This paper provides a method for designing and fabricating a high-
transmittance, color-controllable thin film with a
chalcogenide glass substrate in the 8-12 μm
wavelength range. The design method includes the following steps: Sa, using 550 nm as the reference
wavelength for
optical thin film design, and applying the film stacking formula: Sub / M0.5(L2HL)^5 0.5(KL)^5 / AIR, both sides are coated with the same film
system, Sub is IRG
chalcogenide glass, AIR represents air, H represents Ge, L represents ZnS, K represents YbF3, and M represents IDA; Sb, generate the
film structure of Sub / IDA / ZnS / Ge / ZnS / Ge / ZnS / YbF3 / ZnS / Air through the film stack formula; Sc, the optimization target is the film
color target and the
transmittance target. The film
color target is one or two adjacent colors of the seven colors of visible light (red, orange, yellow, green, cyan, blue, and violet). To design the film color of a certain color or two adjacent colors, the spectral reflectance peak of the design must be located at the
wavelength of the corresponding color; Sd, film thickness optimization, to obtain the optimal film thickness. The optimized
film structure achieves the target
transmittance and the film color is controllable; Se, the optimal film thickness is input to the
coating machine.