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293 results about "Structure pattern" patented technology

Pattern is an underlying structure that organizes surfaces or structures in a consistent, regular manner. Pattern can be described as a repeating unit of shape or form, but it can also be thought of as the "skeleton" that organizes the parts of a composition.

Arrangement for the Illumination of a Substrate with a Plurality of Individually Shaped Particle Beams for High-Resolution Lithography of Structure Patterns

The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate (91) with a plurality of individually shaped, controllable particle beamlets (118) which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility. According to the invention, this object is met in that a first aperture diaphragm array and a second aperture diaphragm array are constructed as multiple-format diaphragm arrays (41, 42) for generating particle beamlets (118) with different beam cross sections, and at least three multibeam deflector arrays (51, 52, 53) for individual deflection of the particle beamlets (118) are associated with the first multiple-format diaphragm array (41) and with the second multiple-format diaphragm array (42), wherein at least one multibeam deflector array (51) is arranged between the first multiple-format diaphragm array (41) and the second multiple-format diaphragm array (42) in order to generate different cross sections of the particle beamlets (118), at least a second multibeam deflector array (52) is arranged in the vicinity of the second multiple-format diaphragm array (42) in order to blank or deflect individual particle beamlets (118) into individual crossovers, and at least a third multibeam deflector array (53) is arranged downstream of the second multiple-format diaphragm array (42) at a distance of 10-20% of the distance to the next crossover (112) in order to generate different positions of the particle beamlets (118) on the substrate (91).
Owner:VISTEC ELECTRON BEAM

Method for preparing two-dimensional periodic metal particle array structure through dual-wavelength femtosecond lasers

The invention provides a method for preparing a two-dimensional periodic metal particle array structure through dual-wavelength femtosecond lasers. The method and an implementation device for preparing the two-dimensional periodic particle array structure on the surface of metal by focusing two-color femtosecond laser pulses are provided. The method and the implementation device are characterized in that the metal particle structure is distributed in the two-dimensional direction in a periodic submicron dimension mode; two-color femtosecond lasers with different characteristic parameters are collinearly focused and irradiated on a sample after common channel or branch channel time delay through a nonlinear frequency doubling technology, and formed two-dimensional periodic structure patterns can be effectively adjusted and controlled by changing the azimuth angle of frequency doubling crystals and the power ratio of the two-color lasers. The method has the advantages that through the combinational design of different wavelengths and the polarization property of the femtosecond lasers, the submicron dimension two-dimensional periodic metal particle array structure can be conveniently and quickly prepared. The novel method for preparing the structure through the two-color femtosecond lasers has potential and important application value in the field of material micro-nano processing.
Owner:NANKAI UNIV

Method, system and program for generating structure pattern candidates

A structure pattern candidate generating system is disclosed for automatically generating many kinds of complicated structure pattern candidates and facilitating selection of a structure pattern suitable for the purpose. When the system is provided with a structure pattern pointing to an element or an element set in a document logical structure of a structured document, that has been specified by a user, a method for determining an item to be edited determines an item to be edited among the items composing the structure pattern. A method for generating structure pattern candidates replaces the item to be edited with items in different expressions based on the document logical structure information about the structured document to generate structure pattern candidates. A method for generating a structure pattern candidate list arranges the generated structure pattern candidates based on a condition and index for display for giving selection criteria to the user to generate a structure pattern candidate list. If the system is provided with an item desired to be edited, that has been specified by the user for the structure pattern, the method for determining an item to be edited determines the item desired to be edited as the item to be edited.
Owner:IBM CORP

Method for polymer extruding and micro embossing shaping

Polymer micro embossing is a shaping method for forming micro-nano-structured patterns on polymer substrate materials by hot embossing. Polymer micro embossing method is widely applied in the manufacturing of various polymer micro-nano structures. The experiment apparatus mainly comprises: a polymer substrate extruder, a substrate pressing and thickness adjusting apparatus, a temperature controlling apparatus, an embossing apparatus, a pressure controlling apparatus, a pressure maintaining cooling apparatus, and a pulling apparatus. The pressing and thickness adjusting apparatus is used for flattening the extruded polymer; the temperature controlling apparatus is used for ensuring the surface temperature of the polymer substrate requiring flattening; the embossing apparatus is provided with embossing molds with micro embossing structures, wherein the micro embossing structures are transferred with applied pressures; the pressure controlling apparatus is used for adjusting the pressures applied to the polymer substrate; and the pressure maintaining cooling apparatus is used for cooling and shaping the micro structures. With the shaping method, a large amount of time and energy required by heating and cooling can be saved, the embossing equipment can be greatly simplified, the production efficiency is high, the operation is simple, and the cost is low.
Owner:BEIJING UNIV OF CHEM TECH

High-temperature-tolerance frequency selection wave-transmitting structure and preparation method thereof

The invention discloses a high-temperature-tolerance frequency selection wave-transmitting structure. The high-temperature-tolerance frequency selection wave-transmitting structure successively comprises a wave-transmitting layer, a modification bonding layer and a frequency selection layer from inside to outside, wherein the wave-transmitting layer is made of a continuous fiber reinforced ceramic-based wave-transmitting composite material; the modification bonding layer is made of a low-dielectric-constant material; the frequency selection layer is a noble metal physical plating layer or a noble metal glass conductor coating with periodic structure patterns. The high-temperature-tolerance frequency selection wave-transmitting structure can tolerate high temperature of 700 DEG C or more, and has excellent high temperature tolerance. The invention also provides a production method of the high-temperature-tolerance frequency selection wave-transmitting structure; the modification bonding layer is produced by using a plasma spraying process; the thermal damage to the substrate can be avoided, so that the substrate has high strength retention rate; the size accuracy of the frequency selection layer produced by a laser processing process can be higher than 20 microns; the frequency selection layer has high size accuracy.
Owner:NAT UNIV OF DEFENSE TECH +1

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and / or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and / or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.
Owner:CARL ZEISS SMT GMBH

Method for preparing two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing

Provided is a method for preparing a two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing. The invention provides a method and experiment device for preparing the periodically-distributed two-dimensional photonic crystal structure with the feature size being the sub-micron dimension in one step in the large area by focusing identical-wavelength double-pulse femtosecond laser on the surface of metal through a plano-convex cylindrical lens, and the identical-wavelength double-pulse femtosecond laser is obtained based on the spectrophotometry of birefringent crystals and has the features of collinear transmission, cross polarization and picosecond time delay. Two-dimensional periodic structure patterns can be effectively regulated and controlled by changing the energy and the number of pulses of input laser, the thicknesses and the azimuth angles of the birefringent crystals and the like. Through the combined design of different linear polarization directions and the variable time delay feature of two femtosecond laser pulses and focusing of the cylindrical lens, preparation of the two-dimensional metallic photonic crystal structure within the large area is achieved conveniently and quickly. The novel preparation method adopting the double-pulse femtosecond laser with cross polarization and variable time delay has potential important applications in the field of material micro-nano processing and preparation.
Owner:NANKAI UNIV

Trouser suit pattern as well as structure design skill and technique for trouser suit

InactiveCN101485499AExpand ideasExpansion methodClothes making applicancesGraphicsEngineering
The invention provides a method for designing the pant suit pattern and the pant suit modeling structure. Based on studying the human body structure and pant suit structure, and pant suit modeling structural characteristics and rules, the method for designing the pant suit pattern and the pant suit structure is obtained through a large number of experiments and practical applications. The method has the advantages of simpleness, easy learning, intuition, easy understanding and strong maneuverability, gives full play to advantages of convenient understanding and operation of the equant graphics, and overcomes the defects that the prior pant suit structure pattern has complicated formula calculation, multiple sizes, uncertainty, hard memory and small design changing space. The method can also better reflect the relation between the human body and the pant suit structure and has flexible and accurate modeling structural changes. The designed pant suit modeling has steady and unique style pattern, and the design efficiency is greatly improved. The method not only deepens the theoretical study of the pant suit structure, but also further expands the thought and the method of the pant suit structural design, has good practicability and economic value potential, and has the practical significance of promoting the raiment culture development and improving the production efficiency of the clothing industry.
Owner:ZHEJIANG UNIVERSITY OF SCIENCE AND TECHNOLOGY
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