode, the lower surface of the supporting frame is fixedly connected with a fixing sleeve, the upper surface of the fixing sleeve is fixedly connected with a stepping motor, and the stepping motor is connected with the working box in a sliding mode. And the output end of the stepping motor penetrates through the interior of the fixing sleeve and is fixedly provided with a fixing seat, the lower surface of the fixing seat is fixedly connected with a fixing plate, the outer wall of the fixing plate is fixedly connected with an electric push rod, and the output end of the electric push rod is fixedly connected with an L-shaped block. According to the knitting needle polishing device, the fixing base, the fixing plate, the electric push rod, the L-shaped block, the U-shaped frame, the L-shaped frame and the clamping block are matched with one another, the knitting needle body is clamped and fixed, the polishing stability of the knitting needle body in a chemical solution is improved, uniform chemical polishing of the surface and edges and corners of the knitting needle is achieved, and scratches and excessive abrasion are avoided.

To provide a technology that can reduce detachment of a catalyst layer due to the supply of an etching solution.SOLUTION: An etching apparatus according to an embodiment of the present disclosure includes a holder that holds a substrate having a catalytic layer containing a precious metal on its surface, a first slit nozzle that ejects an etching solution onto the substrate, and a first drive source that moves the first slit nozzle relative to the holder, and the etching solution is a chemical solution that etches an area of the substrate that comes into contact with the catalytic layer through a catalytic reaction with the catalytic layer.SELECTED DRAWING: Figure 1