Deposition method of low-stress corrosion-resistant multilayer diamond-like carbon (DLC) film

A deposition method and corrosion-resistant technology, applied in the coating, superimposed layer plating, metal material coating process, etc., can solve the problem of reducing the life of the diamond-like carbon film, increasing the number and complexity of the interface, reducing the internal stress of the diamond-like carbon, etc. problems, to extend the service time, improve corrosion resistance and long-term stability, high hardness

Inactive Publication Date: 2014-07-23
SOUTHWEST JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These multi-layer DLC film technologies generally use silicon, metal or metal carbide layers (not DLC films) as stress release layers, which are alternately deposited with hydrogen-free diamond-like carbon (DLC) layers, which can greatly reduce the internal stress of diamond-like carbon (DLC) films. Stress, so that the thickness of the film can reach the micron level, and can maintain the excellent tribological properties of the DLC film; but in the preparation process, other elements (such as titanium, silicon, chromium, etc.) ) / metal element (non-DLC film) interface, which increases the number and complexity of the interface, which makes the DLC film in the long-term service in the solution medium, due to the disordered arrangement of interface elements and the difference in electrochemical potential of interface elements (carbon element / metal element) Cause galvanic corrosion, lead to instability of the interface, peel off the diamond-like multilayer film, and reduce the life of the diamond-like film[[8]C.V.Falub,etc.In vitro studies of the adhesion of diamond-like carbon thin films on CoCrMo biomedical implant alloy. Acta Materialia, 2011(59):4678–4689]

Method used

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  • Deposition method of low-stress corrosion-resistant multilayer diamond-like carbon (DLC) film
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  • Deposition method of low-stress corrosion-resistant multilayer diamond-like carbon (DLC) film

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Embodiment 1

[0027] A method for depositing a low-stress, corrosion-resistant multilayer diamond-like carbon (DLC) film, the steps of which are:

[0028] A. Put the workpiece into the vacuum chamber of the magnetic filter vacuum arc source equipment with microwave plasma source, and evacuate to a pressure of 1.0×10 -3 Pa, feed argon gas into the vacuum chamber to carry out 20 minutes of sputter cleaning on the workpiece;

[0029]B. Turn on the graphite cathode arc power supply of the magnetic filter vacuum arc source equipment, so that the graphite cathode arc discharges to generate carbon ions, and at the same time apply a pulse negative bias of 2000V with a frequency of 10kHz and a duty cycle of 50% on the workpiece, on the surface of the workpiece Perform carbon ion implantation / deposition for 2 minutes to form an implant transition layer;

[0030] C. Then feed argon and acetylene into the vacuum chamber. The flow ratio of argon and acetylene is 1:3. The gas pressure in the vacuum cham...

Embodiment 2

[0038] A method for depositing a low-stress, corrosion-resistant multilayer diamond-like carbon (DLC) film, the steps of which are:

[0039] A. Put the workpiece into the vacuum chamber of the magnetic filter vacuum arc source equipment with microwave plasma source, and evacuate to a pressure of 3.0×10 -3 Pa, feed argon gas into the vacuum chamber to carry out sputtering cleaning on the workpiece for 30 minutes;

[0040] B. Turn on the graphite cathode arc power supply of the magnetic filter vacuum arc source equipment, so that the graphite cathode arc discharges to generate carbon ions, and at the same time apply a pulse negative bias voltage of 5000V with a frequency of 20kHz and a duty cycle of 40% on the workpiece, on the surface of the workpiece Perform carbon ion implantation / deposition for 1 minute to form an implant transition layer;

[0041] C. Then feed argon and acetylene into the vacuum chamber. The flow ratio of argon and acetylene is 1:5. The gas pressure in the...

Embodiment 3

[0045] A method for depositing a low-stress, corrosion-resistant multilayer diamond-like carbon (DLC) film, the steps of which are:

[0046] A. Put the workpiece into the vacuum chamber of the magnetic filter vacuum arc source equipment with microwave plasma source, and evacuate to a pressure of 2.0×10 -3 Pa, feed argon gas into the vacuum chamber to carry out sputtering cleaning on the workpiece for 30 minutes;

[0047] B. Turn on the graphite cathode arc power supply of the magnetic filter vacuum arc source equipment, so that the graphite cathode arc discharges to generate carbon ions, and at the same time apply a pulse negative bias voltage of 1800V with a frequency of 15kHz and a duty cycle of 30% on the workpiece, on the surface of the workpiece Perform carbon ion implantation / deposition for 3 minutes to form an implant transition layer;

[0048] C. Then feed argon and methane into the vacuum chamber, the flow ratio of argon and methane is 1:0.1, the gas pressure in the ...

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Abstract

The invention discloses a deposition method of a low-stress corrosion-resistant multilayer diamond-like carbon (DLC) film. A vacuum cathode arc source deposition process and a plasma-reinforced chemical vapor deposition process are alternately adopted to alternately deposit hydrogen-free and hydrogen-containing DLC films. The method can deposit a micron-sized-thick multilayer DLC film, which has the advantages of high hardness, low stress, favorable bonding properties, favorable corrosion resistance and high stability, on the surface of a workpiece, thereby greatly prolonging the service time of the workpiece in a liquid medium environment.

Description

technical field [0001] The invention belongs to the technical field of surface engineering, in particular to a deposition method of a multilayer diamond-like carbon (DLC) film. Background technique [0002] Diamond-like carbon film (DLC) has the characteristics of high hardness, low friction coefficient, high wear resistance and chemical inertness. Depositing diamond-like carbon film (DLC) on the surface of key parts can improve the wear resistance of parts. According to whether it contains hydrogen or not, diamond-like carbon films can be divided into two categories: hydrogen-containing DLC ​​films and hydrogen-free DLC films. Hydrogen-containing DLC ​​films generally have lower stress and can be deposited to form thicker films. However, compared with non-hydrogen-containing DLC ​​films, their hardness and strength are lower, and their friction coefficient is larger in a liquid medium environment. Poor [[1] M. Suzuki, T. Ohana, A. Tanaka. Tribological properties of DLC fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/04
Inventor 冷永祥张腾飞孙鸿黄楠
Owner SOUTHWEST JIAOTONG UNIV
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