Preparation method of MoS2 composite thin film with high hardness and loss abrasion on surface of substrate

A technology of composite thin film and high hardness, which is applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of low friction coefficient and wear rate, high hardness, low hardness, etc., and achieve low wear rate, The effect of improving the binding force of the membrane base and enhancing the structure density

Active Publication Date: 2013-04-24
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical purpose of the present invention is aimed at above-mentioned utilizing traditional magnetron sputtering technology to prepare MoS 2 The thin films that exist in the thin film often have shortcomings such as loose structure and low hardness, providing a method for preparing MoS 2 A new method for thin films, which can be used to prepare MoS with strong film-based adhesion, high hardness, and low friction coefficient and wear rate in various friction environments 2 film

Method used

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  • Preparation method of MoS2 composite thin film with high hardness and loss abrasion on surface of substrate
  • Preparation method of MoS2 composite thin film with high hardness and loss abrasion on surface of substrate
  • Preparation method of MoS2 composite thin film with high hardness and loss abrasion on surface of substrate

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Embodiment 1

[0034] In this embodiment, high-speed steel is used as the substrate, and the metal Ti primer layer, TiN transition layer, and Ti / MoS are sequentially deposited on the substrate surface by high-power pulse magnetron sputtering technology. 2 Composite film, the specific process is as follows.

[0035] Ultrasonic clean the substrate with acetone and alcohol water for 15 minutes respectively, dry it, place it in the chamber of high-power pulse magnetron sputtering vacuum coating equipment, and evacuate the chamber so that the vacuum degree of the chamber is lower than 3.0×10 -5 After Torr, perform the following steps:

[0036] (1) Introduce argon gas with a flow rate of 100 sccm into the cavity, open the vacuum baffle to keep the air pressure in the cavity at 8.0mTorr, apply a pulsed negative bias of -500V to the substrate, and argon glow etching for 30 minutes;

[0037] (2) The substrate frame is placed at the fixture position in front of the Ti target position, and the rotation ...

Embodiment 2

[0053] In this embodiment, the cemented carbide is used as the substrate, and the metal Ti primer layer, TiN transition layer, and Ti / MoS are sequentially deposited on the surface of the substrate by high-power pulse magnetron sputtering technology. 2 Composite film, the specific process is as follows.

[0054] Ultrasonic clean the substrate with acetone and alcohol water for 15 minutes respectively, dry it, place it in the chamber of high-power pulse magnetron sputtering vacuum coating equipment, and evacuate the chamber so that the vacuum degree of the chamber is lower than 3.0×10 -5 After Torr, perform the following steps:

[0055] (1) Inject argon gas with a flow rate of 100 sccm into the cavity, open the vacuum baffle to keep the air pressure in the cavity at 10.0 mTorr, apply a pulsed negative bias of -500V to the substrate, and perform argon glow etching for 30 minutes;

[0056] (2) The substrate frame is placed at the fixture position in front of the Ti target, and th...

Embodiment 3

[0061] In this embodiment, stainless steel is used as the substrate, and the high-power pulse magnetron sputtering technology is used to deposit the metal Ti primer layer, TiN transition layer, and Ti / MoS 2 Composite film, the specific process is as follows.

[0062] Ultrasonic clean the substrate with acetone and alcohol water for 15 minutes respectively, dry it, place it in the chamber of high-power pulse magnetron sputtering vacuum coating equipment, and evacuate the chamber so that the vacuum degree of the chamber is lower than 3.0×10 -5 After Torr, perform the following steps:

[0063] (1) Introduce argon gas with a flow rate of 100 sccm into the chamber, open the vacuum baffle to keep the air pressure in the chamber at 8.5mTorr, apply a pulsed negative bias of -500V to the substrate, and perform argon glow etching for 30 minutes;

[0064] (2) The substrate frame is placed at the fixture position in front of the Ti target, and the rotation is turned on, and argon gas wit...

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Abstract

The invention discloses a preparation method of a MoS2 composite thin film with high hardness and loss abrasion on a surface of a substrate. The method comprises the following step: sequentially depositing a metal Ti priming coat, a TiN transitional layer and a Ti/MoS2 composite thin film on the surface of the substrate by using a high power pulse magnetron sputtering technology combined with optimized process conditions to obtain the MoS2 composite thin film which is strong in film binding force and high hardness and has low frictional coefficient and wear rate in various frictional environments. The nano hardness of the composite thin film is over 11GPa, the critical load value is over 60N, and the frictional coefficients in room-temperature air with relative humidity of 30%, 50% and 70%, an N2 atmosphere and a hydraulic oil environment are below 0.055. Therefore, the substrate is effectively protected in frictional reduction, and the composite thin film has a good application prospect.

Description

technical field [0001] The invention relates to the technical field of vacuum coating on the surface of materials, in particular to a MoS with high hardness and low wear on the surface of a substrate 2 Preparation method of composite film. Background technique [0002] MoS 2 Thin film is a kind of solid lubricating material with excellent performance. It is widely used in vacuum environment and aerospace field because of its strong bearing capacity and low friction coefficient. [0003] Currently, MoS 2 Thin films are generally prepared by traditional magnetron sputtering technology, but the MoS prepared by this technology 2 The film is often loose in structure and low in hardness, and is easily eroded by water vapor and oxygen in a humid atmosphere, resulting in lubrication failure, thus limiting its application in various friction environments. For this reason, academia and industry mainly use the method of metal co-deposition to improve MoS 2 Friction and wear proper...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54C23C14/14C23C14/06
Inventor 柯培玲秦晓鹏汪爱英王振玉张栋
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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