69 results about "Sputter cleaning" patented technology

The invention discloses a method for preparing a slow-release type skeleton-type TiN/Cu-Zu metal layer antibacterial film and relates to a preparation method of an antibacterial film, which solves the problem that an antibacterial film prepared by the conventional method has poor durability of antibacterial effect. The method has the following steps of: 1. putting a matrix on a target platform of a vacuum room; and then heating to 200 DEG C and sputter cleaning for 20 min; 2. rotating the target platform of the vacuum room under the condition that argon flow is 6sccm, nitrogen flow is 2sccm, deposition pressure is 0.56Pa, and the deposition bias of the matrix is compound bias; and alternately depositing TiN layers and metal layers on the surface of the matrix till the total thickness of film layers is 0.1 micrometer-10 micrometers to obtain the slow-release type skeleton-type TiN/Cu-Zu metal layer antibacterial film. After the slow-release type skeleton-type TiN/Cu-Zu metal layer antibacterial film is soaked for three months, the ion dissolving speed is not reduced, and the antibiosis rate against colibacillus can still reach above 97%.

A solar cell device includes a solar cell panel having an outer surface and a cleaning system. The cleaning system includes a cleaning component configured for sputtering a cleaning fluid to clean the outer surface, and a controller. The controller is electrically connected to the cleaning component and is configured for controlling the cleaning component.

The invention discloses a method for preparing a high-purity corrosion-resistant aluminum coating on a titanium alloy component. The method comprises the following steps by adopting high-power intermediate frequency magnetron sputtering equipment: removing oil strain from the surface of a component; performing argon plasma sputter cleaning on the component; and depositing an aluminum coating, wherein the component is the titanium alloy component. Comprehensive properties such as coating thickness, density, binding force, coating temperature and the like are adjusted by adjusting different process parameters; and a layer of aluminum coating with high comprehensive properties is deposited on the surface of the titanium alloy component so that aluminum coatings formed on the two sides of the titanium alloy component have the comprehensive properties.

A method of forming a polymer tie layer on a metal surface by cleaning the metal surface with solvent; cleaning the metal surface with oxygen plasma; sputter cleaning the metal surface with argon using a lower chuck bias plasma generating unit; functionalizing the metal surface; and depositing the tie layer on the metal surface by radio frequency plasma deposition under pulsed conditions of a duty cycle, where the duty cycle is reduced over time. This method produces a tie layer chemically bound to the metal surface. The tie layer, thus, has high bonding strength to the metal and high elasticity, making it very resistant to cracks, scratches, delamination, and wicking. The tie layer can have functional groups on its surface for the chemical attachment of a second coating, or can act on its own by providing lubricity or blood compatibility, or both to the underlying metal.

The invention relates to a method for preparing a carbon-doped titanium oxide thin film with photocatalytic activity. The method is characterized by adopting CO2 as the carbon source and a high purity metallic titanium target as the sputtering target to prepare a carbon-doped titanium oxide thin film with photocatalytic activity on a stainless steel or glass substrate and specifically comprises the following steps: a. firstly implanting nitrogen ions to enhance the stainless steel substrate of a mirror surface to improve the strength of the surface of the stainless steel substrate; b. fixing the stainless steel or glass substrate enhanced by the nitrogen ions on a target table, vacuumizing the stainless steel or glass substrate to 10<-3>Pa, filling argon to clean the substrate for 5-15 minutes and then carrying out sputter cleaning on the target for 2-8 minutes; c. keeping the partial pressure of argon to be 0.3-0.7Pa, introducing CO2 to ensure the partial pressure in a vacuum chamber to reach 0.4-0.9Pa, keeping the target-substrate distance to be 50-100mm, starting a sputtering power supply, controlling the sputtering current to be 3A and substrate bias to be minus 150V and carrying out sputtering deposition for 10-120 minutes; and d. after the sputtering deposition process is completed, keeping vacuum cooling to the room temperature and then taking out the prepared sample. The method has the following beneficial effects: the carbon-containing composite target is unnecessary to be prepared; the process stabilization repeatability is good; the gas source is convenient; the method is simple; the coating cost is low; and the problem of photocatalyst immobilization can be solved.

The invention discloses a preparation method of a recyclable surface film of an inferior vena cava filter based on (PEG) polyethylene glycol-like, which comprises the following steps of: feeding the inferior vena cava filter in a plasma polymerization vacuum chamber; when the vacuum degree reaches 0.5Pa, introducing argon gas with the flow of 2.5sccm and carrying out sputter cleaning for 15 minutes under the conditions that the radio-frequency power is 100W and the negative bias voltage is 80V; after the sputter cleaning is finished, vacuumizing the vacuum chamber to be 0.5Pa again; and introducing a reacting gas of tetraglycol dimethyl ether and depositing a plasma polymer thin film for 30-120 minutes under the conditions that the work pressure is 2-5Pa, the radio-frequency power is 5-30W, the negative bias voltage is 80V and the pulse duty factor is 10-100 percent. The inferior vena cava filter prepared by the method disclosed by the invention has strong binding force between the surface-like PEG thin film layer and the inferior vena cava filter and excellent bioremediation performance for resisting protein and cell from adhering.

The invention discloses a preparation method of a 6LiF conversion film used for a 4H-SiC-based semiconductor neutron detector. The preparation method mainly includes the following steps: a single-crystal 4H-SiC matrix is respectively immersed in acetone and absolute ethyl alcohol for ultrasonic cleaning; impurities in the single-crystal 4H-SiC matrix are removed by using of the method of unsymmetrical pressure anti-sputter-cleaning, and impurities of 6LiF target material are removed by using of the method of pre-sputter-cleaning; the 6LiF target material is used as a magnetic-control target, and a 6LiF coating is deposited on the single-crystal 4H-SiC matrix in a sputtered mode; argon is used as luminance build-up gas for the sputtering cleaning and the sputtering deposition; and the sputtering deposition is controlled by magnetism so that the thickness of the 6LiF coating can reach a designed thickness, the vacuum degree in a reaction magnetron sputtering coated vacuum furnace is adjusted to not less than 10<-3>Pa, the 6LiF coating is discharged from the furnace after natural cooling, and then the 6LiF coating conversion film deposited on the 4H-SiC matrix is obtained. The obtained 4H-SiC/6LiF conversion film has the advantages of being small in size, high in detection efficiency, irradiation-damage-resisting, heat-resisting, strong in n/gamma screening capacity and the like, preparation technology is simple in operation, and the thickness of the 6LiF conversion film can be controlled.

The invention relates to a super-lubricated surface strengthening method of a graphite-like carbon film for a high-speed gear. The method comprises the following steps: firstly, sequentially carrying out shot blasting, micro-jetting and fluid polishing pre-treatment on the surface of the gear to enable the surface smoothness of the gear to be less than 0.2 micron; then, by adopting an unbalanced magnetron sputtering composite target technology, introducing elements such as Y and Ta into a graphite-like carbon film preparation technology to prepare a graphite-like carbon film with ultralow friction coefficient on the surface of the gear, namely carrying out sputter cleaning on the surface of a base metal 1; and sequentially preparing a Cr transitional layer 3, a Cr/C gradient layer 4 and a graphite-like composite work layer 5 with ultralow friction coefficient on a fluid polishing surface layer 2. The method provided by the invention solves the problem that a solid lubricating film of the high-speed gear is short in service life, and the vibrating noise of the high-speed gear is effectively reduced. The vibrating noise of a transmission gear by adopting the technology is reduced by 10-15%, so that the method provides a novel technical path for reducing the vibrating noise of the gear.

The invention discloses a bias voltage regulation and control aperture plate plasma immersion ionic deposition DLC method, and relates to a plasma immersion ionic deposition DLC method. The method aims at solving the problems that when an existing MPIID method is used for depositing a DLC film, the bonding force is poor, the performance of the film is not prone to being regulated and controlled, and the DLC film deposited on large or complex parts is uneven. The method includes the steps that (1) an aperture plate and a workpiece are arranged in a vacuum chamber, the workpiece is placed on a sample support in the aperture plate, the aperture plate and the workpiece are insulated, the aperture plate is connected with a aperture plate high-voltage pulse power source, and the workpiece is connected with a workpiece high-voltage pulse power source; (2) workpiece sputter cleaning is carried out; (3) plasma nitrogen treatment is carried out; (4) sputtering etching treatment is carried out; (5) a SiC transition layer is manufactured; and (6) a bias voltage regulation and control thin film is manufactured. The method is used for manufacturing the bias voltage regulation and control aperture plate plasma immersion ionic deposition DLC film.

The invention discloses a method for preparing an antifriction wear-resistant F-DLC film on a titanium alloy surface. A plate hollow cathode HP-PECVD method is adopted. According to the plate hollow cathode HP-PECVD method, on the basis of a traditional PECVD method, a sample disk for carrying samples in an existing deposition system reaction chamber is changed into two parallel plates; a base body is placed between the two plates; negative bias voltage is applied to the space between the two plates to form a hollow cathode effect. The method specifically comprises the following steps of (1) pretreatment; (2) sputter cleaning; (3) deposition of a Si transition layer; and (4) deposition of the F-DLC film. The F-DLC film deposited on the titanium alloy surface through the method has the antifriction wear-resistant function, the tribology performance of titanium alloy in the vivo environment can be improved, and the problem that aseptic loosening complications caused by frictional wear of titanium alloy artificial joints is solved.

The invention discloses a low temperature preparation method for a space silicon carbide reflector module modified layer. The low temperature preparation method for the space silicon carbide reflector module modified layer comprises the following steps of (1) SiC substrate cleaning: cleaning an SiC substrate by using ultra-phonic for 10-15 minutes and then drying the SiC substrate; (2) modified layer sputtering preparation: putting the cleaned SiC substrate onto a substrate frame of a film coating chamber of PVD film mulching equipment, and then vacuumizing the film coating chamber, and opening a baking device and baking at the temperature of 80-100 DEG C; (3) when the vacuum degree reaches 5x10-4P, opening an air inflating system to inflate methane as the reactant gas, and then cleaning the substrate in a re-sputter manner, and sputtering the substrate for 5-6 hours under the conditions that the bias voltage of the substrate is -50v[-]-200v and the sputtering power is 2000-3000W after the re-sputter cleaning, and finally obtaining a modified layer. According to the method, the modified layer is prepared in a magnetron sputtering manner by using methane as the reactant gas and reacting at 80-100 DEG C, so that the sputtering rate is high, the machining cycle of the modified layer of an SiC base is shortened and the energy source consumption is reduced.

The invention discloses a low-temperature manufacturing method and a special target of a ZnO transparent conductive film. The method comprises the following steps of: preparing a ceramic target by using V2O5 as a doping material of ZnO; carrying out plasma anti-sputter cleaning on a substrate with high-purity Ar; and then growing a V2O5-doped ZnO-based transparent conductive film at low temperature. The invention has the advantages that Zn<2+> is replaced with V<5+>, the valence state difference of the V<5+> and the Zn<2+> is 3, three conduction electrons can be provided, and then enough free carriers can be provided under the condition of low doping dose, the ionized impurity scattering is effectively lowered, the electron mobility is increased, and the combination property of the transparent conductive film is improved. Meanwhile, low-temperature growth realizes growth on flexible substrate materials such as organic polymers and the like and provides broader space for the application to flexible photoelectric devices. Treating the surface of the substrate in the way of plasma anti-sputter is beneficial to growing of high-quality films under the condition of low temperature.

The invention relates to a preparation method of a wear-resistant coating. The preparation method is used for preparing a hard coating on the surface of a substrate and comprises the following steps: selecting the substrate with predetermined size and performance; cleaning and drying a to-be-deposited surface of the substrate; performing sputter cleaning on the to-be-deposited surface of the substrate in a vacuum room of arc ion plating equipment; injecting inert gases and N2 into the vacuum room; depositing a nitride hard coating on the surface of the substrate by adoption of the arc ion plating technology, and in the deposition process, enabling gradient increase or circular gradient increase of the flowrate of N2 to facilitate adjusting the residual stress in the hard coating; and performing vacuum annealing on the hard coating on the substrate to finally obtain the wear-resistant coating with large thickness. Through gradient increase or circular gradient increase of the flowrate of N2, the residual stress of the coating with large thickness is effectively reduced, and the coating has better scratch resistance and fracture toughness.

The invention relates to a method for plating tantalum on the surface of TiNi alloy. The method solves the problem that the corrosion resistance property is poor when the TiNi alloy is implanted into the human body for a long time. The method comprises the follow steps: firstly, the TiNi alloy is mechanically polished, ultrasonically cleaned and dried; secondly, the sputter cleaning is carried out; thirdly, tantalum ions are used for bombarding the TiNi alloy which is then deposited and cooled to room temperature; and fourthly, the tantalum-plated TiNi alloy is just obtained after vacuum annealing. The tantalum-plated TiNi alloy prepared by the method has good corrosion resistance property, restricts Ni ions from dissolving out simultaneously and improves the biocompatibility. The invention has simple production process and convenient operation.

The invention discloses a method for preparing a high-hardness diamond film on the surface of medical cobalt-chrome-molybdenum (CoCrMo) alloy. The method comprises the following steps of: performing sputter-cleaning on polished and cleaned CoCrMo alloy by using hydrogen (H2) gas; depositing a silicon (Si) film transition layer on the surface of the CoCrMo alloy by taking silicane (SiH4) and hydrogen (H2) as a gas source by the conventional radio frequency plasma-enhanced chemical vapor deposition; and preparing a diamond like carbon (DLC) film on the Si film transition layer by taking methane (CH4) and hydrogen (H2) as a gas source by the conventional radio frequency plasma-enhanced chemical vapor deposition. Film bases prepared by the method are combined in a saw-toothed mode, good combination performance is represented between the film bases, and the defect of low boundary bearing capacity caused by low combination performance is overcome; meanwhile, the sp3C bond content of prepared DLC film is high, the DLC film with high hardness can be obtained and the wear resistance of the DLC film is effectively improved. In addition, the method has the advantages of simple process and low cost and has great application potential in the technical field of surface modification of a biomaterial.

The invention discloses a micro arc ion plating surface treatment method for a flexible gear for a harmonic reducer. The method comprises the following implementation steps that firstly, the cleaned and dried flexible gear is placed into a four-target micro arc ion plating device vacuum chamber; and after vacuum pumping is conducted, the four-target micro arc ion plating device vacuum chamber is inflated with argon, after surface impurities are removed through ion sputter cleaning, micro arc ion plating is conducted, certain electrical parameters are applied to a chromium target, a graphite target and the flexible gear, a pure chromium bottoming layer, a transition layer and an amorphous carbon work layer are sequentially deposited, and the vacuum chamber air pressure and film plating time are controlled. By means of the method, the reducer is endowed with the properties of high speed, high load bearing, low friction, abrasion resistance and self-lubrication, and therefore the technological content of domestic reducers is improved, and the service life of the domestic reducers is prolonged.

The invention discloses a preparation method of a polymer carbon film for anti-wear and anti-friction surface modification of fluororubber, and a fluororubber prepared by using the carbon film. The method comprises the following steps: fluororubber used as a substrate, and undergoes sputter cleaning; a medium-frequency magnetron sputtering deposition technique is used to carry out bombard sputtering on a graphite target to produce mixed plasma; and a medium-frequency pulse direct-current bias power supply is turned on during sputtering of the target to accelerate the mixed plasma to the substrate and deposit on the fluororubber substrate. The polymer-like carbon film prepared by the method is uniform and compact, is closely combined with the fluororubber substrate, and can achieve a high bonding strength without depositing a transition layer. The fluororubber modified by the method has a low friction coefficient in a vacuum (being less than 10 to 3 Pa) environment and an atmospheric environment, and has good wear resistance. The surface modification method is used to make the fluororubber substrate keep the original chemical structure and properties.

The invention discloses an ion chemical heat treating furnace having a glow discharge-aided heating function. A steel cylinder (4) is arranged in the vacuum chamber of a furnace body (2), a workpiece (5) to be processed is arranged on a workbench (6), and the cylinder, the workbench and the furnace body are mutually insulated. Prior to an ion chemical heat treatment, the negative pole of a direct current (DC) power supply (1) of the ion chemical heat treating furnace is connected to the cylinder by a change-over switch (8), and the cylinder generates a glow discharge and is heated, so that the workpiece can be preheated by the heat radiation of the cylinder. When the workpiece reaches a preheating temperature, the negative pole of the DC power supply is switched to the workbench, and the workpiece starts glow-discharge heating and is subject to the ion chemical heat treatment, so that the sputter cleaning time of the workpiece can be shortened, thereby preventing the DC power supply from over-current damage. In the ion chemical heat treatment process, the cylinder and the workpiece can be simultaneously connected to the negative pole of the DC power supply, the temperature uniformity of the workpiece can be improved by the aided heating of the cylinder, and the problem that the temperature of the workpiece is difficult to measure is also solved.