This invention belongs to the field of
semiconductor manufacturing and microelectronic chemicals technology, and relates to a
nitrogen-containing heterocyclic hyperbranched
acrylate cleaning dispersant for
wafer fabrication processes, its preparation method, and its application. The dispersant is a hyperbranched
polymer with the general formula Core-[P(MA)-
Linker-NHet], where Core is the hyperbranched core, P(MA) is the poly(
meth)
acrylate branch,
Linker is the connecting arm, and NHet is the
nitrogen-containing heterocyclic functional group. The preparation method employs a combination of "core-first, arm-later"
atom transfer radical polymerization or reversible addition-fragmentation
chain transfer polymerization with
click chemistry. This dispersant is applied to
wafer wet cleaning solutions, and the cleaning method includes treating the
wafer with a cleaning solution containing this dispersant. This invention's dispersant, through its unique molecular structure design, improves cleaning efficiency, exhibits excellent pattern protection and low damage, superior process compatibility, and high cleanliness, providing an
effective solution to the cleaning challenges of advanced processes.