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Sample precise jig for cross-scale two-photon polymerization machining and leveling method

A two-photon polymerization, cross-scale technology, applied in the direction of manufacturing tools, metal processing equipment, laser welding equipment, etc., can solve the problems of complex structure, low precision, and difficulty in effectively realizing high-precision two-photon polymerization cross-scale processing, reaching the position Flexible and adjustable to meet the actual height needs

Active Publication Date: 2020-07-17
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention provides a sample leveling method and a leveling method for cross-scale two-photon polymerization processing, which are used to solve the problem that the existing two-photon polymerization cross-scale processing device has complex structure and low precision, which makes it difficult to effectively realize high-precision two-photon polymerization cross-scale processing. Technical Problems of Dimensional Processing

Method used

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  • Sample precise jig for cross-scale two-photon polymerization machining and leveling method
  • Sample precise jig for cross-scale two-photon polymerization machining and leveling method
  • Sample precise jig for cross-scale two-photon polymerization machining and leveling method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] A sample precision fixture used for cross-scale two-photon polymerization processing, such as figure 1 As shown, it includes: fixedly connected XY-axis moving platform 1, Z-axis translation stage 2, and base plate 3, fine adjustment assembly 4, transition assembly 5, and stage 6 arranged on the base plate 3; wherein one end of the transition assembly is fixed Fix the stage on the other end of the fine-tuning assembly. Among them, the XY-axis moving platform is used to drive the Z-axis translation stage and the substrate to move in the X-axis and Y-axis directions; the Z-axis translation stage is used to drive the substrate to drive the fine-tuning components, transition components and the stage to move in the Z-axis direction; The component is used to drive the stage to achieve levelness and flatness adjustment by driving the transition component.

[0042] The XY-axis moving platform can drive the Z-axis stage to move along the X-axis and Y-axis directions; the Z-axis stag...

Embodiment 2

[0054] A sample leveling method for cross-scale two-photon polymerization processing, including:

[0055] The focus measurement module installed on the optical platform is used to focus and collect the relative height between the stage and the sample in any sample precision tool for cross-scale two-photon polymerization processing as described in the first embodiment; The relative height is calculated, the levelness and flatness error of the stage are calculated, and the electric fine-tuner in the precision fixture is driven to level; after multiple iterations, the working surface of the stage and the focus measurement The incident optical axis emitted by the module is vertical; when performing cross-scale processing, the focus measurement module is used to collect the processing height in real time, and the Z-axis translation stage of the precision fixture is driven to calibrate the processing height in real time, so that the sample area to be processed is always maintained In t...

Embodiment 3

[0069] A machine-readable storage medium, the machine-readable storage medium stores machine-executable instructions, when the machine-executable instructions are called and executed by a processor, the machine-executable instructions prompt the processor to implement the above The described sample leveling method for cross-scale two-photon polymerization processing.

[0070] The related technical solutions are the same as in the second embodiment, and will not be repeated here.

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Abstract

The invention belongs to the field of micro-nano machining, and particularly relates to a sample precise jig for cross-scale two-photon polymerization machining and a leveling method. The jig comprises an X-axis and Y-axis moving platform, a Z-axis displacement table and a base plate which are fixedly connected, and a fine-adjusting assembly, a transition assembly and a carrying table which are arranged on the base plate. One end of the transition assembly is fixed to the fine-adjusting assembly, and the other end of the transition assembly is fixed to the carrying table. The X-axis and Y-axismoving platform is used for driving the Z-axis displacement table and the base plate to move in the X-axis direction and the Y-axis direction. The Z-axis displacement table is used for driving the base plate to drive the fine-adjusting assembly, the transition assembly and the carrying table to move in the Z-axis direction. The fine-adjusting assembly is used for driving the transition assembly to drive the carrying table to adjust the levelness and flatness. By means of the sample precise jig, the real-time three-dimensional leveling precision of a cross-scale two-photon polymerization machining system is controlled within 100 nanometers, the accurate focusing of the two-photon polymerization machining system during machining and the forming precision of a machined product are effectively ensured, and the machining scale is expanded from the micro-nano scale to the millimeter-centimeter scale.

Description

Technical field [0001] The invention belongs to the field of micro-nano processing, and more specifically, relates to a sample precision fixture and a leveling method for cross-scale two-photon polymerization processing. Background technique [0002] In recent years, with the development of basic disciplines such as physics and chemistry and semiconductor microelectronics technology, humans have made unprecedented breakthroughs in the exploration of the micro-nano-scale world, and various micro-nano processing technologies have become important research contents of modern science and technology. Among them, fine and complex three-dimensional structures need to be realized by advanced processing and manufacturing technologies. Although micro-nano manufacturing technologies such as photolithography have high processing accuracy, they are mainly limited to processing two-dimensional structures and lack the ability to manufacture complex three-dimensional structures at the micro-nano ...

Claims

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Application Information

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IPC IPC(8): B23K26/082B23K26/70
CPCB23K26/082B23K26/702
Inventor 熊伟范旭浩焦玢璋刘耘呈高辉邓磊敏
Owner HUAZHONG UNIV OF SCI & TECH
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