69 results about "Sputter cleaning" patented technology

The invention relates to a method for preparing a carbon-doped titanium oxide thin film with photocatalytic activity. The method is characterized by adopting CO2 as the carbon source and a high purity metallic titanium target as the sputtering target to prepare a carbon-doped titanium oxide thin film with photocatalytic activity on a stainless steel or glass substrate and specifically comprises the following steps: a. firstly implanting nitrogen ions to enhance the stainless steel substrate of a mirror surface to improve the strength of the surface of the stainless steel substrate; b. fixing the stainless steel or glass substrate enhanced by the nitrogen ions on a target table, vacuumizing the stainless steel or glass substrate to 10<-3>Pa, filling argon to clean the substrate for 5-15 minutes and then carrying out sputter cleaning on the target for 2-8 minutes; c. keeping the partial pressure of argon to be 0.3-0.7Pa, introducing CO2 to ensure the partial pressure in a vacuum chamber to reach 0.4-0.9Pa, keeping the target-substrate distance to be 50-100mm, starting a sputtering power supply, controlling the sputtering current to be 3A and substrate bias to be minus 150V and carrying out sputtering deposition for 10-120 minutes; and d. after the sputtering deposition process is completed, keeping vacuum cooling to the room temperature and then taking out the prepared sample. The method has the following beneficial effects: the carbon-containing composite target is unnecessary to be prepared; the process stabilization repeatability is good; the gas source is convenient; the method is simple; the coating cost is low; and the problem of photocatalyst immobilization can be solved.