The invention discloses a
semiconductor device which comprises a substrate, a
semiconductor channel layer and a first
dielectric layer which are sequentially arranged from bottom to top, the
semiconductor device further comprises a source
electrode, a drain
electrode and a gate
electrode, and the source electrode and the drain electrode are arranged at intervals, penetrate through the first
dielectric layer and are in contact connection with the semiconductor channel layer; a second
dielectric layer is further arranged on the first
dielectric layer, the gate electrode penetrates through the second
dielectric layer and is in contact connection with the first
dielectric layer, the gate electrode is in a closed ring shape, and the projection of the gate electrode in the vertical direction surrounds the projection of the source electrode or the drain electrode in the vertical direction. The
semiconductor device does not need to be manufactured by adopting an
ion implantation process, the cost is lower, in addition, the gate electrode is designed to be in a closed ring shape, and the projection of the gate electrode in the vertical direction surrounds the projection of the source electrode or the drain electrode in the vertical direction, so that the source electrode or the drain electrode in the gate electrode is prevented from leaking current, and the reliability of the
semiconductor device is improved. And the performance of the
semiconductor device is better.