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169 results about "Electrical breakdown" patented technology

Electrical breakdown or dielectric breakdown is when current flows through an electrical insulator when the voltage applied across it exceeds the breakdown voltage. This results in the insulator becoming electrically conductive. Electrical breakdown may be a momentary event (as in an electrostatic discharge), or may lead to a continuous arc if protective devices fail to interrupt the current in a power circuit.

Three-phase intelligent multifunctional electric energy meter

The invention discloses a three-phase intelligent multifunctional electric energy meter, which relates to the technical field of electric meters and comprises an electric meter body, a communication module, a battery body, a first limiting mechanism and a second limiting mechanism. The first limiting mechanism stops the battery body from entering the battery bin when the communication module is not installed in place, and guides the communication module to be installed firstly; and after the communication module is installed, the blocking to the battery compartment is automatically relieved, so that the battery body can be installed smoothly. The second limiting mechanism limits disassembly of the communication module when the battery body is not disassembled, the battery body is guided to be disassembled firstly and then the communication module is disassembled, the communication module is prevented from being mistakenly disassembled in a power-on or power-off state, and therefore the problems of power-off, hot plugging or electrical breakdown and the like of the communication module caused by misoperation can be avoided; and the reliability and the safety in the maintenance process of the electric energy meter are improved.
Owner:武汉阿迪克电子股份有限公司

Silicon-based gallium nitride material epitaxial structure based on silicon substrate

The invention provides a silicon-based gallium nitride material epitaxial structure based on a silicon substrate, and relates to the technical field of semiconductors. Comprising a silicon substrate, an AlN nucleating layer, a buffer layer, a GaN functional layer and a device layer which are sequentially laminated, wherein the thickness of the AlN nucleating layer is related to the geometrical shape and the geometrical size of the silicon substrate; the buffer layer comprises a stepped AlGaN sub-buffer layer and a semi-insulating GaN sub-buffer layer; the step-level AlGaN sub-buffer layer comprises a plurality of step-level AlGaN sub-buffer layers, and the sub-buffer layer attribute of each step-level AlGaN sub-buffer layer is related to the thermal stress constraint of the step-level AlGaN sub-buffer layer; the stepped AlGaN sub-buffer layer and the semi-insulating GaN sub-buffer layer are respectively in contact with the AlN nucleating layer and the GaN functional layer; and the semi-insulating GaN sub-buffer layer has a semi-insulating GaN sub-buffer layer thickness which is optimized based on an electric breakdown theory and thermal stress balance collaboratively.
Owner:ZHONGKE (SHENZHEN) WIRELESS SEMICON CO LTD

Multi-scale simulation method and device for dielectric breakdown of composite material

The invention relates to the technical field of electrical engineering, in particular to a composite material dielectric breakdown multi-scale simulation method and device, and the method comprises the steps: calculating the electric field intensity of a grid based on a preset geometric structure of a nano composite material, and calculating the electric field intensity of the grid based on material parameters and structure parameters of the nano composite material; calculating the molecular interaction energy of the interface between the nanofiller and the matrix; calculating a target breakdown probability of the grid by utilizing the electric field intensity and molecular interaction energy, generating a target state parameter of the grid based on the target breakdown probability, determining a target breakdown strength value meeting a condition by utilizing the target state parameter, and performing Weber distribution fitting processing on the target breakdown strength value to obtain a target breakdown strength value; and determining a simulation result of the breakdown strength of the nano composite material. Therefore, the problems that most of breakdown simulation methods in the prior art are single-scale models, the interfacial effect is not fully considered, errors in the aspect of quantitative prediction of the breakdown strength are large, and the accuracy of breakdown simulation is reduced are solved.
Owner:TSINGHUA UNIVERSITY

High-toughness polyethylene insulated power cable and preparation method thereof

The invention relates to the technical field of power cables, in particular to a high-toughness polyethylene insulated power cable and a preparation method thereof. The invention relates to a preparation method of a high-toughness polyethylene insulated power cable. The preparation method comprises the following steps: preparation of a toughening flame-retardant modifier, preparation of a montmorillonite compound, preparation of a toughening modified montmorillonite compound and preparation of the polyethylene insulated power cable. Through specific material mixing and grafting modification, the performance of the cable insulation layer is remarkably improved. The deep trapped charge trapping capability is enhanced, space charge accumulation and electric field distortion are avoided, the DC voltage level and the operation safety are improved, and the dielectric loss and the aging speed are reduced; the dispersibility of montmorillonite is also optimized, a physical reinforcing network is formed, and the mechanical property and the electric breakdown resistance are improved; meanwhile, toughening and flame retardance are coordinated, the problem of embrittlement caused by a traditional flame retardant is solved, and the service life of the insulating layer is comprehensively prolonged.
Owner:LIANYING TECH (ANFU) CO LTD

Evaluation method and device for breaking result of high-voltage SF6 circuit breaker, electronic equipment and storage medium

The invention discloses an evaluation method and device for a breaking result of a high-voltage SF6 circuit breaker, electronic equipment and a storage medium, and belongs to the field of power system protection, and the method comprises the steps: obtaining a reference arc extinguishing peak voltage and a reference contact opening distance of the high-voltage SF6 circuit breaker; obtaining a to-be-measured arc extinguishing peak voltage and a to-be-measured contact opening distance of the high-voltage SF6 circuit breaker; calculating the ratio of the to-be-measured arc extinguishing peak voltage to the preset power of the to-be-measured contact opening distance, and generating a to-be-evaluated index value; calculating an on-off evaluation critical value according to the reference arc extinguishing peak voltage, the reference contact opening distance and a preset critical value coefficient; and judging whether the to-be-evaluated index value is greater than the cut-off evaluation critical value, if so, judging that the predicted cut-off result is successful, and if not, judging that the predicted cut-off result is failed. Therefore, by implementing the invention, the problem that electric breakdown failure and successful breaking cannot be distinguished due to similar voltage characteristics in the prior art can be solved.
Owner:GUANGDONG POWER GRID CO LTD +1

Flame-retardant breakdown-resistant capacitor base film and preparation method thereof

The invention discloses a flame-retardant breakdown-resistant capacitor base film and a preparation method thereof. The flame-retardant breakdown-resistant capacitor base film is prepared from the following raw materials in parts by weight: 100 parts of polypropylene; 3.5 to 8.5 parts of a compatilizer; 14-25 parts of a flame-retardant dielectric modified filler; 0.3 to 1 part of an antioxidant; 0.5 to 1.8 parts of a nucleating agent; wherein the flame-retardant dielectric modified filler is a composite microcapsule obtained by coating the core material with nano magnesium hydroxide as a core material and silicon dioxide modified polydopamine as a wall material. The flame-retardant dielectric modified filler is added into a polypropylene system, so that the prepared polypropylene capacitor base film can be endowed with excellent flame retardance, the mechanical strength of the base film can be improved, the dielectric constant of the base film can be improved, the electric breakdown resistance of the polypropylene capacitor base film can be improved, and the comprehensive performance of the polypropylene capacitor base film can be improved.
Owner:扬州博恒新能源材料科技有限公司

Vacuum coating method for high-bias transition carbon fiber composite material

The invention discloses a high bias transition carbon fiber composite material vacuum coating method, and relates to a carbon fiber composite material vacuum coating technology. The invention aims to solve the problems of high-voltage breakdown of resin and etching damage of carbon fibers caused by high-bias-voltage transition deposition of vacuum coating on the surface of the existing carbon fiber resin-based composite material. The method comprises the following steps: 1, fixing the carbon fiber composite material on the electric insulator; 2, bias voltage self-glow plasma cleaning; 3, depositing a transition layer; and 4, depositing a working coating. On the basis of an initial non-conductive mode of an electric insulator, during plasma pretreatment, the problems of electric breakdown of non-conductive resin and etching damage of conductive and low-sputtering-resistance carbon fibers are effectively solved, and non-homogeneous conductive and low-sputtering-resistance material surface bias self-glow plasma cleaning is achieved; according to the invention, the aluminum and copper coatings with compact structures are deposited by adopting HiPIMS, so that the electromagnetic wave absorption and multiple emission absorption effects are improved, and the overall electromagnetic shielding performance of the material is enhanced.
Owner:HEILONGJIANG INST OF TECH

Dielectric breakdown measurement circuit and semiconductor detection equipment

The utility model provides a dielectric breakdown measurement circuit and a semiconductor detection device. The dielectric breakdown measurement circuit includes: an adjustable voltage source; the first end of the divider resistor is electrically connected with the adjustable voltage source, and the second end of the divider resistor serves as a voltage division output end; the tested circuit is electrically connected with the partial voltage output end; the input end of the detection circuit is electrically coupled to the voltage division output end, and the detection circuit is configured to convert a signal of the voltage division output end into a detection signal. In the breakdown process of the to-be-detected wafer, the change condition of the signal of the partial pressure output end is detected so as to reflect the breakdown degree of the to-be-detected wafer at any time, intermittent dielectric breakdown of the wafer can be prevented, electric breakdown and overlong detection time are further prevented, and the electric breakdown efficiency, the wafer electrostatic discharge efficiency and / or the wafer detection efficiency are remarkably improved. The voltage provided by the adjustable voltage source can also be used as a breakdown voltage, so that an extra electric breakdown circuit is not independently provided for the wafer to be tested.
Owner:DONGFANG JINGYUAN ELECTRON LTD

Copper interconnection structure and forming method thereof

The invention discloses a copper interconnection structure and a forming method thereof. The forming method comprises the following steps: providing a substrate; forming a dielectric layer on the substrate; forming a copper conductive structure in the dielectric layer; forming a covering layer on the dielectric layer; and performing first ultraviolet curing treatment on the covering layer and the dielectric layer. Heat assistance of the first ultraviolet curing treatment can help copper ions remaining on the surface of the dielectric layer to diffuse towards the interior of the dielectric layer so as to reduce the concentration of the copper ions on the surface of the dielectric layer. In addition, the first ultraviolet curing treatment can repair the damage of the surface of the dielectric layer in the planarization treatment process, so that the compactness of the top area of the dielectric layer is increased, and diffusion or drift of copper ions is hindered. In addition, the bonding strength between the dielectric layer and the covering layer can be enhanced through the first ultraviolet curing treatment, so that diffusion or drifting of copper ions is hindered. Therefore, after the covering layer is formed, the first ultraviolet curing treatment is favorable for weakening copper diffusion in the dielectric layer, so that the dielectric breakdown resistance of copper interconnection is enhanced.
Owner:HUA HONG SEMICONDUCTOR MANUFACTURING (WUXI) LTD +1

High voltage ceramic capacitor with pressure-resistant enhanced concave structure

This invention discloses a high-voltage ceramic capacitor with a reinforced concave structure, aiming to solve the problem of insufficient edge breakdown withstand voltage in traditional ceramic capacitors due to edge effects. The capacitor includes a ceramic core composed of a ceramic dielectric. Its innovation lies in the fact that the upper and lower electrode surfaces of the ceramic core are not planar, but rather form a concave structure that curves inward from the center, causing the ceramic body thickness to gradually increase from the center to the edge. This structure significantly improves the edge breakdown withstand capability through the synergistic effect of electric field homogenization and improved molding density. This invention significantly improves the power frequency withstand voltage of the capacitor to over 3.5kV per millimeter, while also exhibiting excellent comprehensive electrical performance such as low loss, high insulation, and high partial discharge initiation voltage. Furthermore, the manufacturing process is simple, does not increase volume, and has strong industrial applicability.
Owner:西安健信电力电子陶瓷有限责任公司

Composite filler and method for producing same

The composite filler filler forms a core-shell structure composed of a core substance made of carbon, metal, zinc oxide or zirconium oxide and a shell substance attached to a surface of the core substance. The shell substance is formed from fumed oxide particles, the fumed oxide particles being attached to a part or a whole of the surface of the core substance by mixing of the fumed oxide particles and the core substance in a dry ball mill. The fumed oxide particles are particles changed from bulky aggregated particles to gathered bulk particle. In the composite filler, percentage of the core substance ranges from 30 vol % to 85 vol % and percentage of the shell substance ranges from 15 vol % to 70 vol %, a thermal conductivity is 0.075 W / m·K or more, a volume resistivity is 1.0×105 Ω·cm or more, and a dielectric breakdown voltage is 1 kV / mm or more.
Owner:NIPPON AEROSIL CO LTD

aerosol generator

This application relates to an aerosol generator for an aerosol supply device. The aerosol generator comprises an aerosol generating material and a resistance heating layer comprising a resistance heating element. The resistance heating element is configured to heat at least a portion of the aerosol generating material, and the aerosol generating material is located in the resistance heating layer. The resistance heating element comprises a first type of electrical contact and a second type of electrical contact, and the resistance heating element extends between the first type of electrical contact and the second type of electrical contact. The resistance heating element has a dielectric breakdown voltage, and when the dielectric breakdown voltage is exceeded, the resistance heating element is disabled in response to a control signal.
Owner:NICOVENTURES TRADING LTD

Preparation method of multi-channel solid nanopore array

The invention relates to the technical field of biosensors, and particularly discloses a preparation method of a multi-channel solid nanopore array. The method comprises the following steps: respectively constructing a group of parallel and independent micro-channels on the front and back surfaces of a chip prepared with a suspended dielectric film window array, enabling the micro-channels on the two surfaces to be orthogonally arranged in space, integrating an independent electrode in each micro-channel, and injecting electrolyte; the electrodes of the micro-channel on one side and the electrodes of the micro-channel on the other side are selectively connected through an external control circuit, namely controllable electric fields can be established on the two sides of the thin film window at the unique intersection point corresponding to the electrodes, so that addressing and selective dielectric breakdown of the window are achieved, all the windows on the whole chip are automatically and sequentially addressed, traversed and processed, and the yield of the chip is improved. And forming a nanopore array. By means of the method, a large number of nanopore arrays can be controllably manufactured on a single chip at a time, and nanopore array machining with high throughput, low cost and high consistency is achieved.
Owner:HENAN HUAZHIYUAN INTELLIGENT MANUFACTURING TECHNOLOGY CO LTD

Training device, substrate coating system, and substrate coating method

The present invention provides a training device that improves insulation performance of a substrate after coating. A training device (1) for obtaining a trained model for inferring the coating condition of a substrate provided with a conductor and an electronic component. The training device (1) comprises: a training data acquisition unit (11) for acquiring first input data and second input data; and a model generation unit (12) for generating a trained model for inferring second input data from the first input data. The first input data includes: substrate information including information on the type and shape of the substrate; conductor information including information on the type and pattern of the conductor; electronic component mounting information including information on the type, shape, and arrangement position of the electronic component; coating material information including information on insulation performance of the coating material; and substrate use environment information including a voltage waveform applied to the conductor on the substrate. The second input data is a coating condition for dielectric breakdown of the coating material to be suppressed or aerial discharge in the substrate to be suppressed.
Owner:MITSUBISHI ELECTRIC CORP

Memory structure and method for forming the same

ActiveCN119894004BGate dielectricPhotoresist
A memory structure and a method for forming the same include: providing a substrate comprising a plurality of active regions and isolation regions located on either side of the active regions; sequentially forming a first sub-floating gate layer and a control gate dielectric layer on the active regions; using a first photoresist layer having a connection opening pattern as a mask, etching the control gate dielectric layer until the surface of the first sub-floating gate layer is exposed, thereby forming a connection opening; forming a control gate layer on the control gate dielectric layer, with the control gate layer completely filling the connection opening; using a second photoresist layer having an isolation opening pattern as a mask, etching the control gate layer and the control gate dielectric layer until the surface of the first sub-floating gate layer is exposed, thereby forming an isolation opening, a control gate, and a second sub-floating gate layer, wherein the control gate and the second sub-floating gate layer are located on either side of the isolation opening. A second sub-floating gate layer is added to the first sub-floating gate layer, thereby increasing the thickness of the floating gate and the etching window of the floating gate, thereby avoiding perforation and electrical breakdown caused by excessively thin floating gates.
Owner:HUA HONG SEMICON WUXI LTD

Electron source

A disclosed electron source includes: (A) a graphene layer having an electron emission area on a surface of the graphene layer; and (B) a p-type semiconductor layer that is in direct contact with the graphene layer and forms a Schottky junction with the graphene layer. In this way, the electrons are accelerated in the depletion layer in the p-type semiconductor layer. Moreover, unlike the MIS type electron source, since the electrons are not accelerated in the insulator layer, the dielectric breakdown caused by a large number of electrons travelling in the valence band of the insulator does not occur, and a long lifespan electron source can be realized. Note that the aforementioned p-type semiconductor layer preferably has a depletion layer having a width of 2.91 nm or more and 30 nm or less.
Owner:NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY

Insulation components, electrical connectors and vehicles

This application discloses an insulating assembly, an electrical connector, and a vehicle. The insulating assembly includes an insulating pad with opposing first and second insulating surfaces, the second insulating surface being adapted to face a circuit board. The insulating pad also includes clearance holes and insulating elements. The clearance holes connect the first and second insulating surfaces and are used for transmitting conductive devices. The insulating elements are at least disposed on the second insulating surface and between adjacent clearance holes. The insulating assembly of this application can prevent electrical breakdown and creepage of conductive devices within the vehicle during use.
Owner:BYD CO LTD

A rapid method for determining the failure mechanism of corona-resistant enameled wire

The invention relates to the technical field of enameled wire production, and in particular to a method for quickly judging the failure mechanism of a corona-resistant enameled wire. The judgment method comprises the following steps: S1, selecting a corona-resistant enameled wire to be judged; a detection solution consisting of salt, water and phenolphthalein; S2, placing the corona-resistant enameled wire to be judged in the detection solution and performing a leakage point test, wherein the leakage point test comprises the following steps: S21, energizing the corona-resistant enameled wire to be judged; S22, after energizing, observing reddened leakage points on the corona-resistant enameled wire to be judged; and S23, judging the failure mechanism of the corona-resistant enameled wire to be judged based on the reddened leakage points: if there are two reddened leakage points, the failure mechanism of the corona-resistant enameled wire to be judged is electrical breakdown failure; if there are three or more reddened leakage points, the failure mechanism of the corona-resistant enameled wire to be judged is corona breakdown failure; and if there are no reddened leakage points, the insulation performance of the corona-resistant enameled wire is qualified. The judgment method can quickly and accurately judge the failure mechanism of the corona-resistant enameled wire, and has the advantages of easy operation and low cost.
Owner:ZHUHAI GREE ELECTRIC ENTERPRISES +4

Light emitting diode structure with electrostatic protection function

The invention belongs to the technical field of semiconductor devices, and particularly relates to a light-emitting diode structure with an electrostatic protection function, which comprises an insulating base, a transparent lampshade arranged on the end surface of the insulating base, a conducting ring, a light-emitting diode chip, a light-emitting diode chip and a light-emitting diode chip, the conductive ring is fixedly connected to the outer side wall of the transparent lampshade in a sleeving mode, the conductive ring is fixedly connected with the top of the insulating base, the outer side wall of the transparent lampshade and the side wall of the insulating base are each coated with a transparent conductive coating, the electrostatic breakdown unit is installed at the bottom of the insulating base, and the conductive ring is provided with a conductive assembly. Weak electrostatic charges can be timely guided to leave the outer surface of the light-emitting diode to be gathered, static electricity can be utilized to break down air to generate airflow, dust on the surface of the light-emitting diode is eliminated through the airflow, the electrostatic charges can be prevented from invading a semiconductor light-emitting element to affect the light-emitting effect, and dust can be automatically removed.
Owner:DONGGUAN EKINGLUX OPTOELECTRONICS TECH

A multifunctional thermally conductive coating

ActiveCN224290460UTaking into account thermal conductivityTaking into account adhesionCooling/ventilation/heating modificationsChemical physicsConductive coating
This utility model relates to a multifunctional thermally conductive coating. The thermally conductive coating includes, from bottom to top, a base layer for adhesion, a thermally conductive layer forming a thermally conductive network structure, an insulating layer that increases dielectric breakdown voltage, and a heat dissipation layer that accelerates heat dissipation and reduces interfacial thermal resistance. This multifunctional thermally conductive coating, through the adhesion of the base layer, enables effective connection between the coating and thermally conductive pads. Simultaneously, the thermally conductive layer, insulating layer, and heat dissipation layer contribute to high thermal conductivity, thus achieving a balance between thermal conductivity and adhesion, improving the functionality of the thermally conductive coating. Furthermore, the heat dissipation layer can be connected to heat dissipation devices, further enhancing the balance between thermal conductivity and adhesion.
Owner:SHENZHEN JINGTU MATERIAL TECH CO LTD

Semiconductor device and manufacturing process for it

PendingDE112023005941T5Device materialEngineering physics
One objective of the present disclosure is to provide a structure for a semiconductor device in which the reliability of the device is improved without causing an electrical loss during operation of a semiconductor element. A semiconductor device (51) of the present disclosure comprises a conductive heat dissipation component (4). The heat dissipation component (4) has a plurality of column sub-regions (4b) and a plate sub-region (4a) provided between the plurality of column sub-regions (4b). The heat dissipation component (4) is provided at a distance from the plurality of semiconductor elements (6) such that a sealing resin layer (8) between the heat dissipation component (4) and the plurality of semiconductor elements (6) does not cause dielectric breakdown during excitation operation of the plurality of semiconductor elements (6).Furthermore, the heat dissipation component (4) is electrically isolated from the majority of semiconductor elements (6).
Owner:MITSUBISHI ELECTRIC CORP

Semiconductor material and semiconductor device

A semiconductor device in which an electrification phenomenon that leads to characteristic fluctuations, element deterioration, or dielectric breakdown is inhibited is provided. A first transistor, a second transistor, a third transistor, and a fourth transistor are included over a substrate; the fourth transistor includes a first conductor, a second conductor, a third conductor, and an oxide semiconductor; the first conductor is electrically connected to the semiconductor substrate through the first transistor; the second conductor is electrically connected to the semiconductor substrate through the first transistor; the third conductor is electrically connected to the semiconductor substrate through the first transistor; and the fourth conductor is electrically connected to the semiconductor substrate through the first transistor.
Owner:SEMICON ENERGY LAB CO LTD

Shielding cover for valve tower of converter valve

The invention discloses a converter valve tower shielding case, and belongs to the technical field of high-voltage direct-current power transmission equipment. The shielding case comprises a plurality of shielding plates, the shielding plates are divided into not less than five coating thickness areas according to the electric field intensity gradient of the coverage area, the coating thickness is in positive correlation with the electric field intensity, and the coating thickness change rate between the adjacent areas does not exceed 20%; the coating is prepared from the following components in parts by mass: 0.95 to 1.05 parts of nickel powder, 0.4 to 0.7 part of magnetic fiber, 0.9 to 1.1 parts of amorphous magnetic powder and 8.8 to 9.2 parts of acrylic resin. The electric field intensity of the top and other key parts of the valve tower can be effectively reduced, so that the electrical breakdown or flashover phenomenon caused by electric field concentration is avoided, the manufacturing cost is reduced while the electrical performance is improved, and the service life of equipment is prolonged.
Owner:SOUTHEAST UNIV +1

Method and device for generating charged microparticles by adopting ultrasonic atomization water filtration

The invention discloses a method and device for generating charged microparticles through ultrasonic atomization water filtration, and the method comprises the steps: atomizing a liquid medium in a first liquid storage cavity through ultrasonic oscillation, and generating primary atomized gas containing the charged microparticles; the airflow power is provided, and the primary atomized gas is guided to the second liquid storage cavity through the conveying channel; the primary atomized gas enters and penetrates through a liquid medium layer stored in a second liquid storage cavity, large-particle liquid drops in the primary atomized gas are filtered out through the liquid medium layer, and purified gas with tiny charged particles escapes from the liquid level; and finally, discharging the purified gas escaping from the liquid level. According to the device, ultrasonic atomization and water filtration are combined, large-particle water mist is intercepted through the liquid medium layer, only nanoscale charged microparticles are output, high-concentration negative oxygen ions are generated, meanwhile, strong oxidizing by-products such as ozone and nitric oxide which are inevitably generated by adopting a high-voltage discharge structure are avoided, and the device has the advantages that the device is simple in structure and convenient to operate. And the potential safety hazard that high-voltage static breaks through air is eliminated.
Owner:HANGZHOU XINHAN PHOTOELECTRIC SCI & TECH

Shock wave generation method and shock wave system

Disclosed is a shock wave generation method, comprising the following steps: a boost module (11) charging an energy storage capacitor (C1); when the voltage of the energy storage capacitor (C1) reaches a set value, the boost module (11) stopping charging the energy storage capacitor (C1), and the energy storage capacitor (C1) charging an energy relay capacitor (C2) and a shock wave electrode (31); and when the voltage across the shock wave electrode (31) reaches the breakdown voltage of the shock wave electrode (31), the energy relay capacitor (C2) stopping charging and discharging to the shock wave electrode (31), the energy storage capacitor (C1) continuing to discharge to the shock wave electrode (31), and the shock wave electrode (31) discharging, thereby causing breakdown and releasing a shock wave. Further provided is a shock wave system for implementing the shock wave generation method. By means of increasing the peak value and pulse width of a pulse current formed by a circuit where the shock wave electrode (31) is located when the shock wave electrode (31) releases the shock wave, that is, increasing the pulse energy of the pulse current, the shock wave energy released by the shock wave from the shock wave electrode (31) is effectively increased, and the dependence of the shock wave energy on the electrode structure is also avoided.
Owner:RIFF MEDICAL (BEIJING) CO LTD

Low-cost PCB with anti-ESD performance

The utility model discloses a low-cost PCB with anti-ESD performance. The low-cost PCB comprises a sensitive device, a first surface and a second surface. The sensitive device is welded on the first surface, and a second surface, corresponding to the sensitive device, of the PCB is provided with an opening; the sensitive device obtains a signal through the open hole; the PCB further comprises a solder mask layer; and a green oil layer is attached to the sensitive device area of the solder mask layer of the first surface. A layer of white oil or / and green oil is additionally arranged near a circuit of a sensitive device MIC chip and a light sensing chip of the PCB, sensitive signals can be isolated, so that an equivalent air gap between any parts possibly causing discharge is increased, the electric field intensity is prevented from reaching an electric breakdown threshold value under the condition that the product cost is not greatly increased, and the product quality is improved. And the anti-ESD performance of the PCB is improved.
Owner:SHENZHEN FENDA TECH CO LTD

Separator, preparation method thereof, and electrochemical device including same

According to one aspect of the present invention, a thin film separator with improved insulation properties and a preparation method thereof are provided. According to one aspect of the present invention, the separator can have an advantage of implementing a dielectric breakdown voltage of 1,000 V or less while having a thickness of 8 μm or less. To this end, according to one aspect of the present invention, the separator having a controlled maximum pore size within a polymer substrate and a preparation method thereof are provided.
Owner:LG ENERGY SOLUTION LTD

Plasma generating apparatus

Apparatus for generating a plasma via the transient hollow cathode discharge effect is disclosed. The apparatus comprises a chamber comprising an inlet through which gas may enter the chamber and an outlet through which the gas may exit the chamber, a cathode electrode disposed in the chamber, the cathode electrode comprising a plurality of hollow cathodes, an anode electrode spaced apart from the cathode, a power supply, and a power supply controller configured to reduce a power level of the electrical power below a level required to maintain the plasma at the plurality of hollow cathodes, after electrical breakdown has occurred. Each hollow cathode comprises a through-thickness hole through which the gas may pass from one side of the cathode electrode to another side of the cathode electrode. A modular apparatus is also disclosed, comprising a plurality of plasma reactor modules arranged in series and / or in parallel.
Owner:CHOI PETER

A capacitor fault recognition method and related device

The application discloses a capacitor fault identification method and related device, and the method comprises the following steps: acquiring an original running voltage signal in the running process of a capacitor; identifying a fault phase of the capacitor running according to the original running voltage signal through a preset wavelet transform method; inputting the original running voltage signal into a preset multi-core SVM model to perform signal decoupling operation, and obtaining a voltage positive sequence transient component and a voltage negative sequence transient component; after extracting a voltage instantaneous value in the voltage positive sequence transient component, calculating an identification parameter according to the voltage instantaneous value and a preset steady-state voltage value; judging a capacitor fault category according to the identification parameter and a parameter threshold value, wherein the capacitor fault category comprises thermal breakdown and electric breakdown. The application can solve the technical problem of poor capacitor fault identification effect caused by the defects of low efficiency and poor reliability in the prior art.
Owner:SHENZHEN POWER SUPPLY BUREAU +1