177 results about "Nano machining" patented technology

The invention relates to a method for selectively preparing or integrating multistage silver micro-nanostructures inside various plane substrates and micro fluidic chip channels by the utilization of the femtosecond laser inducing metallic silver reduction technology. In addition, the silver multistage micro-nanostructure substrate prepared by the method is used as a reinforced substrate for surface-enhanced raman spectroscopy SERS. The method provided by the invention comprises the following steps of: preparing a silver plating solution for femtosecond laser micro-nano machining, establishing a femtosecond laser micro-nano machining system for realizing multi-point scan in the silver plating solution, placing the silver plating solution and the substrate into the femtosecond laser micro-nano machining system and preparing the multistage silver micro-nanostructures on the substrate. According to the invention, a laser beam scans in the silver plating solution along a track designed in advance by a program. The preparation method is independent of the smoothness of the substrate. In particular, the preparation of silver multistage structure SERS substrate can be accomplished on the bottom of the micro fluidic chip channels, thus realizing catalysis and surface-enhanced raman test application.

The invention discloses a method for preparing a miniature thermocouple probe of a scanning thermal microscopy, which belongs to the technical fields of nano machining, nanoscale performance measurement and electronic science. The method for preparing the miniature thermocouple probe of the scanning thermal microscopy comprises the following steps of: a) manufacturing a first metal layer on the front of a cantilever pinpoint of an atomic force microscopy; b) manufacturing an insulating layer on the first metal layer; c) removing the insulating layer in a set area on the tip of the pinpoint; and d) manufacturing a second metal layer on the insulating layer, wherein the second metal layer is in contact with the first metal layer in the set area, and is made from a material different from that of the first metal layer. The method can be used for the technical fields of nano machining, nanoscale performance measurement and the like.

The invention discloses an electron beam-ion beam micro and nano machining combination system, wherein the electron beam and the ion beam can be operated simultaneously, and the electron in SEM can be integrated with the positively charged ion to effectively decrease influence on observation and analysis caused by charge accumulation on the surface of sample. The electron beam-ion beam micro and nano machining combination system of the invention comprises a flange, a scan electron microscope, a focused ion beam device, a computer which is a part of the scan electron microscope, wherein the flange is arranged on the bevel of a reaction chamber of the scan electron microscope, and the ion gun of the focused ion beam is arranged in the through hole of the flange. By adopting electron beam and ion beam symmetric device, the design scheme has advantages of stabilized, simple and aesthetic structure, convenient and accurate alignment, defined image and high stabilization of sample stage etc., being beneficial to improvement of the imaging quality of the electron beam.

The invention discloses a composite jet flow micro-nano machining method and device. The upper end of an electrode wire is fixed, the lower end of the electrode wire penetrates through a nozzle to form an overhanging end, an electrolyte is added into a nano polishing particle, when the electrolyte is sprayed out through a nozzle at the high speed, the electrolyte is subject to jet flow, the electrode wire overhanging end is straightened, the electrode wire is subjected to radial position restraint, the upper end of the electrode wire is connected with a negative electrode of a narrow pulse wide group pulse electrolysis power source, a workpiece anode is connected with a positive electrode of the narrow pulse wide group pulse electrolysis power source, the electrolysis effect is generated between the electrode wire overhanging end and the machining surface of the workpiece anode, the nano polishing particle is driven by the electrolyte to carry out polishing on the machining surface ofthe workpiece anode, and composite machining of the workpiece anode machining surface is achieved until the needed micro structure characteristics are obtained. The machining method and device can effectively improve the locality of micro electrolytic machining, the stray corrosion phenomenon can be effectively restrained, the medium transfer process can be improved, and high-precision, high-surface-quality and high depth and width ratio micro structure characteristic efficient machining is achieved.

The present invention is a method of using direct head electrical response signals for feedback process control. When lapping the air bearing surface of a bar of sliders, a magnetic field is applied to the air bearing surface and a bias current is applied to the reader elements. A head electrical response, such as amplitude or resistance change, is measured and is used to control the lapping device. Using a fixture which allows individual slider machining, a controller can be used to monitor the head response signal for each slider on the bar and individually control each slider on the bar so that material removal over each slider proceeds until a predetermined target stripe height is reached.

The invention relates to the technical field of micro-nano material preparation and laser micro-nano machining, and in particular relates to a pulse laser-induced preparation method of a zinc oxide nano-structure. The zinc oxide nano-structures in different morphologies are prepared by using ultra-short pulse laser to radiate the surface of the zinc-based material in hydrogen peroxide, the method is suitable for a zinc plate or zinc-plated materials adopting different substrates.

The invention provides a method for preparing a nano-gap metal focusing lens, which comprises the following steps of: firstly, determining the incident wavelength, selecting an appropriate light-passing base material, evaporating a layer of metal film on a base, and enabling incident light to be vertical to the surface of the metal film; machining slit or circular gap arrays which are equal in width in the metal film by using a nano machining technology; and focusing light at a preset focus position, calculating phase delay distribution of slits or circular gaps arranged at different positions by a light wave when the light is focused at the focus position, and through focusing ion beams, guiding a medium with a special deposition thickness to meet the phase delay requirements of slits or circular gaps arranged at different positions by the light wave, so that the metal focusing lens realizes the focusing of incident light at the preset focus position. According to the invention, the deposition thickness of mediums in slits or circular gaps of the metal focusing lens is changed according to a preset focus position so as to realize near-field or far-field light focusing, the method can be applied to the integration of light path systems conveniently, and therefore, the method has a broad application prospect.

The invention belongs to the technical field of material technology and nanofabrication technology and specifically discloses a method for obtaining full-color-spectrum structural color through preparing metal holes having a chassis by utilizing nano-imprint lithography. The method comprises the following steps: carrying out cleaning and drying treatment on the surface of a substrate; carrying out substrate photoresist spin coating and pre-baking; carrying out nano-imprinting on the photoresist; carrying out ultraviolet light solidification processing on the photoresist obtained after the nano-imprinting; and depositing metal on the photoresist obtained after the nano-imprinting and the like. A metal hole array having the chassis obtained through the method has abnormal transmitting spectrum peak which is adjustable in peak position in a visible light waveband (360-810 nm), and the reflected single-color structural color in full color spectrum can be used for a CCD color filter or a color display and the like.

The invention belongs to the technical field of micro-nano machining, and specifically to a method for preparing a bionic micro-nano structure of a butterfly wing. The method of the invention comprises the steps as follows: firstly using a spin-coating method to alternately spin a plurality of layers of photoresist with different sensitivities in turn on a silicon substrate; then using electron beam lithography to expose the photoresist; then using two developing liquids to alternatively develop the exposed sample; finally preparing hierarchical periodic or quasi-periodic bionic micro-nano structure with excellent characteristic, such as morpho bionic micro-nano structure, and so on. By combining with technologies of the plurality of layers of the photoresist and electron beam lithography, the preparation process of the invention does not need a biological template and could control the spin-coating thickness of every layer of the photoresist to achieve accuracy control of longitudinal dendritic cycle and duty ratio. The method of the invention is simple in preparation technology and could obtain the bionic micro-nano structures of the butterfly phosphorus wing with different structure parameters.

The invention relates to a technology for measuring micro Newton force based on a PVDF piezoelectric material, particularly a system for measuring submicro Newton force which comprises a micro force perception measuring head, a signal disposal circuit and a data acquisition module, wherein the micro force perception measuring head receives micro force from a probe, converts a force signal to electric charge and then sends the electric charge to the signal disposal circuit; the signal disposal circuit converts the electric charge into a sizable and detectable pressure signal and sends the pressure signal to the data acquisition module; the data acquisition module conducts A/D convert of the received pressure signal and converts a pressure value into a micro force value by using the relationship between the calibrated micro force and the output pressure of the signal disposal circuit. The technology solves the problem of measuring submicro Newton contact force during the micro assembling process, and is mainly used in the technical fields of micro/nano machining, assembling, etc.

The invention discloses a method for preparing a hollowed structure on the surface of a transparent material and in the transparent material, and belongs to the technical field of femtosecond laser micro-nano machining. According to the method, the polarization and machining power is precisely controlled, a modified area with the precision of hundreds of nano is directly written in the transparentmaterial in a femtosecond laser direct writing manner, then the surface of the transparent is thinned to the machining area position (surface machining) in a mechanical/ion beam thinning manner, finally the material is etched through a wet etching process, and preparation of the hollowed structure with high precision, any patterned structure and the precision of hundreds of nano is achieved. According to the method, efficient high-precision machining of multiple common transparent materials can be achieved in a vacuum environment, and the problems that in the prior art, the requirement for the environment is high, and the machining efficiency is low are solved.

The invention discloses a vertical interconnection substrate manufacturing method based on a laser nanometer processing technology. The method comprises the following steps of photoetching, corrodingand degumming a dielectric layer to form a first circuit wiring layer at one side of the substrate, then, forming a blind hole at the corresponding position of the substrate by adopting a laser nano machining technology, putting the substrate into an electro-deposition solution for electro-deposition, filling the blind hole, and finally photoetching, corroding and degumming the dielectric layer toform a second circuit wiring layer at the other side of the substrate. The manufacturing method is concise in process flow, and the laser nano-machining technology is high in precision. Cavities do not exist in the through holes, the interconnection is reliable, and the density and reliability of the three-dimensional packaging of a LCP flexible substrate are improved. Meanwhile, the vertical interconnection between LCP double-sided circuit wiring layers is achieved through the metallized through holes, the interconnection distance can be effectively shortened, the signal delay is reduced, the parasitic inductance and capacitance are reduced, and the high-frequency characteristic is improved, and therefore the system integration performance is improved.

The invention discloses a flexible pressure sensor with a complementary spiral structure, a preparation method and application thereof, and belongs to the technical field of laser micro-nano machining. Laser is utilized to process the surface of a graphene oxide/silk fibroin composite film, and the photothermal effect of the laser can remove oxygen-containing functional groups in the graphene oxide, so that the graphene oxide is reduced and a spiral structure electrode is formed at the same time; after a porous adhesive tape is clamped between the pair of electrodes with the complementary spiral structures, the high-performance flexible pressure sensor with the complementary spiral structures is obtained, dual-mode detection of finger bending and finger approaching can be achieved, the porous structure of the adhesive tape is beneficial to large change of capacitance when the sensor is bent, and accurate detection of finger bending can be realized. And meanwhile, the spiral structure of the electrode increases the area of the edge region of the electrode, so that more electric fields can be expanded from the electrode plate region to the outer space, and sensitive detection of finger approach is realized.

The invention relates to a method for improving infrared band transmittance by processing a micro-nano structure on a surface of chalcogenide glass, and belongs to the technical field of infrared optical glass processing and application. According to the method, the micro-nano structure with a proper refractive index is directly manufactured on the surface of the chalcogenide glass, introduction of a new film material is avoided, and problems that a multi-layer film material is limited and quality of a film layer is poor in a traditional infrared antireflection film plating process are solved;reactive ion etching adopted in the method is mainly based on a chemical reaction of a gas and the chalcogenide glass, does not generate any effect on a part covered by a polymer coating, avoids generation of a stress, is performed at a normal temperature and in a vacuum state, and does not generate gasification and leakage of toxic components; and according to the method, micro-nano structure pattern impressing of a non-planar surface can be achieved, a category of large-area micro-nano machining optical elements is expanded, and efficient antireflection of the chalcogenide glass in all infrared wave bands can be achieved by changing a target graphic structure and technological parameters.

The invention discloses a double-butterfly-shaped stator piezoelectric linear actuator belonging to the field of precision driving technology. The double-butterfly-shaped stator piezoelectric linear actuator comprises a butterfly-shaped stator 1 (1), a butterfly-shaped stator 2 (2), a mover (3) and a pedestal (4), wherein the butterfly-shaped stator 1 (1) and the butterfly-shaped stator 2 (2) are placed on both sides of the mover (3) in mirror symmetry and are in elastic contact with the mover (3) and fixedly mounted on the pedestal (4). The butterfly-shaped stator 1 (1) and the butterfly-shaped stator 2 (2) have the same structure. A sinusoidal drive electric signal for lagging behind the butterfly-shaped stator 1 (1) for half a cycle is applied to the butterfly-shaped stator 2 (2). The butterfly-shaped stator 1 (1) and the butterfly-shaped stator 2 (2) alternately step to drive the mover (3) to move to effectively overcome backing of the mover (3). The double-butterfly-shaped stator piezoelectric linear actuator of the invention has advantages of a simple and compact structure, a large stroke, high precision, a large load and being capable of effectively inhibiting backspacing and being applied to the fields such as micro-nano machining, space flight and aviation and precision optics.

The invention discloses a manufacturing method of a nanometer triangular air slot, belonging to the technology field of micro/nano processing techniques. The method comprises the steps of: (1) on a substrate with a silicon top layer, transferring an exposure pattern on a photoresist mask by using nanometer photoetching technique and controlling the minimal line of the pattern at a nanometer scale; (2) etching the top layer silicon of the substrate with the photoresist as a mask by using inductively coupled plasma (ICP) dry etching technique to form a longitudinal air slot; (3) forming an oxidizing layer of thickness 7-15 nanometers on the surface of the top layer silicon forming the longitudinal air slot by thermal oxidization; and (4) filling the etched slot with silicon oxide adopting a liquid state insulating material by using chemical vapor deposition technique. The inventive method can manufacture the nanometer triangular air slot.

The invention belongs to the field of micro-nano machining, and particularly relates to a sample precise jig for cross-scale two-photon polymerization machining and a leveling method. The jig comprises an X-axis and Y-axis moving platform, a Z-axis displacement table and a base plate which are fixedly connected, and a fine-adjusting assembly, a transition assembly and a carrying table which are arranged on the base plate. One end of the transition assembly is fixed to the fine-adjusting assembly, and the other end of the transition assembly is fixed to the carrying table. The X-axis and Y-axismoving platform is used for driving the Z-axis displacement table and the base plate to move in the X-axis direction and the Y-axis direction. The Z-axis displacement table is used for driving the base plate to drive the fine-adjusting assembly, the transition assembly and the carrying table to move in the Z-axis direction. The fine-adjusting assembly is used for driving the transition assembly to drive the carrying table to adjust the levelness and flatness. By means of the sample precise jig, the real-time three-dimensional leveling precision of a cross-scale two-photon polymerization machining system is controlled within 100 nanometers, the accurate focusing of the two-photon polymerization machining system during machining and the forming precision of a machined product are effectively ensured, and the machining scale is expanded from the micro-nano scale to the millimeter-centimeter scale.

The invention discloses a super-resolution laser printing device based on columnar vector polarized light, and belongs to the field of super-resolution laser micro-nano machining. A light beam outputby a direct-writing laser is collimated into a parallel light beam by a collimator after being subjected to intensity modulation by an acoustic optical modulator, and then the light beam is convertedinto tangential polarized light through a polarizer, a 1/2 wave plate and a vortex half-wave plate; a light beam output by a suppression laser is collimated into a parallel light beam by the collimator after being subjected to intensity modulation by the acoustic optical modulator, and then the parallel light beam is converted into radial polarized light through the polarizer, the 1/2 wave plate and the vortex half-wave plate; the two columnar vector polarized lights are respectively shaped into annular parallel light beams through two conical lenses in sequence; then the two beams of light are combined into one path of light which is focused by a high numerical aperture objective lens; the annular radial polarized light is focused into a solid light spot, and the annular tangential polarized light is focused into a hollow dark spot; the full widths at half maximum of the two light spots are smaller than that of the light spots formed by circularly polarized light under the same focusing condition, so that higher printing resolution can be obtained.

The invention provides an environment-friendly fast nano silver sol preparation method implemented through abalone viscus degradation products, and belongs to the technical field of nano-machining. The preparation method of nano silver sol comprises the steps that the abalone viscus degradation products and silver nitrate are mixed and dissolved in a water-phase system, and the nano silver sol which is even in dispersion and good in stability is prepared through microwave heating, hot bath, oil bath or ultraviolet radiation. The preparation method is simple, safe and fast, and a green, environment-friendly and fast method is provided for preparation of the nano silver sol. Abalone viscera belong to by-products of the abalone processing industry and are reproducible biological resources. A new method is provided for synthesis of the nano silver sol, and meanwhile, high-value application of the abalone viscera is achieved.

The invention discloses a preparation method of a rear-earth hexaboride field emission array, and belongs to the technical field of cathode field emission. At present, the preparation of the rear-earth hexaboride field emission array is extremely difficult, and large-scale application of the rear-earth hexaboride field emission array in the field emission field is restricted. The preparation method adopts a laser micro-nano machining technology, a uniform sharp cone field emission array is machined on the surface of a rear-earth hexaboride, and the shape of the sharp cone field emission array is of extremely high consistency. Through the adjustment for the parameters of the laser micro-nano machining technology, the sharp cone field emission array with the curvature radius of nanometer level to micrometer level can be machined, the sharp cone height, interval and density are controllable, and the rear-earth hexaboride field emission array is applicable for large-scale application.

The invention relates to the field of micro-nano machining for on-chip waveguides, in particular to a preparation method of a low loss infrared high-nonlinearity optical waveguide. The preparation method comprises the following steps: S1, analyzing the light wave transmission characteristics of a sulfur-series optical waveguide in an infrared band; S2, analyzing the influences of various parameters of electron beam exposure and the types of electron beam resists on the preparation of the sulfur-series waveguide, selecting appropriate exposure parameters and an appropriate type of electron beamresist for mask preparation, and carrying out plasma reactive etching to realize the preparation of the waveguide; S3, secondly, realizing the growth of a polymer cladding through a spin-coating method; and S4, finally, smoothening the side wall of the waveguide again in combination with a cladding thermal annealing process, and carrying out loss testing by a cut-back method. Through optimizationof the electron beam exposure and adjustment of the etching parameters of a plasma reaction in combination with the thermal annealing process, the preparation of an ultra-low-loss on-chip sulfur-series waveguide is realized. The preparation method is suitable for the preparation of a large-scale high-nonlinearity photonic integrated device.