Compact and efficient cold cathode arc source of quasi diffusion arc

A cold cathode, high-efficiency technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of rate reduction, magnetic field leakage, and unfavorable plasma transmission, so as to improve ion density and ionization rate, promote particle-to-particle collisions, and enhance bombardment effects

Active Publication Date: 2013-02-20
WENZHOU POLYTECHNIC
View PDF7 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the arc ion plating device of this patent is not designed for a target of a specific size, and the appropriate magnetic field form is not indicated. It is found that not any form of rotating magnetic field can effectively control the arc spot; the invention still relies on dynamic rotation The magnetic field controls the movement of the arc spot, and does not give the core points of realizing the quasi-diffused arc source; this invention does not carry out innovative design on the specific arc source structure, and the rotating magnetic field generating device is

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Compact and efficient cold cathode arc source of quasi diffusion arc
  • Compact and efficient cold cathode arc source of quasi diffusion arc
  • Compact and efficient cold cathode arc source of quasi diffusion arc

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0044] Example 1:

[0045] The invention breaks through the traditional cold cathode arc source magnetic field design ideas, improves the traditional arc source structure, and provides a compact and efficient quasi-diffusion arc cold cathode arc source for circular targets with a diameter of 60-150 mm. figure 1 It is a two-dimensional schematic diagram of the overall structure of a compact and efficient quasi-diffusion arc cold cathode arc source. figure 2 It is a three-dimensional schematic diagram of the overall internal structure of a compact and efficient quasi-diffusion arc cold cathode arc source without a flange sleeve shield. It can be seen from the figure that the compact and efficient quasi-diffusion arc cold cathode arc source is composed of an arc source and a control magnetic field group. The arc source includes target 1, target base 5, target base shield 6, target chassis 4, and lead The arc device 15 and the permanent magnet device 20, the control magnetic field gr...

Example Embodiment

[0056] Example 2:

[0057] The present invention provides a variety of magnetic field coupling implementations. Example 2 is an implementation of coupling the axial magnetic field generated by the permanent magnet device at the rear end of the traditional target material and the two-pole radial rotating magnetic field. The magnetic field guided to focus does not participate in the coupling. Picture 9 (a)- Picture 9 (c) is a schematic diagram of the transient magnetic field distribution of embodiment 2 when the two-pole rotating radial magnetic field is coupled with the axial magnetic field of the permanent magnet at the rear end of the target. Picture 9 (a) is the transient distribution diagram of the two-pole rotating radial magnetic field on the cross section of the target without the axial magnetic field coupling at the rear end of the target. It can be seen that when other magnetic fields do not work, the two poles on the target surface The radial magnetic field is complete...

Example Embodiment

[0059] Example 3:

[0060] Although the quasi-diffusion arc state can be achieved under the combined effect of a certain rotating dipole radial magnetic field strength and a certain rotating frequency, the radial magnetic field has the effect of confining the plasma. In order to further improve the transmission efficiency of the plasma, embodiment 3 It provides a solution to extract the purified high-density plasma through the axial focusing and guiding magnetic field of the front section of the target. Example 3 is an implementation of coupling the two-pole radial rotating magnetic field with the axial focus guiding magnetic field at the front end without the participation of the axial magnetic field generated by the permanent magnet device at the rear end of the traditional target. There are two cases in this scheme, one is the case without focusing guide yoke, and the other is the case with focusing guide yoke. Picture 10 (a) It is the transient distribution diagram of the tw...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of preparation of films and coatings, particularly to a compact and efficient cold cathode arc source of a quasi diffusion arc. The cold cathode arc source is composed of an arc source head and a control magnetic field group, wherein the arc source head comprises a target, a target base, a target base shielding cover, a target base plate, an arc striking device and a permanent magnet device; the control magnetic field group comprises a flange sleeve, a flange sleeve insulating bush, a dipolar radial rotating magnetic filed generating device, an axial focusing guiding magnetic field generating device, a coaxial focusing magnetic field magnetic yoke and a flange sleeve shielding cover; and the arc source head is connected with the bottom of the flange sleeve through the target base plate to form a whole arc source structure, and connected with a finance through a flange arranged in front of the flange sleeve. Arc spots are distributed on the whole target surface under the comprehensive action of a certain magnetic field intensity and rotary frequency, the power density of the arc spots is reduced, the quasi diffusion arc state is achieved, launch of large grains is reduced, simultaneously, purified high-density plasmas are extracted through the axial focusing guiding magnetic field, and the transmission efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of film and coating preparation, in particular to a compact and efficient quasi-diffusion arc cold cathode arc source. Background technique [0002] Arc ion coating technology is an advanced ion coating technology today. Due to its simple structure, high ionization rate, high incident particle energy, good diffraction, and a series of advantages such as low temperature deposition can be realized, arc ion plating technology has been rapidly developed. It has been developed and widely used, showing great economic benefits and industrial application prospects, especially in the decorative plating and mold plating market, arc ion plating can be seen everywhere. However, the spraying of large particles causes the surface of the film to be polluted, leading to an increase in the surface roughness and reducing the gloss of the film, which has an adverse effect on decorative and anti-wear applications, seriously aff...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/32
Inventor 郎文昌
Owner WENZHOU POLYTECHNIC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap