110 results about "Nano machining" patented technology

The invention provides a complex curved surface-oriented array structure silk-screen printing device and a control method thereof, and belongs to the technical field of advanced manufacturing. The printing device comprises a bed body module, a movement module, a silk-screen printing module and a control module, the posture position of a workpiece can be adjusted in the printing process, and the bed body module has five degrees of freedom and can adjust the posture of the workpiece in any curved surface shape. In the silk-screen printing process, the control module executes a professional numerical control G code program generated through path planning software, and the accuracy of the printing position can be guaranteed. The silk-screen printing equipment part moves a silk-screen printing module to a designated position to start printing on the basis of five-axis movement. Multi-material, high-precision, high-efficiency and damage-free manufacturing of the array structure can be realized, and the method has the characteristics of full-process automation, high forming speed, high efficiency and the like of silk-screen printing manufacturing, and has a good application prospect in the fields of precision machining, micro-nano machining and the like.

The invention provides a micro-nano processing platform user machine-hour management method and device, a storage medium and equipment. The method comprises the following steps: acquiring an equipment reservation request sent by a user; calling a user initial machine hour from the equipment machine hour management system according to the user identity information; if the initial machine time of the user does not meet the equipment machine time sum of the equipment reservation request, sending a prompt message that the machine time is insufficient to the user; real-time equipment operation parameters and user real-time operation records of a user in the equipment operation process are obtained, and a user machine time adjustment strategy is obtained according to the real-time equipment operation parameters, the user real-time operation records and the equipment reservation request; and adjusting the initial machine time of the user according to the machine time adjustment strategy to obtain a final user machine time, and sending the final user machine time to the user. Through the user machine-hour management method, transparent machine-hour management of the micro-nano machining platform is realized, and meanwhile, the opinions of standard operation of the user and the use efficiency of the micro-nano machining platform equipment are improved by utilizing the equipment machine-hour adjustment strategy.

The invention relates to the field of laser micro-nano machining, in particular to an ultrafast laser high-stability welding method and device for heterogeneous materials, effectively solves the problem of welding defects caused by unstable metal surfaces during ultrafast laser welding of large-diameter transparent / metal heterogeneous materials, effectively improves the welding strength and stability, and improves the welding quality. And the mirror surface and non-mirror surface metal welding quality unification is realized. The method specifically comprises the steps that the light emitting mode of ultrafast laser is adjusted, monopulse output is converted into Burst pulse string output, the ultrafast laser in the Burst output mode is used for conducting polishing pretreatment on the surface of the metal material, stable control over the surface quality of the mirror surface and the surface quality of the non-mirror surface metal can be achieved, and the surface roughness after polishing can be controlled to be smaller than lambda / 4; the transparent material and the polished metal material are welded through ultrafast laser, stable control over the welding strength of the heterogeneous material can be achieved, and the welding strength of the mirror-surface metal material is close to that of the non-mirror-surface metal material.

The invention provides a discontinuous metal film with a tunneling effect, a tunneling electrode chip and a preparation method of the tunneling electrode chip. A large-area uniform discontinuous metal film grows in situ on a glass substrate through a magnetron sputtering deposition method, and a charge tunneling structure with a random nano array is constructed. The discontinuous metal thin film comprises a substrate and a nano gap thin film arranged on the substrate, the nano gap thin film comprises a plurality of nano islands and a plurality of nano gaps which are randomly distributed, and a nano gap is formed between any two adjacent nano islands and a nano gap lt; 10 nm; the thickness of the nano-gap film is lt; the wavelength is 100 nm. According to the tunneling electrode chip, atomic-scale thickness control is achieved through high-precision thin film deposition, the uniformity of multi-batch devices is remarkably improved, the yield is improved by 50% or above compared with a traditional method, the limitation of high cost of micro-nano machining faced by a traditional tunneling device is broken through, and the tunneling electrode chip has the sensitive response capacity for different small molecule media and is suitable for large-scale popularization and application. Molecular information can be presented in the form of transient conductance information.

The invention relates to the technical field of biomedical engineering and microfluidics, in particular to a fluid dynamics topological optimization design method of a circulating tumor cell sorting structure, which comprises the following steps of: establishing a three-dimensional flow field model containing a key separation area in a preset design domain, dispersing by adopting a tetrahedral mesh and setting boundary conditions; the method comprises the following steps: establishing a multi-objective optimization function based on a maximized transverse focusing distance, a minimum shear force peak value and a total pressure drop, dispersing a design domain into units and endowing the units with density variables, and realizing global automatic topological optimization by adopting penalty material interpolation and minimum flow velocity threshold constraint. An optimization result is subjected to structural reconstruction processing to generate a CAD model adaptive to micro-nano machining, closed-loop feedback is formed through secondary verification and experimental verification of computational fluid mechanics, it is ensured that the design meets the requirements for sorting efficiency and cell activity, limitation of a traditional flow channel form is broken through, and the design freedom degree, manufacturability and application value are improved.

The invention discloses a preparation method and application of a nanopore optical biosensor based on a cTnC antibody, and relates to the field of optical biosensing detection. The method comprises the following steps: preparing a solid nanopore array AAO through a micro-nano machining technology; and carrying out surface functionalization on the surface of the solid nanopore array, and immobilizing a cTnC antibody for specifically recognizing cTnC to form a biosensing interface with high sensitivity and high specificity. Compared with the prior art, the nanopore optical biosensor prepared by the invention has the advantages of high sensitivity, short detection period, good anti-interference performance and low cost when being used for detecting cTnC.

The invention relates to the technical field of high-power femtosecond laser manufacturing, and discloses a high-power industrial femtosecond laser water cooling structure and a manufacturing method thereof. Comprising the steps that any one of a variable cross-section spiral flow channel, a bionic fin flow channel or a micro-channel array is directly machined in a machine shell water-cooling plate through the five-axis linkage precision machining technology or the micro-nano machining technology, or the printer shell water-cooling plate is integrated through the metal additive manufacturing technology; a reflector base, a heat dissipation chute and a cooling water channel are integrated in the machining process of the water cooling plate of the machine shell; carrying out material and surface treatment process operation; assembling process operation is carried out, a reflecting mirror base is matched with a mortise and tenon joint structure and a machine shell water-cooling plate through high-precision positioning pins, the reflecting mirror base and the machine shell water-cooling plate are rigidly connected in a vacuum brazing or laser welding mode, and a light guide side plate and a runner cover plate are designed into standard modules; the light guide side plate and the runner cover plate are quickly assembled through magnetic attraction positioning and spring buckles.

The invention belongs to the technical field of micro-nano machining, and particularly relates to a preparation method of a diamond color center array based on a phase separation nano mask. The invention comprises two schemes. The scheme I comprises the following steps: pretreating a diamond raw material; depositing a hard mask layer on the surface of the diamond; coating an adhesion layer; coating a phase-separable patterned block copolymer or assembling high polymer materials such as biological macromolecules and the like; the diamond is subjected to annealing treatment; forming a nano mask by selectively etching the surface film layer; injecting nitrogen ions to form an NV color center array; removing the hard mask; and surface carbon impurities are removed through vacuum high-temperature annealing and acid pickling, and the high-quality color center array is obtained. The second scheme comprises a deposition step of simplifying a hard mask, and a phase-separable patterned high polymer material thick film is directly coated on the surface of the diamond raw material. By adopting two different technological processes, the preparation of the nano mask ion implantation color center array which is low in cost, high in mask precision and resolution, high in flux, extensible and large in area is realized.

The invention belongs to the technical field of micro-nano machining, and discloses a sapphire laser implicit cutting method and system based on femtosecond laser induced micro holes. The sapphire wafer is fixed on the object carrying moving unit, the femtosecond laser is used for emitting femtosecond laser, the femtosecond laser sequentially passes through the polarization rotating mirror, the first reflecting mirror and the objective lens and then is focused in the sapphire wafer, a micro-hole array is induced to grow in the sapphire wafer, the micro-hole array serves as a modification layer, and the modification layer is used for modifying the sapphire wafer. Carrying out femtosecond laser scanning by combining with a loading moving unit, and processing to obtain a plurality of modified layers; and applying an external force to separate the sapphire wafer after laser modification. According to the invention, the implicit cutting efficiency can be improved, and the fracture surface with lower roughness can be obtained.

The invention discloses a terahertz detector based on a circular metasurface and graphene composite structure and a method, and belongs to the technical field of semiconductor devices and micro-nano machining. The device comprises a substrate, a graphene layer, a circular metasurface layer, a first electrode and a second electrode, the graphene layer is arranged on the substrate; the first electrode and the second electrode are oppositely arranged on two side ends of the graphene layer; the circular metasurface layer is arranged on the graphene layer and located between the first electrode and the second electrode. According to the invention, the local field enhancement effect of the metasurface structure is combined with the photoelectric response of graphene, the frequency selective absorption of terahertz waves is realized, the signal-to-noise ratio and selectivity of the detector are improved, and the sensitivity and response speed of the detector are improved at the same time.

The invention relates to a high-sensitivity thermal flow sensing element and a preparation method thereof.The sensing element is composed of a flow chip and a flow channel piece, and in order to obtain the advantage of high sensitivity, a thermosensitive film with the high TCR characteristic is selected as a temperature measuring unit material; selecting a material with low thickness, low thermal conductivity and low thermal capacity as a chip substrate; the sensor chip is prepared by adopting multilayer pattern photoetching and thin film growth, a heating unit in the prepared sensor chip provides a stable temperature field, meanwhile, a high-sensitivity temperature measuring unit more accurately and quickly measures the change of the temperature field in real time, and the flow velocity and the flow direction are obtained according to a temperature difference signal, so that the measurement of the flow with lower flow velocity is facilitated. The problem that the sensitivity of a traditional silicon-based substrate flow sensing chip can be improved only through complex micro-nano machining procedures such as etching and thinning is effectively solved, the performance and the preparation efficiency of the thermal flow sensing chip are improved, the cost is greatly reduced, and the thermal flow sensing chip has industrial popularization value.

The invention discloses a method for preparing a two-dimensional material with a wrinkle structure under the assistance of liquid metal and application, and belongs to the field of micro-nano machining of two-dimensional materials. The method comprises the following steps: S1, covering the upper surface of a two-dimensional material with liquid metal gallium, and solidifying the liquid metal gallium under a cooling condition to obtain a metal gallium ingot loaded with a two-dimensional material nanosheet; s2, heating the metal gallium ingot loaded with the molybdenum disulfide nanosheet until gallium is molten, cooling and solidifying, and obtaining a two-dimensional material with a wrinkle structure after solidification; the method disclosed by the invention can be used for efficiently preparing the large-area and high-density wrinkle type two-dimensional material, is suitable for manufacturing devices such as high-performance sensors and has a wide application prospect.

The application relates to the field of laser micro-nano processing, in particular to a laser micro-nano processing device based on an acousto-optic deflector and a rotating mirror and a use method thereof, which comprises a pulse laser, a mirror group, an acousto-optic deflection module, a signal control unit, a beam splitting module, a rotating mirror and a flat-field focusing lens arranged in sequence; the acousto-optic deflection module comprises a first acousto-optic deflector and a second acousto-optic deflector, the first acousto-optic deflector and the second acousto-optic deflector are orthogonally arranged, the first acousto-optic deflector is arranged in parallel with the rotating shaft of the rotating mirror, the second acousto-optic deflector is arranged in perpendicular to the rotating shaft of the rotating mirror, through the arrangement of the two orthogonally arranged acousto-optic deflectors, the laser beam can be flexibly controlled to be deflected to any position in a rectangular scanning area, and in combination with the polygon rotating mirror, the polygon rotating mirror can be rotated only once along a processing track, the acousto-optic deflector can compensate and fill a processing pattern, and the technical effect that any shape can be realized is achieved.

The invention relates to the technical field of micro-nano machining, in particular to a system and method for preparing a flexible transparent electrode through nanosecond laser machining and application. The galvanometer polarization module is used for deflecting the nanosecond laser beam; the water bath cooling module is used for placing a membrane material, one side of the membrane material is in contact with water in the water bath cooling module, and the other side of the membrane material is etched by the deflected nanosecond laser beam; and the ultrasonic module is used for carrying out ultrasonic cleaning on the etched membrane material. The flexible transparent latticed electrode is prepared in a mode of combining laser emission module etching, galvanometer polarization, water bath cooling and final ultrasonic deburring, and the transparent latticed electrode has the characteristics of high conductivity, high light transmittance, excellent mechanical flexibility and the like; the requirement on equipment is reduced; and the production and manufacturing cost is greatly reduced.

The invention relates to the field of laser micro-nano machining, in particular to a laser micro-nano machining device based on an acousto-optic deflector and a rotating mirror and a using method of the laser micro-nano machining device. The laser micro-nano machining device comprises a pulse laser, a reflector set, an acousto-optic deflection module, a signal control unit, a beam splitting module, the rotating mirror and a flat field focusing lens which are sequentially arranged; the acousto-optic deflection module comprises a first acousto-optic deflector and a second acousto-optic deflector, the first acousto-optic deflector and the second acousto-optic deflector are orthogonally arranged, the first acousto-optic deflector is parallel to a rotating shaft of the rotating mirror, and the second acousto-optic deflector is perpendicular to the rotating shaft of the rotating mirror; two acousto-optic deflectors which are orthogonally arranged are arranged, a laser beam is flexibly controlled to deflect to any position in a rectangular scanning area, then the polygon rotating mirror is combined, the polygon rotating mirror can only rotate once along a machining track, the acousto-optic deflectors conduct compensation filling on machining patterns, and the technical effect that any shape can be achieved is achieved.

The invention relates to a beam gate and centering unit integrated focused ion beam micro-nano machining system and an ion beam control method. The focused ion beam micro-nano machining system integrating the beam brake and the centering units comprises a first centering unit (3), a second centering unit (4), a Faraday cup (5) and a control unit, and the control unit is electrically connected with the first centering unit (3) and the second centering unit (4). The control unit is used for controlling the first centering unit (3) and the second centering unit (4) to form a deflection electric field. According to the focused ion beam micro-nano machining system integrating the beam gate and the centering units, the centering unit located on the lower portion is used as the beam gate by means of the superposing performance of electric signals, and integration of the beam gate and the centering units is achieved; rapid closing of the ion beam under high-voltage driving and high-precision centering and axis closing of the ion beam under low-voltage driving can be realized in the same unit, and the complexity of an ion optical system and circuit control is reduced.

The application relates to the technical field of micro-nano machining, and discloses a kind of optical waveguide manufacturing template and its processing method, working template and diffractive optical waveguide manufacturing method.The optical waveguide manufacturing template includes template base and etching layer arranged on the surface of the template base, at least two groups of optical waveguide microstructures are arranged on the etching layer, and the depth of each group of optical waveguide microstructures is different.The thickness of the etching layer is configured to be able to meet the maximum design depth of each group of optical waveguide microstructures.The bottoms of different groups of optical waveguide microstructures are flush, and the tops are not flush.After implementing the technical scheme of the application, the technical problems of the prior art, such as complicated processing technology of multi-depth optical waveguide microstructure template, high overlay precision requirement, high manufacturing cost, low yield, low diffraction efficiency of depth microstructure due to imprinting residual glue during processing and poor display effect, are solved.

The invention relates to a time-of-flight secondary ion mass spectrometry focusing offset measurement and calibration method and application. Preparing a verification workpiece based on a micro-nano machining technology; the method comprises the following steps: placing a verification workpiece in a time-of-flight secondary ion mass spectrometry (ToF-SIMS) system, and acquiring an optical image and a secondary ion image SI of a charge-coupled device (CCD) of each dot-matrix array; the CCD optical image of each dot-matrix array is used as a reference image, image superposition comparison is carried out on the reference image and the corresponding SI image, a plurality of feature points are selected, the two-dimensional position deviation of each feature point in the SI image relative to the corresponding feature point in the CCD optical image is measured, the average value of the two-dimensional position deviation of all the feature points in each dot-matrix array is calculated, and the two-dimensional position deviation of all the feature points in each dot-matrix array is calculated. The focusing offset of the dot matrix array corresponding to each feature size is obtained; focusing offset data measured in the dot-matrix arrays are summarized, and a function relation between the feature size and the focusing offset is constructed and used for offset calibration or parameter adjustment of the time-of-flight secondary ion mass spectrometry system.

The invention provides a multi-dimensional vibration platform with oppositely-arranged double-sandwich piezoelectric actuators and an excitation method of the multi-dimensional vibration platform, and belongs to the technical field of high-frequency vibration engineering and micro-nano machining.The vibration platform comprises a center platform, the two oppositely-arranged piezoelectric actuators, two end covers and two bolts, wherein the center platform is integrated with the tail end platform, the two flexible hinges and the two amplitude-change poles, and the center platform is slender and is in mirror symmetry about the longitudinal symmetry plane of the tail end platform. The piezoelectric actuator comprises a longitudinal vibration ceramic group, a bending vibration ceramic group around the Y axis and a bending vibration ceramic group around the Z axis, translation along the X / Y / Z axis and rotation around the Y / Z axis can be realized through in-phase or anti-phase excitation different combinations under the condition of not increasing extra driving channels, and five-degree-of-freedom high-frequency micro-vibration output can be achieved at most. The structure has high symmetry, low parasitic vibration, compact size and high integration, and is suitable for precise engineering scenes such as micro-nano processing, laser-assisted manufacturing, cell manipulation and active vibration suppression.

The invention provides a long-life restoration for oral micro-ecological regulation and an intelligent preparation method and device thereof. The preparation method comprises the following steps: collecting oral micro-ecological medical data of a patient, combining high-precision three-dimensional morphology feature extraction of the restoration, performing multi-modal data deep fusion and feature mining, and utilizing a multi-physics coupling AI design engine to construct a bionic micro-nano texture topological configuration with a specific function; a graded micro-nano composite structure is constructed on the surface of the restoration in situ by adopting an ultrafast laser micro-nano machining system, and the surface wettability is controllably converted from hydrophilic to super-hydrophobic through cooperative regulation and control of the surface wettability, hydrophilicity and hydrophobicity. The prepared prosthesis integrates the functions of passively inhibiting bacteria from being adsorbed on the surface of the prosthesis, preventing gingival atrophy, guiding periodontal tissue regeneration and the like, and the long-life dental prosthesis with the bionic micro-nano texture generated by the AI is obtained. The bionic micro-nano texture manufactured by the invention has excellent mechanical properties and the functions of passive bacteriostasis, damage resistance, gum fixation and the like.

The invention discloses a micro-nano device photoetching process based on surface energy repair and a micro-nano device, and relates to the technical field of photoetching. The process provided by the invention comprises the following steps: carrying out plasma cleaning on a substrate, immersing the substrate subjected to plasma cleaning into an organic cleaning solvent, and removing an unstable metamorphic layer and pollutants on the surface of the substrate by adopting at least one of soaking, stirring and ultrasonic treatment, then, the cleaned substrate is adopted to carry out subsequent photoetching and micro-nano machining processes; the step of organic solvent cleaning is added after substrate plasma cleaning, an unstable metamorphic layer is disintegrated and other impurities are removed through permeation and slight dissolution effects of an organic solvent on the surface of the substrate, so that the surface of the substrate is recovered to a smooth and stable state; therefore, the defects of edge collapse, side wall roughness and the like of the photoresist pattern in the photoetching process are remarkably reduced, and the photoetching morphology precision and the production yield of the micro-nano device are effectively improved.

The application discloses an information management system and method of a micro-nano machining experiment platform, and is used for solving the problems of great difficulty in personnel management and poor information display effect in the prior art. The information management system comprises an identification and tracking module, an alarm module, an intelligent pushing module and a rendering module. The identity information data of the micro-nano machining laboratory personnel in a monitoring area is acquired through the identification and tracking module. The first type of identity information is extracted from the identity information data of the micro-nano machining laboratory personnel through the intelligent pushing module, and the first type of identity information is displayed at a preset position of the real scene image of the micro-nano machining laboratory personnel through the rendering module. When the alarm information of the violation is received from the alarm module, the intelligent pushing module can determine the second type of identity information according to the preset display rule, and the second type of identity information is displayed at the preset position of the real scene image of the micro-nano machining laboratory personnel through the rendering module.

The invention provides micro-nano machining equipment based on a longitudinal light field, and belongs to the technical field of micro-nano machining, and the micro-nano machining equipment comprises a light source module which is used for providing an input light beam; the light beam shaping module is used for receiving the light beam output by the light source module and shaping the input light beam into an annular light beam; the polarization regulation and control module is used for receiving the annular light beam output by the light beam shaping module and adjusting the polarization state of the annular light beam into radial polarization; and the focusing module is used for receiving the radial polarization annular light beam output by the polarization regulation and control module and focusing the radial polarization annular light beam on a focal plane to generate a high-purity longitudinal light field. According to the device, efficient conversion from common Gaussian light to a high-purity longitudinal light field is achieved, the device can generate sub-wavelength light spots with energy highly concentrated in the axial direction, the high-purity longitudinal light field can be stably generated, transverse field interference can be restrained, and therefore the micro-nano machining resolution is improved, and breakthrough of the traditional optical diffraction limit is facilitated.

The invention relates to a special-shaped mold modeling method and a micro-nano machining method for a coronal bionic adhesion array, and the method comprises the steps: carrying out the parametric modeling of a special-shaped micro-nano structure through three-dimensional digital scanning and curvature analysis, and achieving the high-precision molding of the spatial distribution special-shaped micro-nano structure of a mold through a focused ion beam or ultrafast laser or other micro-nano machining technologies; in combination with plasma-assisted multi-step deposition, in-situ growth of graded nano textures such as nano spikes and nanotube arrays in different space areas of the mold is realized, and precise regulation and control of nano structure space distribution and surface energy state are realized; according to the technology, the surface anti-pollution and coining consistency of the mold is effectively improved.

The invention relates to the technical field of micro-nano machining, in particular to a preparation method of an indium column. The preparation method comprises the following steps: sequentially forming a first photoresist coating and a second photoresist coating on the surface of a substrate from bottom to top; covering a partial region of the second photoresist coating with a mask; the area, not covered by the mask, of the second photoresist layer is exposed and then baked; after the baked second photoresist layer and the first photoresist layer are subjected to flooding exposure, developing is carried out, and indium plating holes are formed in the second photoresist layer and the first photoresist layer; and depositing an indium material on the surface of the second photoresist layer and in the indium plating hole to form an indium column. According to the method, one-time overlay exposure is matched with one-time extensive exposure operation, the indium plating hole with the undercut is prepared, back-and-forth switching of samples among different devices is reduced, and the utilization rate of the devices and the productivity of workpieces are improved.

A quantum bit component and a preparation method therefor, and a quantum chip and a chip preparation system, which relate to the technical field of micro-nano machining. The preparation method comprises: preparing on a substrate an underlying film of a quantum bit component (S510); preparing an underlying circuit on the basis of the underlying film (S520), wherein the surface of the underlying circuit is provided with a nitride passivation layer; and preparing, on the substrate, quantum bits which are connected to the underlying circuit (S530), so as to obtain the quantum bit component.

The invention belongs to the technical field of micro-nano machining, and particularly relates to a method for preparing a high-resolution EUV optical element through electron beam lithography. The method comprises the following steps: etching an optical element by using an electron beam lithography system, and introducing a region proximity effect correction strategy; the method comprises the following specific steps: preparing a silicon nitride film as a substrate, and spin-coating HSQ photoresist on the silicon nitride film; carrying out geometric region division on the to-be-exposed optical component graphic layout; at least dividing a central region, an edge region and a corner region; utilizing Monte Carlo simulation software to establish a function relationship between the graphic position and the required exposure dose so as to determine an independent exposure reference dose of each geometric region; an independent and compensated exposure reference dose is set for each geometric region based on dose deviation data obtained by simulation. According to the method, the pattern uniformity can be remarkably improved, and reliable preparation of a large-area and large-aspect-ratio nano structure is realized.

The present invention belongs to the field of atomic precision machining and discloses a method for preparing an atomically sharp diamond edge, comprising the following steps: Step 1: determining the geometry of the atomically sharp diamond edge; Step 2: using a femtosecond laser to trim the diamond surface to a specific crystal orientation; Step 3: designing a clamping device for the atomically sharp diamond edge; Step 4: using a focused ion beam to prepare nanometer-sized diamond micropillars and transfer them to the edge clamping device; Step 5: using argon plasma polishing technology to achieve atomic-level flatness on the surface of the diamond nanopillars; Step 6: using X-Nano multi-degree-of-freedom nanomanipulation technology to achieve atomic-level cleavage of the diamond nanopillars; Step 7: using a spherical aberration electron microscope to characterize and verify the atomically sharp diamond edge. The present invention achieves the preparation of an atomically sharp diamond edge with an edge blunt radius through micro-nano machining and atomic-scale controllable cleavage methods.

The invention provides a simulation method and system for sputtering a monocrystalline silicon target material based on a focused ion beam, and relates to the technical field of semiconductor material micro-nano machining, the method comprises the following steps: defining sputtering parameters including incident ion parameters, target material parameters and target material depth, and selecting an SRIM / TRIM calculation method; on the basis of the sputtering parameters, calculating an ion beam sputtering target material to generate distribution data; based on the distribution data, through integrated analysis of an integrated parameter optimization module and a damage evaluation model, the processing efficiency and the damage depth when the focused ion beam is used for processing the monocrystalline silicon target material are dynamically balanced; wherein the damage evaluation model selects sputtering parameters with the minimum defect influence and the etching efficiency higher than a preset threshold value by comparing defect density distribution, energy loss distribution and phonon energy loss distribution. Through a simulation framework based on the Monte Carlo method, collaborative optimization of parameters such as ion energy and target material thickness is realized, and the dynamic relationship between the sputtering yield and the damage depth is quantitatively analyzed.

The invention relates to a nano-sieve and a preparation method and application thereof, the nano-sieve is composed of multiple layers of micro-nano processing stacked structures, the nano-sieve internally comprises a high-density nano-channel array, the cross section of each channel is rectangular, and the width of each channel is determined according to the size of a target separation particle. The preparation method of the nano sieve comprises the following steps: preparing an initial groove; filling and flattening the photoresist; performing film deposition and secondary configuration; constructing a stacking structure; cutting and forming; and removing the photoresist. The method has the advantages of being small in screening scale, high in mechanical strength, high in flux, high in anti-blocking capacity and high in process compatibility.