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Magnetic-pole-assisted unbalanced magnetic control sputtering device

A magnetron sputtering device and non-equilibrium technology, which is applied in the field of dense oxide film preparation, can solve the problems of insufficient diffusion of deposited atoms or atomic groups, restrictions on the research and development of energy conversion devices, and the inability of the electrolyte film to achieve a dense structure. Effect of reducing plasma distribution, increasing plasma density, and high uniformity

Active Publication Date: 2017-05-10
重庆花喜鹊科技有限公司
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Problems solved by technology

At present, the electrolyte film is generally prepared by traditional radio frequency sputtering method, but the prepared electrolyte film cannot meet the requirements of dense structure, which greatly limits the research and development of energy conversion devices.
[0003] The traditional radio frequency sputtering device uses a planar balance magnetron electrode. In this

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  • Magnetic-pole-assisted unbalanced magnetic control sputtering device
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  • Magnetic-pole-assisted unbalanced magnetic control sputtering device

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Embodiment Construction

[0034] In order to enable those skilled in the art to better understand the technical solutions in the embodiments of the present invention, and to make the above-mentioned purposes, features and advantages of the embodiments of the present invention more obvious and understandable, the following describes the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings For further detailed explanation.

[0035] In the description of the present invention, unless otherwise specified and limited, it should be noted that the term "connection" should be understood in a broad sense, for example, it can be a mechanical connection or an electrical connection, or it can be the internal communication of two elements, it can be Directly connected or indirectly connected through an intermediary, those skilled in the art can understand the specific meanings of the above terms according to specific situations.

[0036] In one embodiment of ...

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Abstract

The invention provides a magnetic-pole-assisted unbalanced magnetic control sputtering device which comprises a vacuum chamber, unbalanced magnetic control electrodes, assisting magnetic poles and a substrate bearing frame. The substrate bearing frame is arranged on the lower side of the vacuum chamber, the unbalanced magnetic control electrodes are arranged at the center of the upper side of the vacuum chamber, and the assisting magnetic poles are arranged on the two sides of the unbalanced magnetic control electrodes; or the unbalanced magnetic control electrodes are uniformly distributed on the same circumference with the center of the upper side of the vacuum chamber as the circle center, and the assisting magnetic poles are uniformly distributed on contour lines of the inner wall of the vacuum chamber and/or arranged at the center of the upper side of the vacuum chamber; when an even number of the unbalanced magnetic control electrodes exist, the two sides of at least one pair of the unbalanced magnetic control electrodes which are arranged side by side are provided with the assisting magnetic poles; and when an odd number of the unbalanced magnetic control electrodes exist, the number of the assisting magnetic poles which are uniformly distributed on the contour lines of the inner wall of the vacuum chamber is equal to that of the unbalanced magnetic control electrodes. By means of the magnetic-pole-assisted unbalanced magnetic control sputtering device, informality of a deposited film in terms of the ingredient, the microstructure and thickness can be improved.

Description

technical field [0001] The invention belongs to the technical field of dense oxide film preparation, and in particular relates to a magnetic pole-assisted unbalanced magnetron sputtering device. Background technique [0002] Electrolyte films are important components in energy conversion devices. At present, the electrolyte film is generally prepared by traditional radio frequency sputtering method, but the prepared electrolyte film cannot meet the requirements of dense structure, which greatly limits the research and development of energy conversion devices. [0003] The traditional radio frequency sputtering device uses a planar balance magnetron electrode. In this way, the energy of the deposited material is low. On the interface where the film is thickened, the deposited atoms or atomic groups cannot fully diffuse, which leads to the deposition of thin films on the microstructure. There are many pores, and the thickness is not uniform, which cannot meet the requirements...

Claims

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Application Information

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IPC IPC(8): C23C14/35H01J37/34
CPCC23C14/351H01J37/3405H01J37/3452
Inventor 石永敬
Owner 重庆花喜鹊科技有限公司
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