Magnetic-pole-assisted unbalanced magnetic control sputtering device
A magnetron sputtering device and non-equilibrium technology, which is applied in the field of dense oxide film preparation, can solve the problems of insufficient diffusion of deposited atoms or atomic groups, restrictions on the research and development of energy conversion devices, and the inability of the electrolyte film to achieve a dense structure. Effect of reducing plasma distribution, increasing plasma density, and high uniformity
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[0034] In order to enable those skilled in the art to better understand the technical solutions in the embodiments of the present invention, and to make the above-mentioned purposes, features and advantages of the embodiments of the present invention more obvious and understandable, the following describes the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings For further detailed explanation.
[0035] In the description of the present invention, unless otherwise specified and limited, it should be noted that the term "connection" should be understood in a broad sense, for example, it can be a mechanical connection or an electrical connection, or it can be the internal communication of two elements, it can be Directly connected or indirectly connected through an intermediary, those skilled in the art can understand the specific meanings of the above terms according to specific situations.
[0036] In one embodiment of ...
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