606results about How to "Uniform supply" patented technology

A thin film is formed by alternating multiple times, respectively, a process of adsorbing a precursor onto a substrate and a process of treating the adsorbed surface using a reactant gas and a plasma, wherein the reactant gas is supplied substantially uniformly over the substrate, and the plasma is pulse-time-modulated and applied in the process of supplying the reactant gas.

A thin-film formation apparatus possesses a reaction chamber to be evacuated, a placing portion on which a substrate is placed inside the reaction chamber, a gas-dispersion guide installed over the placing portion for supplying a gas onto a substrate surface, a gas-supply port for introducing the gas into the gas-dispersion guide, a gas-dispersion plate disposed on the side of the substrate of the gas-dispersion guide and having multiple gas-discharge pores, a first exhaust port for exhausting, downstream of the gas-dispersion plate, the gas supplied onto the substrate surface from the gas-dispersion plate, and a second exhaust port for exhausting, upstream of the gas-dispersion plate, a gas inside the gas-dispersion guide via a space between the gas-dispersion guide and the gas-dispersion plate.

A film formation apparatus for a semiconductor process includes a process gas supply system configured to supply process gases. The process gas supply system includes a gas mixture tank configured to mix first and third process gases to form a mixture gas, a mixture gas supply line configured to supply the mixture gas from the gas mixture tank to a process field, a second process gas supply circuit having a second process gas supply line configured to supply a second process gas to the process field without passing through the gas mixture tank, and first and second switching valves disposed on the mixture gas supply line and the second process gas supply line, respectively. A control section controls the first and second switching valves to be opened and closed so as to alternately and pulse-wise supply the mixture gas and the second process gas to the process field.

Provided is an apparatus for generating remote plasma. The apparatus includes an RF antenna disposed in regard to a chamber, a plasma generating unit formed in an uppermost portion of the chamber, wherein a plurality of plasma generation gas introduction pipes are communicated with the plasma generating unit, a first shower head disposed below the plasma generating unit, and having a plurality of first plasma guide holes, a second shower head disposed below the first shower head, and having a plurality of source / purge gas guide holes and a plurality of second plasma guide holes directly connected to the respective first plasma guide holes, and a source / purge gas introduction unit disposed between the first and second shower heads, wherein a plurality of source / purge gas introduction pipes are uniformly communicated with the source / purge gas introduction unit.

A plasma processing apparatus performs a process on a substrate by using plasma. The plasma processing apparatus includes a processing chamber; a mounting table which is located in the processing chamber and on which a substrate is mounted; a gas shower head formed of a conductive material provided to face the mounting table and having at the bottom surface thereof a plurality of gas injection openings for supplying a processing gas into the processing chamber; an induction coil to which a high frequency current is supplied to generate an inductively coupled plasma in a region surrounding a space below the gas shower head; a negative voltage supplying unit for applying a negative DC voltage to the gas shower head to allow an electrical field, which is induced by the induction coil, to be drawn to a central portion of the processing region; and a unit for evacuating the processing chamber.

The showerhead for a CVD apparatus can be easily produced and is capable of forming a film efficiently. The showerhead comprises: a shower plate being made of a metal; and a porous plate contacting a rear face of the shower plate. A plurality of gas diffusion holes are formed in a plate section of the shower plate, which faces a workpiece, and penetrate the plate section in the thickness direction, and the porous plate covers all of the gas diffusion holes.

Provided is an ice maker. The ice maker includes an upper tray including a plurality of first recessed parts, each having a hemispherical shape, and a lower tray including a plurality of second recessed parts, each having a hemispherical shape. The ice maker also includes a driving unit that moves at least one of the upper tray and the lower tray to change between an attached orientation in which the upper tray is attached to the lower tray to define a plurality of spherical shells and a separated orientation in which the upper tray is separated from the lower tray. The ice maker further includes a water supply part configured to supply water into the shells and an ejecting unit disposed outside the shells and configured to facilitate separation of ice pieces made in the shells.

A semiconductor 100 has a P− body region and an N− drift region in the order from an upper surface side thereof. A gate trench and a terminal trench passing through the P− body region are formed. The respective trenches are surrounded with P diffusion regions at the bottom thereof. The gate trench builds a gate electrode therein. A P−− diffusion region, which is in contact with the end portion in a lengthwise direction of the gate trench and is lower in concentration than the P− body region and the P diffusion region, is formed. The P−− diffusion region is depleted prior to the P diffusion region when the gate voltage is off. The P−− diffusion region serves as a hole supply path to the P diffusion region when the gate voltage is on.

An electrochemical mechanical polishing apparatus is for use in polishing of a conductive material (e.g., metal) on a surface of a substrate by combination of electrochemical action and mechanical action. This apparatus includes a polishing table having divided electrodes and adapted to hold a polishing pad having a polishing surface, a polishing head adapted to hold a workpiece having a conductive film and to press the workpiece against the polishing surface, a second electrode for supplying an electric current to the conductive film, an electrolytic-solution supply section for supplying an electrolytic solution to the polishing surface, a detecting section adapted to detect a signal corresponding to a thickness of the conductive film, a variable resistance unit having the same number of variable resistors as the number of divided electrodes, a moving mechanism for providing relative movement between the workpiece and the polishing surface, and a control section adapted to control each of the variable resistors based on the signal from the detecting section.

A plating apparatus can form a bump having a flat top or can form a metal film having a good in-plane uniformity even when the plating of a plating object (substrate) is carried out under high-current density conditions. The plating apparatus includes a plating tank for holding a plating solution; an anode to be immersed in the plating solution in the plating tank; a holder for holding a plating object and disposing the plating object at a position opposite the anode; a paddle, disposed between the anode and the plating object held by the holder, which reciprocates parallel to the plating object to stir the plating solution; and a control section for controlling a paddle drive section which drives the paddle. The control section controls the paddle drive section so that the paddle moves at a velocity whose average absolute value is 70 cm / sec to 100 cm / sec.

An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.

An online high-pressure water-jet blasting surface cleaning system comprises a high pressure water feed mechanism, an abrasive material feed mechanism and a spray nozzle. The high pressure water feed mechanism and the abrasive material feed mechanism are communicated with an input end of the spray nozzle, an abrasive material collecting pit is arranged below the spray nozzle, an output end of the abrasive material collecting pit is divided into two paths, one path is connected with an input end of an abrasive material sorting device by an abrasive material cyclical feeding device and a pipeline, and the other path is connected with an input end of a waste water treatment circulating mechanism by a pipeline, an output end of the waste water treatment circulating mechanism is connected with the high pressure water feed mechanism by a pipeline, an output end of the abrasive material sorting device is divided into two paths, one path is connected with the abrasive material feed mechanism, and the other path is connected with a slag collection barrel by a pipeline. The online high-pressure water-jet blasting surface cleaning system has the advantages of simple and compact structure, low energy consumption, good environmental protection, good operational reliability and stability, and recycled water and abrasive materials.

Disclosed herein is a light guide plate for keypad backlight panels, which is mounted at the rear of a keypad having numerals or characters printed thereon for supplying light emitted from a light source mounted at one side of the keypad to the keypad. The light guide plate is made of polycarbonate and is provided at the rear surface thereof with a concave-convex pattern, the density of which is increased as pattern elements of the pattern become more distant from the light source, such that light emitted from the light source is reflected and is uniformly supplied to the keypad, the pattern being formed on the light guide plate by hot stamping, injection molding, or micro blasting. The density of the pattern is adjusted by adjusting the distance between the pattern elements of the pattern or by adjusting the size of the pattern elements of the pattern. Consequently, it is possible to manufacture a keypad module in a slim structure or a curved structure. It is also possible to manufacture a keypad module that is capable of uniformly supplying light.

An arrangement for supplying a medium to an exhaust line of a combustion engine. The arrangement comprises a first exhaust passage defined by at least a first wall surface of an element, and a dosing device supplying the medium to the first exhaust passage. The arrangement is adapted to maintaining a degree of heating of the first wall surface so that the latter will be at a higher temperature than the medium's vaporization point when the liquid medium is supplied in the first exhaust passage. Therefore, even the medium which reaches the first wall surface will vaporize in the first exhaust passage.

A drum-type washing machine includes a water tub for storing wash water, a rotary drum placed rotatably in the water tub and having an opening at the front, a motor for driving the rotary drum, a water circulating path for circulating the wash water stored in the water tub to the drum, a pump for conveying the wash water stored in the water tub to the water circulating path, multiple nozzles for jetting the wash water, conveyed to the nozzle water path by the pump, into the rotary drum, and a nozzle water path formed around a front face of the water tub for conveying the wash water from the water circulating path to the nozzles.

Light-emitting diodes, and methods of manufacturing the light-emitting diode, are provided wherein a plurality of nano-rods may be formed on a reflection electrode. The plurality of nano-rods extend perpendicularly from an upper surface of the reflection electrode. Each of the nano-rods includes a first region doped with a first type dopant, a second region doped with a second type dopant that is an opposite type to the first type dopant, and an active region between the first region and the second region. A transparent insulating layer may be formed between the plurality of nano-rods. A transparent electrode may be formed on the plurality of nano-rods and the transparent insulating layer.

The present invention provides a wind direction adjuster for controlling cooling air in a data center. The adjuster includes: an access floor-flat plate; a first support, a second support, a third support, and a fourth support that form frames supporting the access floor-flat plate from below; and a wind direction-adjusting plate for concentrating a wind direction of cooling air supplied from an air conditioner by blocking an open space between at least any two supports of the first to fourth supports in accordance with a structure of a building, an installation environment of a computing equipment, and a reach distance of the cooling air.

The invention relates to an agricultural microbial compound bacterial fertilizer, in particular to a method for producing a microbial compound bacterial fertilizer. The method is characterized in that activated sludge fermented by a fermentation plant during sewage treatment is used as matrix, molasses is added into the matrix as a culture medium, compound bacteria are grafted into the culture medium after adding water to ferment, then grass carbon is added into the culture medium, and the mixture is dried to form the compound bacterial fertilizer. The method realizes reutilization of sludge waste, and provides economic and efficient microbial sludge bacterial fertilizer for the development of green ecological agriculture.

Provided are a gas injection device and substrate processing apparatus using the same. The gas injection device includes a plurality of gas injection units disposed above a substrate support part rotatably disposed within a chamber to support a plurality of substrates, the plurality of gas injection units being disposed along a circumference direction with respect to a center point of the substrate support part to inject a process gas onto the substrates. Wherein each of the plurality of gas injection units includes a top plate in which an inlet configured to introduce the process gas is provided and an injection plate disposed under the top plate to define a gas diffusion space between the injection plate and the top plate along a radius direction of the substrate support part, the injection plate having a plurality of gas injection holes under the gas diffusion space to inject the process gas introduced through the inlet and diffused in the gas diffusion space onto the substrate. In at least one gas injection unit of the plurality of gas injection units, the process gas is introduced into the gas diffusion space at a plurality of points.

A clutch apparatus includes a clutch outer member for supporting friction discs, which are nonrotatable relative to the clutch outer member, and are axially slidable along a clutch axis; a clutch inner member for supporting clutch discs, which are nonrotatable relative to the clutch inner member, and are axially slidable along the clutch axis, and a pressure plate having a deep recess for accommodating a clutch spring engaged with the clutch inner member. The deep recess includes a bottom portion having a spring seat for receiving the clutch spring, and a partially cylindrical shape wall portion having an axis parallel to the clutch axis. The wall portion is oriented towards the clutch axis. The deep recess has a communicating portion formed therein for establishing the communication between the inner and outer surfaces of the wall portion so as to discharge oil towards the friction and clutch discs during operation of the clutch apparatus.

The present invention is to provide a process for the preparation of carbon nanotubes or nanofibers, which comprises introducing in a gaseous phase a colloidal solution of metal nanoparticles optionally containing a surfactant together with an optional carbon source into a heated reactor, and carbon nanotubes or nanofibers thus prepared. According to the present invention, the shape and structure of carbon nanotubes or nanofibers can be easily controlled, the carbon nanotubes or nanofibers can be continuously produced in large scales, the apparatus and the process for the preparation of nanotubes or nanofibers are simplified, and carbon nanotubes or nanofibers having various shapes, structures and properties can be easily and cheaply prepared. Further, the process of the present invention is highly reproducible and favorable in industry.

A spring retaining sleeve includes a cylinder press-fit connection surface which has a press-fit diameter and a press-fit length. To enable cost-effective production of a stable press-fit assembly, at least one end of the cylinder press-fit connection surface, an optimized insertion chamfer for long press-fit assemblies is provided with a ratio of press-fit diameter to press-fit length of greater than thirty five percent.

A combined laundry machine including a new conceptional pedestal dryer that is capable of performing a drying operation while serving as a base for supporting a washer or a dryer is disclosed. The combined laundry machine includes a washer, a first pedestal dryer including a first container for supporting the washer, the first container having a drying space for drying an object to be dried using hot air supplied from a first hot air supply unit, a clothes dryer, and a second pedestal dryer including a second container for supporting the clothes dryer, the second container having a drying space for drying an object to be dried using hot air supplied from a second hot air supply unit.

The invention relates to a special organic and inorganic compound fertilizer for a lawn and a preparation method thereof. The preparation method comprises the following steps of: fermenting and decomposing sludge, edible fungus residues and a microbial fermentation fungal agent and then adding an inorganic fertilizer to produce the special organic and inorganic compound fertilizer, the nutrient content of which meets the nutrient requirement of the lawn. The special organic and inorganic compound fertilizer has long fertilizer efficiency, uniform nutrient supply and organic and inorganic combination, ensures the lawn quality and improves the soil fertility.

A reformer includes a reforming chamber having a raw fuel passage through which a raw fuel flows, the reforming chamber being filled with or carrying a reforming catalyst, a supply chamber disposed upstream of the reforming chamber, for uniformly supplying the raw fuel to the raw fuel passage, and a discharge chamber disposed downstream of the reforming chamber, for uniformly discharging the raw fuel from the raw fuel passage. The raw fuel passage has first and second reversers for reversing the direction in which the raw fuel flows. The raw fuel passage has a cross-sectional area which is smaller in a downstream portion thereof than in an upstream portion thereof.