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Compact and efficient cold cathode arc source of quasi diffusion arc

A cold cathode, high-efficiency technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of rate reduction, magnetic field leakage, and unfavorable plasma transmission, so as to improve ion density and ionization rate, promote particle-to-particle collisions, and enhance bombardment effects

Active Publication Date: 2013-02-20
WENZHOU POLYTECHNIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the arc ion plating device of this patent is not designed for a target of a specific size, and the appropriate magnetic field form is not indicated. It is found that not any form of rotating magnetic field can effectively control the arc spot; the invention still relies on dynamic rotation The magnetic field controls the movement of the arc spot, and does not give the core points of realizing the quasi-diffused arc source; this invention does not carry out innovative design on the specific arc source structure, and the rotating magnetic field generating device is completely set on the flange sleeve surrounding the target. The magnetic field flux leakage is serious, the structure is bulky and not compact, which is not conducive to the design and arrangement of the whole coating machine; the most important thing is that the invention only uses the rotating transverse magnetic field to constrain the arc spot discharge, which is not good for the transmission of plasma, and greatly reduces the arc plasma. Transmission efficiency, most of the plasma is confined near the target surface, causing deposition non-uniformity and rate reduction

Method used

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  • Compact and efficient cold cathode arc source of quasi diffusion arc
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  • Compact and efficient cold cathode arc source of quasi diffusion arc

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Embodiment 1

[0045] The invention breaks through the traditional cold cathode arc source magnetic field design idea, improves the traditional arc source structure, and provides a compact and efficient quasi-diffusion arc cold cathode arc source for circular targets with a diameter of 60-150mm. figure 1 It is a two-dimensional schematic diagram of the overall structure of a compact and efficient quasi-diffusion arc cold cathode arc source, figure 2 It is a three-dimensional schematic diagram of the overall internal structure of a compact and efficient quasi-diffusion arc cold cathode arc source without a flange sleeve shield. It can be seen from the figure that the compact and efficient quasi-diffusion arc cold cathode arc source is composed of the arc source and the control magnetic field group. The arc source includes the target 1, the target base 5, the target base shield 6, the target chassis 4, the The arc device 15 and the permanent magnet device 20, the control magnetic field group ...

Embodiment 2

[0057] The present invention provides multiple implementations of magnetic field coupling. Example 2 is an implementation of the coupling between the axial magnetic field generated by the permanent magnet device at the rear end of the traditional target and the dipole radial rotating magnetic field. The axis of the front section of the dipole radial rotating magnetic field The focus-guiding magnetic field does not participate in the coupling. Figure 9 (a)- Figure 9 (c) is a schematic diagram of the transient magnetic field distribution of embodiment 2 where the two-pole rotating radial magnetic field is coupled with the axial magnetic field of the permanent magnet at the rear end of the target, Figure 9 (a) is the transient distribution diagram of the two-pole rotating radial magnetic field on the cross-section of the target without the coupling of the axial magnetic field at the rear end of the target. It can be seen that when other magnetic fields do not work, the two pol...

Embodiment 3

[0060] Although the quasi-diffusion arc state can be realized under the comprehensive coupling effect of a certain rotating dipole radial magnetic field strength and a certain rotating frequency, the radial magnetic field has the effect of confining the plasma. In order to further improve the transmission efficiency of the plasma, embodiment 3 It provides a solution to extract the purified high-density plasma through the axial focusing guiding magnetic field of the front section of the target. Embodiment 3 is an embodiment in which there is no participation of the axial magnetic field generated by the conventional permanent magnet device at the rear end of the target, and the two-pole radial rotating magnetic field is coupled with the front axial focusing guiding magnetic field. There are two situations in this scheme, one is the situation without focus guiding yoke, and the other is the situation with focus guiding yoke. Figure 10 (a) is the transient distribution diagram of...

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Abstract

The invention relates to the technical field of preparation of films and coatings, particularly to a compact and efficient cold cathode arc source of a quasi diffusion arc. The cold cathode arc source is composed of an arc source head and a control magnetic field group, wherein the arc source head comprises a target, a target base, a target base shielding cover, a target base plate, an arc striking device and a permanent magnet device; the control magnetic field group comprises a flange sleeve, a flange sleeve insulating bush, a dipolar radial rotating magnetic filed generating device, an axial focusing guiding magnetic field generating device, a coaxial focusing magnetic field magnetic yoke and a flange sleeve shielding cover; and the arc source head is connected with the bottom of the flange sleeve through the target base plate to form a whole arc source structure, and connected with a finance through a flange arranged in front of the flange sleeve. Arc spots are distributed on the whole target surface under the comprehensive action of a certain magnetic field intensity and rotary frequency, the power density of the arc spots is reduced, the quasi diffusion arc state is achieved, launch of large grains is reduced, simultaneously, purified high-density plasmas are extracted through the axial focusing guiding magnetic field, and the transmission efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of film and coating preparation, in particular to a compact and efficient quasi-diffusion arc cold cathode arc source. Background technique [0002] Arc ion coating technology is an advanced ion coating technology today. Due to its simple structure, high ionization rate, high incident particle energy, good diffraction, and a series of advantages such as low temperature deposition can be realized, arc ion plating technology has been rapidly developed. It has been developed and widely used, showing great economic benefits and industrial application prospects, especially in the decorative plating and mold plating market, arc ion plating can be seen everywhere. However, the spraying of large particles causes the surface of the film to be polluted, leading to an increase in the surface roughness and reducing the gloss of the film, which has an adverse effect on decorative and anti-wear applications, seriously aff...

Claims

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Application Information

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IPC IPC(8): C23C14/32
Inventor 郎文昌
Owner WENZHOU POLYTECHNIC
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