Magnetron sputtering preparation method of vanadium oxide
A technology of magnetron sputtering and vanadium oxide thin film, which is applied in sputtering coating, ion implantation coating, metal material coating process, etc., can solve the problems of increasing process difficulty, reducing process repeatability, etc. High rate, low substrate temperature, uniform sputtering effect
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[0012] 1) Clean the surface of the silicon wafer to remove the polluting organic matter, dust and metal ion impurities on the surface of the silicon wafer. The process is as follows: mix concentrated sulfuric acid and hydrogen peroxide at a volume ratio of 3:1 to prepare a cleaning solution, and clean the silicon wafer here Soak in the solution for 40 minutes, rinse the silicon chip with deionized water, then mix ammonia water, hydrogen peroxide and deionized water at a volume ratio of 1:40:50, soak the silicon chip for 30 minutes, and then rinse with deionized water. A layer of silicon oxide film is first deposited on the silicon wafer by PECVD method, the background vacuum is 4.5×10-1Pa, the working pressure is 4.3Pa, the substrate temperature is 150°C, the working gas is nitrous oxide and silane, and the gas flow rate 12ml / min and 38ml / min respectively, the deposition time is 10 minutes, and the thickness of the silicon dioxide layer is about 1000nm;
[0013] 2) Using the m...
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