Broadband efficient GaN-based LED chip based on surface plasma effect and preparation method thereof
A surface plasmon and LED chip technology, applied in semiconductor devices, electrical components, nanotechnology, etc., can solve problems such as reducing composite life, and achieve the effects of improving current density, reducing loss, and improving modulation bandwidth
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Embodiment 1
[0087] A broadband high-efficiency GaN-based LED chip based on the surface plasmon effect, with a structure such as Figure 1-8 shown.
[0088] A micro-nano composite structure is prepared on the surface of the p-GaN of the flip-chip LED chip; the microstructure is a circular frustum with a triangular lattice distribution, the lattice constant is 2 μm, the diameter of the upper bottom of the circular frustum is 1.3 μm, and the diameter of the lower bottom is 1 μm. The nanostructure is a cylinder of hexagonal lattice distribution distributed on the entire p-GaN surface, the lattice constant is 100 nm, the height and diameter of the cylinder are 50nm, and the bottom of the cylinder located in the recess of the microstructure is 10 away from the top of the quantum well 5 nm; a metal mirror layer 8 is prepared on the p-GaN layer 7 to form a micro-nano composite metal structure.
[0089] Preparation of the above-mentioned broadband high-efficiency GaN-based LED chip based on the ...
Embodiment 2
[0101] A broadband high-efficiency GaN-based LED chip based on the surface plasmon effect, with a structure such as Figure 2-7 shown.
[0102] A micro-nano composite structure is prepared on the surface of the p-GaN of the flip-chip LED chip; the micron structure is a one-dimensional grating with a lattice constant of 3 μm, the diameter of the upper bottom of the grating hole is 1.8 μm, and the diameter of the lower bottom is 1.5 μm. The bottom is 30 nm away from the top of the quantum well 5; the nanostructure is located at the bottom of the microstructure recess, and is an irregular structure randomly distributed, the height and width of the irregular structure are 50nm, and the gap between the irregular structures is 200nm; A metal mirror layer 8 is prepared on the GaN layer 7 to form a micro-nano composite metal structure.
[0103] To prepare the above-mentioned broadband high-efficiency GaN-based LED chip based on the surface plasmon effect, the preparation process is a...
Embodiment 3
[0113] A broadband high-efficiency GaN-based LED chip based on the surface plasmon effect, with a structure such as Figure 3-8 shown.
[0114] A micro-nano composite structure is prepared on the surface of the p-GaN of the flip-chip LED chip. The microstructure is a cuboid with a hexagonal lattice distribution, the lattice constant is 4 μm, and the side length of the cuboid is 2 μm. The nanostructure is a circular truncated triangular lattice distribution distributed on the entire p-GaN surface, the lattice constant is 250 nm, the height and diameter of the circular truncated are 125 nm, and the bottom of the circular truss located in the recess of the microstructure is 40° away from the top of the quantum well 5 nm. A metal mirror layer 8 is prepared on the p-GaN layer 7 to form a micro-nano composite metal structure.
[0115] Preparation of the above-mentioned broadband high-efficiency GaN-based LED chip based on the surface plasmon effect, the preparation process diagra...
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