2239results about How to "Improve temperature uniformity" patented technology

A heating apparatus for heating a target object W is provided with a plurality of heating light sources, including LED elements for applying heating light having a wavelength within a range from 360 to 520 nm to the object. Thus, a temperature of only the shallow surface of the object, such as a semiconductor wafer, is increased / reduced at a high speed in uniform temperature distribution, irrespective of the film type.

A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater. A method of controlling the temperature in a reactor comprising providing a resistive heater in a chamber of a reactor, measuring the temperature with at least two temperature sensors, and controlling the temperature in the reactor by regulating a power supply to the first heating element and the second heating element according to the temperature measured by the first temperature sensor and the second temperature sensor.

Methods and apparatuses to improve the temperature uniformity of a workpiece being processed on a heated platen of a thermal processing station. A heated platen is enclosed in a housing incorporating an additional heat source that uniformly outputs thermal energy into the process chamber in which the heated platen is positioned. In preferred embodiments, this heat source is positioned in the lid of the housing. It is additionally preferred that the heated lid includes features that provide a gas flow path to introduce to and / or purge gas from the process chamber. In terms of photoresist performance, the improved thermal uniformity provided by using such an additional heat source in the housing, e.g., in the lid, offers improved line width control and line uniformity across a wafer.

A disclosed heating apparatus for heating a substrate on which a film is coated includes a process chamber having a gas supply opening for supplying a first gas to the process chamber and a gas evacuation opening for evacuating the first gas from the process chamber; a heating plate that is arranged in the process chamber and includes a heating element for heating the substrate; plural protrusions arranged on the heating plate so as to support the substrate; plural suction holes formed in the heating plate so as to attract by suction the substrate toward the heating plate; and a gas inlet adapted to supply a second gas to a gap between the heating plate and the substrate supported by the plural protrusions.

In chemical vapor deposition apparatus, a water carrier (32) has a top surface (34) holding the wafers and a bottom surface (36) heated by radiant heat transfer from a heating element (28). The bottom surface (36) of the wafer carrier is non-planar due to features such as depressions (54) so that the wafer carrier has different thickness at different locations. The thicker portions of the wafer carrier have higher thermal resistance. Differences in thermal resistance at different locations counteract undesired non-uniformities in heat transfer to the wafer. The wafer carrier may have pockets with projections (553, 853) for engaging spaced-apart locations on the edges of the wafer.

A system for treating a target region in tissue beneath a tissue surface comprises a probe for deploying an electrode array within the tissue and a surface electrode for engaging the tissue surface above the treatment site. Preferably, surface electrode includes a plurality of tissue-penetrating elements which advance into the tissue, and the surface electrode is removably attachable to the probe. The tissue may be treated in a monopolar fashion where the electrode array and surface electrode are attached to a common pole on an electrode surgical power supply and powered simultaneously or successively, or in a bipolar fashion where the electrode array and surface electrode are attached to opposite poles of the power supply. The systems are particularly useful for treating tumors and other tissue treatment regions which lie near the surface.

At least two blowers are controlled with baffles to create circulating zones of airflow which circulate in a substantially horizontal plane within a convection oven cavity. This airflow minimizes the potential for airflow paths to be broken up or blocked by the configuration of objects placed in the oven. The substantially horizontal airflow reduces the non-uniformity of air temperature distribution within the oven cavity. The blowers may be controlled to rotate either simultaneously or alternately, depending on the selected mode of operation. The blowers and associated heating elements are controlled to operate in various cooking modes by the controller in response to a mode selector input.

In this device for controlling the temperature of a battery of cylindrically-shaped electrochemical cells placed side by side, heat is conveyed by the flow of a heat-conveying fluid, which flow takes place inside a double wall whose section is in the form of circular arcs interconnected at their ends so that the junction points between the arcs are substantially in alignment. Relief is disposed in a baffle configuration inside the double wall to constrain the fluid to flow parallel to said section, alternately in one direction and then in the opposite direction. The wall is disposed against the battery in such a manner that each of the circular arcs is disposed coaxially against one of the cells.

An insert for a siamese-type internal combustion engine that separates a water jacket surrounding the cylinders into an upper portion and a lower portion. Below a predetermined engine speed coolant flows primarily in the upper water jacket portion so as to provide enhanced cooling at the upper portions of the cylinders. Above a predetermined engine speed coolant is introduced into the lower water jacket portion from the upper water jacket portion so as to provide improved cooling of the lower cylinder portions, without compromising cooling of the upper cylinder portions or the conjoined cylinder wall portions. The water jacket insert enhances coolant flow velocity at the siamesed or conjoined portions of the cylinder walls, and directs incoming initially coolant over the exhaust-side of the cylinders. Use of the insert reduces circumferential and axial intra-cylinder temperature deviations as well as inter-cylinder temperature deviations.

In the rapid prototyping method of selective laser sintering, temperature gradients occur inside and between individual layers, leading to component deformation which is intolerable at least for high-quality components. The air of the invention is to provide a method for selective laser sintering, whereby the temperature inside the built-up particle cake is as homogeneous as possible. To this end, particles containing at least one material having a maximum softening temperature of approximately 70° C. are used.

A system for treating a target region in tissue beneath a tissue surface comprises a probe for deploying an electrode array within the tissue and a surface electrode for engaging the tissue surface above the treatment site. Preferably, surface electrode includes a plurality of tissue-penetrating elements which advance into the tissue, and the surface electrode is removably attachable to the probe. The tissue may be treated in a monopolar fashion where the electrode array and surface electrode are attached to a common pole on an electrode surgical power supply and powered simultaneously or successively, or in a bipolar fashion where the electrode array and surface electrode are attached to opposite poles of the power supply. The systems are particularly useful for treating tumors and other tissue treatment regions which lie near the surface.

An invention relating to an electric rice cooker is disclosed. The electric rice cooker according to an embodiment of the present invention comprises: an upper case part; an upper heater which is located on the lower side of the upper case part and downwardly emits heat; an inner container located on the lower side of the upper heater and containing an object to be cooked; an upper heat transfer plate located on the lower side of the upper heater while facing the inner container; a body constituting an outer shape of the electric rice cooker and having the inner container installed therein; and a vacuum packing part installed along the boundary of the upper heat transfer plate facing the inner container and blocking the flow of air moving between the upper heat transfer plate and the inner container.

An ultra-sensitive optical detector with large time resolution, using a surface plasmon. The optical detector is configured to detect at least one photon, and including a dielectric substrate, and on the substrate, at least one bolometric detection component, that generates an electrical signal from the energy of received photon(s). Additionally, at least one coupling component is formed on the substrate, distinct from the detection component and including a metal component, and generates a surface plasmon by interaction with the photon(s) and guiding the plasmon right up to the detection component, which then absorbs the energy of the surface plasmon.

A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.

A heating apparatus for a semiconductor producing system is provided, including a heater having a mounting face, an opposed back face, a first resistance heating element, a second resistance heating element provided along substantially the same plane as the first heating element, a first terminal connected with the first heating element and a second terminal connected with the second heating element. A supporting member is fixed to the back face of the heater. First and second power supply means are respectively connected with the first and second terminals and contained in an inner space of the supporting member. A conductive connector connects the first heating element and the first terminal but not the second heating element. The first heating element is provided in a first zone, the second heating element is provided in a second zone, and the conductive connector is provided in the plane and the second zone.

The invention belongs to the technical field of materials, and specifically relates to a nano-carbon-reinforced wear-resistant composite material. The nano-carbon-reinforced wear-resistant composite material comprises the following components in percentage by mass: 55-99% of metal powder, 0.1-35% of ceramic powder, and 0.01-15% of nano-carbon, wherein the metal powder is used as a composite material matrix; the ceramic powder is used as a wear-resistant filling material; and the nano-carbon comprises single-wall carbon nano-tubes, multi-wall carbon nano-tubes and other materials, and is mainly used for improving the heat-conducting performance, strength, toughness, wear resistance and other performances of the composite material. The wear-resistant composite material disclosed by the invention can keep a stable friction coefficient and a low wear rate under the conditions of a heavy load, a high speed, and long-time braking.

A heating apparatus for heating a target object W is provided with a plurality of heating light sources, including LED elements for applying heating light having a wavelength within a range from 360 to 520 nm to the object. Thus, a temperature of only the shallow surface of the object, such as a semiconductor wafer, is increased / reduced at a high speed in uniform temperature distribution, irrespective of the film type.

According to an aspect of an embodiment of the invention, there is provided an electrostatic chuck including: a ceramic dielectric substrate including a first major surface for mounting a clamped target, a second major surface on opposite side from the first major surface, and a through hole provided from the second major surface to the first major surface; a metallic base plate supporting the ceramic dielectric substrate and including a gas feed channel communicating with the through hole; and an insulator plug including a ceramic porous body provided in the gas feed channel and a ceramic insulating film provided between the ceramic porous body and the gas feed channel and being denser than the ceramic porous body, the ceramic insulating film biting into the ceramic porous body from a surface of the ceramic porous body.

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices which are used to adjust the overall irradiance distribution of the light energy sources are included in the heating device. The tuning devices can be, for instance, are lamps or lasers.

An ampoule assembly is configured with a bypass line and valve to allow the purging of the lines and valves connected to the ampoule. The ampoule assembly, in one embodiment, includes an ampoule, an inlet line, an outlet line, and a bypass line connected between the inlet line and the outlet line, the bypass line having a shut-off valve disposed therein to fluidly couple or decouple the inlet line and the outlet line. The shut-off valve disposed in the bypass line may be remotely controllable. Also, additional remotely controllable shut-off valves may be provided in the inlet and the outlet lines.

A wafer holder is provided in which local heat radiation in supporting and heating wafers is kept under control and temperature uniformity of the wafer retaining surface is enhanced, and by making use of the wafer holder a semiconductor manufacturing apparatus suitable for processing larger-diameter wafers is made available. In a wafer holder (1) including within a ceramic substrate (2) a resistive heating element (3) or the like and being furnished with a lead (4) penetrating a reaction chamber (6), the lead (4) is housed in a tubular guide member (5), and an interval between the guide member (5) and the reaction chamber (6) as well as the interior of the guide member (5) are hermetically sealed. The guide member (5) and the ceramic substrate (2) are not joined together, and in the interior of the guide member (5) in which the inside is hermetically sealed, the atmosphere toward the ceramic substrate (2) is preferably substantially the same as the atmosphere in the reaction chamber (6).

The invention relates to a high performance super capacitor and a manufacturing process thereof. The super capacitor comprises an electrode core, an electrolyte and a shell. The manufacturing process comprises steps that: tabs and leading-out terminals of the prepared electrode core positive and negative poles are welded; the electrode core with the well-welded leading-out terminals is encased in the shell; the shell with the electrode core encased is put in a vacuum drying furnace for vacuum drying; and finally a vacuum liquid filling sealing test is carried out. In an aspect of the electrode manufacturing method, the manufacturing process of the invention abandons a method which uses a solvent for assisted processing, thus to the greatest degree, the purity of the electrode material is ensured. In addition, during the production process, the manufacturing process of the invention has no drying energy waste and drying time constraint, and therefore reduces cost, reduces energy loss, and improves working speed. The manufacturing process of the invention further adopts an advanced assembly process to avoid problems such as secondary pollution and processing consistency in the traditional assembly technology, and greatly improves the stability of the super capacitor.

The invention discloses a low-temperature self-heating method of a lithium ion battery pack. The low-temperature self-heating method comprises the steps of determining an optimal heating frequency range compatible with a battery aging state and state-on-charge (SOC) according to a principle of minimum influence on lifetime of a battery; designing a series resonant inversion circuit, and exploring an optimal control strategy so that the inversion circuit outputs a sine AC current of a target frequency and target amplitude at a battery side; and performing low-temperature self-heating on the battery pack by the sine AC current output from the resonant inversion circuit, wherein the internal resistance of the battery is gradually reduced with the temperature rising of the battery, the output current amplitude of the resonant inversion circuit is adaptively increased, the heating rate of the battery pack is improved, and the battery pack is rapidly raised to a target temperature. The low-temperature self-heating method has the effects of fast self-heating rate on the lithium ion battery pack under a low temperature, obvious improvement on low-temperature performance, high self-heating efficiency, no influence on service lifetime of the lithium ion battery, good heating temperature uniformity and the like, and the promotion and the application of an electric vehicle in a cold place are facilitated.

The invention relates to a low-temperature rapid self-heating method for a lithium-ion battery. The method comprises the following steps: (S1) determining a polarization voltage amplitude range which does not have influence on the service lifetime of the lithium-ion battery and is safely used, and selecting a sine AC voltage amplitude according to the range; (S2) calculating the relationship between heat production power and frequency and obtaining a frequency point, namely the optimal heat production frequency point, with the maximum heat production power according to the relationship between battery impedance and frequency under the selected sine AC voltage amplitude; and (S3) carrying out heating free of lifetime loss on the battery by a sine AC signal according to the amplitude determined in the step (S1) and the frequency determined in the step (S2). The low-temperature rapid self-heating method for the lithium-ion battery has the effects of being high in heating rate, obvious in low-temperature performance improvement, free of an influence on the service lifetime of the lithium-ion battery, good in heating temperature uniformity and the like; and the target of reducing the influence on the service lifetime of the lithium-ion battery to the maximal extent is achieved.

The invention provides a vertical air conditioner indoor unit and an air conditioner. The vertical air conditioner indoor unit (1) is installed at the position of an indoor wall corner (2) and comprises a first air outlet (11) and a second air outlet (12), the first air outlet (11) can conduct air outlet in the direction of a first wall face (21) of the wall corner (2), and the second air outlet (12) can conduct air outlet in the direction of a second wall face (22) of the wall corner (2). By means of the vertical air conditioner indoor unit and the air conditioner, airflow sent from the leftand right air outlets can flow along the wall, the air conditioner is prevented from blowing a person directly, the left and right air outlets achieve air supply along the wall, surrounding airflow can be achieved, the airflow achieves systemic circulation indoors, the coanda effect of the airflow is conveniently formed, even temperature distribution caused by uneven indoor airflow is prevented, the indoor temperature distribution is even, and the comfort of the user is improved.

Low NOx emission industrial burner, adapted to operate both in a flame or stage mode and in a flameless mode, so that also the heating step of the chamber of a furnace may be made by means of the same burner, without providing a pilot burner, thus ensuring very low NOx emissions for the whole operation range of the burner and for the whole range of temperatures in the chamber. The combustion process, made by means of said burner, provides for the possibility to combine the stage mode operation with the flameless mode operation.

At least two blowers are controlled with baffles to create circulating zones of airflow which circulate in a substantially horizontal plane within a convection oven cavity. This airflow minimizes the potential for airflow paths to be broken up or blocked by the configuration of objects placed in the oven. The substantially horizontal airflow reduces the non-uniformity of air temperature distribution within the oven cavity. The blowers may be controlled to rotate either simultaneously or alternately, depending on the selected mode of operation. The blowers and associated heating elements are controlled to operate in various cooking modes by the controller in response to a mode selector input.

The invention is a ceramic heater provided with a resistor heating body formed in an interior of a ceramic substrate, characterized in that the resistor heating body is made of an electrically conductive ceramic and a sintering aid containing layer is existent at least on the surface of the resistor heating body. This heater does not generate crack even in the rapid temperature rise, and has an effect of uniformizing the heating and rapidly increasing the temperature rising rate, and is used in an industrial field of semiconductor production-inspection apparatuses including an electrostatic chuck or plasma generating device, optical apparatuses and the like.