Method for preparing carbon-doped titanium oxide thin film with photocatalytic activity

A technology of titanium oxide film and photocatalytic activity, which is applied in chemical instruments and methods, physical/chemical process catalysts, chemical/physical processes, etc., can solve the problems of increasing the previous process, low solar energy utilization rate, and limited application, etc., to achieve The process is stable and reproducible, the problem of immobilization is solved, and the preparation method is simple.

Inactive Publication Date: 2012-06-13
HAINAN UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This new technique uses magnetically balanced plasma spray (MPS) instead of traditional ways for producing TiO2 coatings without any other materials like silicon or nitrogen. Gas sources used during this process have improved stability over time while reducing costs compared with current techniques such as chemical vapor deposition (CVD). Additionally, it allows for easy access by making use of an organosilane compound that has been modified into carboxylic acid groups, which helps fix photoactive catalysts onto these surfaces.

Problems solved by technology

Technologies related to improving the performance of titania based photovoltaics include reducing dark current absorption, controllably changing incident sunlight frequency, adjustable emission range, enhancing spectral sensitivity, creation of colored films that absorb specific colors, making them easier to produce, and utilizing various techniques such as laser irradiation and ionization/synthesis. These technical improvements help improve efficiency and effectiveness of photonuclear batteries.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Using CO 2 The gas is the carbon source, the high-purity metal titanium target is the sputtering target, and a method for preparing a photocatalytically active carbon-doped titanium oxide film on a stainless steel or glass substrate, the specific steps are as follows:

[0015] a. First, the mirror stainless steel substrate is strengthened by nitrogen ion implantation to improve the strength of the surface of the stainless steel substrate;

[0016] b. Fix the stainless steel substrate or glass substrate strengthened by nitrogen ions on the target stage, and vacuumize to 10 -3 Pa, feed argon to clean the substrate for 5 minutes, and then clean the target by sputtering for 2 minutes;

[0017] c. Keep the partial pressure of argon at 0.3Pa, and feed CO 2 Gas, so that the partial pressure in the vacuum chamber reaches 0.4Pa, adjust the target base distance to 50mm, turn on the sputtering power supply, control the sputtering current 3A, the substrate bias voltage -150...

Embodiment 2

[0020] Using CO 2 The gas is the carbon source, the high-purity metal titanium target is the sputtering target, and a method for preparing a photocatalytically active carbon-doped titanium oxide film on a stainless steel or glass substrate, the specific steps are as follows:

[0021] a. First, the mirror stainless steel substrate is strengthened by nitrogen ion implantation to improve the strength of the surface of the stainless steel substrate;

[0022] b. Fix the stainless steel substrate or glass substrate strengthened by nitrogen ions on the target stage, and vacuumize to 10 -3 Pa, feed argon to clean the substrate for 10 minutes, and then clean the target by sputtering for 5 minutes;

[0023] c. Keep the partial pressure of argon at 0.5Pa, and feed CO 2 Gas, so that the partial pressure in the vacuum chamber reaches 0.6Pa, adjust the target base distance to 80mm, turn on the sputtering power supply, control the sputtering current 3A, the substrate bias voltage -150V...

Embodiment 3

[0026] Using CO 2 The gas is the carbon source, the high-purity metal titanium target is the sputtering target, and a method for preparing a photocatalytically active carbon-doped titanium oxide film on a stainless steel or glass substrate, the specific steps are as follows:

[0027] a. First, the mirror stainless steel substrate is strengthened by nitrogen ion implantation to improve the strength of the surface of the stainless steel substrate;

[0028] b. Fix the stainless steel substrate or glass substrate strengthened by nitrogen ions on the target stage, and vacuumize to 10 -3 Pa, feed argon to clean the substrate for 15 minutes, and then clean the target by sputtering for 8 minutes;

[0029] c. Keep the partial pressure of argon at 0.7Pa, and feed CO 2Gas, so that the partial pressure in the vacuum chamber reaches 0.9Pa, turn on the sputtering power supply, adjust the target base distance to 100mm, control the sputtering current to 3A, the substrate bias voltage -1...

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Abstract

The invention relates to a method for preparing a carbon-doped titanium oxide thin film with photocatalytic activity. The method is characterized by adopting CO2 as the carbon source and a high purity metallic titanium target as the sputtering target to prepare a carbon-doped titanium oxide thin film with photocatalytic activity on a stainless steel or glass substrate and specifically comprises the following steps: a. firstly implanting nitrogen ions to enhance the stainless steel substrate of a mirror surface to improve the strength of the surface of the stainless steel substrate; b. fixing the stainless steel or glass substrate enhanced by the nitrogen ions on a target table, vacuumizing the stainless steel or glass substrate to 10<-3>Pa, filling argon to clean the substrate for 5-15 minutes and then carrying out sputter cleaning on the target for 2-8 minutes; c. keeping the partial pressure of argon to be 0.3-0.7Pa, introducing CO2 to ensure the partial pressure in a vacuum chamber to reach 0.4-0.9Pa, keeping the target-substrate distance to be 50-100mm, starting a sputtering power supply, controlling the sputtering current to be 3A and substrate bias to be minus 150V and carrying out sputtering deposition for 10-120 minutes; and d. after the sputtering deposition process is completed, keeping vacuum cooling to the room temperature and then taking out the prepared sample. The method has the following beneficial effects: the carbon-containing composite target is unnecessary to be prepared; the process stabilization repeatability is good; the gas source is convenient; the method is simple; the coating cost is low; and the problem of photocatalyst immobilization can be solved.

Description

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Claims

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Application Information

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Owner HAINAN UNIVERSITY
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