The invention provides a high-speed VCSEL
laser epitaxial structure. The
laser epitaxial structure comprises a GaAs substrate; a GaAs buffer layer, an N type doped DBR, an
active layer, an oxidization limiting layer, a P type doped DBR and an
ohmic contact layer are deposited on the GaAs substrate by adopting MOCVD in sequence; and the oxidization limiting layer is formed by multiple Al<1-x>Ga<x>As epitaxial
layers with freely adjustable Ga components, wherein X is the
Ga element component. According to the
laser epitaxial structure, the multiple
layers of Al<1-x>Ga<x>As with certain thickness and
jumping components are adopted to form the oxidization limiting layer; and the front-end shape of the oxidization limiting layer can be changed by adjusting the components in each layer of Al<1-x>Ga<x>As, so that a lens structure can be formed at the front end of the oxidization limiting layer, and
photon scattering loss can be lowered, thereby improving the
modulation bandwidth of the VCSEL. The laser epitaxial structure has the following advantages: 1) by adjusting the ratio of Ga in the oxidization limiting layer, the oxidization rate of the oxidization limiting layer is lowered, the oxidization can be controlled easily, and the product yield of the VCSEL
chip is improved; and 2) the oxidization limiting layer is high in thickness and low in intrinsic stray
capacitance.