Method for preparing carbon-doped titanium oxide thin film with photocatalytic activity
A technology of titanium oxide film and photocatalytic activity, which is applied in chemical instruments and methods, physical/chemical process catalysts, chemical/physical processes, etc., can solve the problems of increasing the previous process, low solar energy utilization rate, and limited application, etc., to achieve The process is stable and reproducible, the problem of immobilization is solved, and the preparation method is simple.
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Embodiment 1
[0014] Using CO 2 The gas is the carbon source, the high-purity metal titanium target is the sputtering target, and a method for preparing a photocatalytically active carbon-doped titanium oxide film on a stainless steel or glass substrate, the specific steps are as follows:
[0015] a. First, the mirror stainless steel substrate is strengthened by nitrogen ion implantation to improve the strength of the surface of the stainless steel substrate;
[0016] b. Fix the stainless steel substrate or glass substrate strengthened by nitrogen ions on the target stage, and vacuumize to 10 -3 Pa, feed argon to clean the substrate for 5 minutes, and then clean the target by sputtering for 2 minutes;
[0017] c. Keep the partial pressure of argon at 0.3Pa, and feed CO 2 Gas, so that the partial pressure in the vacuum chamber reaches 0.4Pa, adjust the target base distance to 50mm, turn on the sputtering power supply, control the sputtering current 3A, the substrate bias voltage -150...
Embodiment 2
[0020] Using CO 2 The gas is the carbon source, the high-purity metal titanium target is the sputtering target, and a method for preparing a photocatalytically active carbon-doped titanium oxide film on a stainless steel or glass substrate, the specific steps are as follows:
[0021] a. First, the mirror stainless steel substrate is strengthened by nitrogen ion implantation to improve the strength of the surface of the stainless steel substrate;
[0022] b. Fix the stainless steel substrate or glass substrate strengthened by nitrogen ions on the target stage, and vacuumize to 10 -3 Pa, feed argon to clean the substrate for 10 minutes, and then clean the target by sputtering for 5 minutes;
[0023] c. Keep the partial pressure of argon at 0.5Pa, and feed CO 2 Gas, so that the partial pressure in the vacuum chamber reaches 0.6Pa, adjust the target base distance to 80mm, turn on the sputtering power supply, control the sputtering current 3A, the substrate bias voltage -150V...
Embodiment 3
[0026] Using CO 2 The gas is the carbon source, the high-purity metal titanium target is the sputtering target, and a method for preparing a photocatalytically active carbon-doped titanium oxide film on a stainless steel or glass substrate, the specific steps are as follows:
[0027] a. First, the mirror stainless steel substrate is strengthened by nitrogen ion implantation to improve the strength of the surface of the stainless steel substrate;
[0028] b. Fix the stainless steel substrate or glass substrate strengthened by nitrogen ions on the target stage, and vacuumize to 10 -3 Pa, feed argon to clean the substrate for 15 minutes, and then clean the target by sputtering for 8 minutes;
[0029] c. Keep the partial pressure of argon at 0.7Pa, and feed CO 2Gas, so that the partial pressure in the vacuum chamber reaches 0.9Pa, turn on the sputtering power supply, adjust the target base distance to 100mm, control the sputtering current to 3A, the substrate bias voltage -1...
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