Electron beam-ion beam micro-nanometer process composite system

A technology of micro-nano processing and combination system, which is applied in the field of electron beam-ion beam micro-nano processing combination system, which can solve the problems of increasing sample damage and achieve the effect of convenient alignment, clear image and stable structure

Inactive Publication Date: 2008-11-12
BEIHANG UNIV
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This not only puts higher requirements on the stability...

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  • Electron beam-ion beam micro-nanometer process composite system
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  • Electron beam-ion beam micro-nanometer process composite system

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Embodiment Construction

[0017] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0018] see figure 1 , Figure 1A As shown, the present invention is an electron beam-ion beam micro-nano processing combined system. The electron beam and the ion beam can work simultaneously, and the electrons in the SEM can be combined with positively charged ions, which effectively reduces the charge on the surface of the sample. The effects of accumulation on observation and analysis. The present invention includes flange 4, scanning electron microscope 1, focused ion beam device 2, computer 3, and computer 3 is a part of scanning electron microscope 1, and flange 4 is installed on the inclined plane 1b (inclined plane) of the reaction chamber 1a of scanning electron microscope 1 On the threaded hole 1d) on 1b, the ion gun of the focused ion beam device 2 is installed in the through hole 401 of the flange 4. Due to the adoption of electron beam and ion...

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Abstract

The invention discloses an electron beam-ion beam micro and nano machining combination system, wherein the electron beam and the ion beam can be operated simultaneously, and the electron in SEM can be integrated with the positively charged ion to effectively decrease influence on observation and analysis caused by charge accumulation on the surface of sample. The electron beam-ion beam micro and nano machining combination system of the invention comprises a flange, a scan electron microscope, a focused ion beam device, a computer which is a part of the scan electron microscope, wherein the flange is arranged on the bevel of a reaction chamber of the scan electron microscope, and the ion gun of the focused ion beam is arranged in the through hole of the flange. By adopting electron beam and ion beam symmetric device, the design scheme has advantages of stabilized, simple and aesthetic structure, convenient and accurate alignment, defined image and high stabilization of sample stage etc., being beneficial to improvement of the imaging quality of the electron beam.

Description

technical field [0001] The invention relates to an electron beam-ion beam micro-nano processing combination system. An ion gun is installed on an electron beam reaction chamber through a flange, so that the electron beam and the ion beam are respectively perpendicular to a sample stage. Background technique [0002] With the continuous improvement of productivity, the energy problem has become the main challenge faced by human beings, and the miniaturization of products is one of the means to solve the energy crisis. Therefore, nanotechnology has become a research hotspot in the world. Nanotechnology research on surface material science and its applications in the field of nanotechnology includes not only basic disciplines with observation, analysis and research as the main line, but also technical science with nanoengineering and processing as the main line. Therefore, nanotechnology is a frontier basic discipline A complete system integrated with high technology. It inclu...

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Application Information

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IPC IPC(8): B82B3/00H01J37/26H01J37/252
Inventor 王荣明崔益民孙倩李文萍姚骏恩
Owner BEIHANG UNIV
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