124results about How to "Reduce polydispersity" patented technology

Methods for surface-initiated atom transfer radical polymerization, which can utilize a catecholic alkyl halide initiator.

A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula: where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ester, amide or carbonate linkage; R3 represents a linear or branched alkylene group or semi- or perfluorinated linear or branched alkylene group with 1 or more carbon atoms; R4 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perflourinated aliphatic group; R5 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group; n represents an integer of 1 or more; and OR12 represents OH or at least one acid labile group selected from a tertiary alkyl carbonate, a tertiary alkyl ester, a tertiary alkyl ether, an acetal and a ketal. A method of patterning a substrate is also disclosed, wherein the method includes: applying the photoresist composition mentioned above to the substrate to form a film; patternwise exposing the film to an imaging radiation source; and developing areas of the film to form a patterned substrate.

The invention discloses a preparation method of hydrogenated butadiene special rubber, which comprises the following steps: subjecting butadiene rubber to a degradation reaction and a hydrogenation reaction under an action of a Zhan Catalyst as showed in the general formula I to obtain hydrogenated butadiene special rubber. The invention also provides a degradation reaction of the butadiene rubber, which is also under the action of a Zhan Catalyst as showed in the general formula I. The preparation method provided by the invention overcomes the shortcomings that the existing various types of catalysts can not be applicable to the preparation of low Mooney viscosity and high Mooney viscosity hydrogenated butadiene special rubber at the same time, so as to provide a preparation method of high-performance hydrogenated butadiene special rubber with a wide controllable Mooney viscosity range of 5-130. The catalyst used in the invention is the catalyst for both rubber degradation and hydrogenation reduction, so as to avoid a process requiring addition of the catalysts with different catalytic activities in two times respectively in the prior art. The method is simple, and easy to operate.

Silicone-polyether block copolymer comprising a polyorganosiloxane which includes at least one polyether residue having a molecular weight of not less than 5000 g / mol, and wherein a weight average molecular weight of all polyether residues attached to the polyorganosiloxane by a chemical bond is above 3000 g / mol, its production and use and also compositions and polymeric articles obtained therewith.

This invention relates to compositions for delivering one or more active ingredients, and more particularly to compositions, e.g. beads, comprising a matrix material which matrix material comprises a microorganism. In particular, the invention relates to compositions comprising a microorganism selected from live, killed, attenuated and inactivated microorganisms. The matrix material may also comprise a surfactant and may further comprise an adjuvant. The invention further relates to the manufacture and use of such compositions, and to other subject matter.

This invention concerns a free radical polymerization process, selected chain transfer agents employed in the process and polymers made thereby, in which the process comprises preparing polymer of general Formula (A) and Formula (B) comprising contacting: (i) a monomer selected from the group consisting of vinyl monomers (of structure CH2═CUV), maleic anhydride, N-alkylmaleimide, N-arylmaleimide, dialkyl fumarate and cyclopolymerizable monomers; (ii) a thiocarbonylthio compound selected from Formula (C) and Formula (D) having a chain transfer constant greater than about 0.1; and (iii) free radicals produced from a free radical source; the polymer of Formula (A) being made by contacting (i), (ii) C and (iii) and that of Formula (B) by contacting (i), (ii) D, and (iii); and (iv) controlling the polydispersity of the polymer being formed by varying the ratio of the number of molecules of (ii) to the number of molecules of (iii); wherein Q, R, U, V, Z, Z′, m, p and q are as defined in the text

A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer. New compositions of matter which comprise the derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, and the like.

Methods for surface-initiated atom transfer radical polymerization, which can utilize a catecholic alkyl halide initiator.

Biomedical devices such as contact lenses formed from a comprising a polymerization product of a mixture comprising an ethylenically unsaturated-containing non-amphiphilic macromonomer comprising hydrophilic units or hydrophobic units derived from a living radical polymerization of one or more ethylenically unsaturated hydrophilic monomers or one or more ethylenically unsaturated hydrophobic monomers are disclosed.

The present invention relates to amphipathic copolymeric binder particles that incorporate polymerizable crystallizable compounds chemically incorporated into a dispersible (D) portion and / or solvatable (S) portion of the copolymer. The invention also pertains to dry particulate electrophotographic toners incorporating an amphipathic copolymer comprising one or more polymerizable crystallizable compounds. Methods of making these dry electrophotographic toner particles, and methods of electrophotographically forming an image on a substrate using these toners, are also described.

A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl(CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl(CH3), trifluoromethyl(CF3), difluoromethyl(CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl(CF3), difluoromethyl(CHF2), fluoromethyl(CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.

The invention discloses fluorosilicone modified acrylic resin as well as a preparation method and an application thereof. The fluorine-silicon modified acrylic resin is prepared from the following components: methacrylate monomers, fluorine-containing acrylate monomers, acrylate-based silicone oil, allyl silicone oil, a polymerized active silane coupling agent, methacrylic acid, hydroxyl-containing active crosslinking monomers, glycidyl methacrylate, trimethylolpropane trimethacrylate, an initiator, a chain transfer agent and a solvent. The fluorine-containing acrylate monomer is composed of aC2-C3 short-chain fluorine-containing alkyl acrylate monomer and a C10-C12 long-chain fluorine-containing alkyl acrylate monomer. The fluorine-silicon modified acrylic resin prepared by the inventionhas the characteristic of high low viscosity, is convenient to construct and use, and reduces the generation of VOC. The coating prepared from the modified acrylic resin has the characteristics of high impact-resistant self-repairing function, icing prevention, low surface energy, hydrophobicity, oleophobicity, stain resistance, high and low temperature resistance and the like.

In a continuous two-stage process for preparing solvent-free polyacrylate hotmelt pressure sensitive adhesives which is gentle on the polymer and redeploys the solvent used in the process the following steps are carried out:polymerizing a self-adhesive pressure sensitive adhesive in solution, the solvent having a low vapor pressure;continuously mixing the polymer solution with antioxidants and preheating the mixture under superatmospheric pressure without boiling it;concentrating the polymer solution to a residual solvent content of less than 0.1% by weight in a concentrating extruder under the effect of reduced pressure and elevated temperatures;condensing, collecting, and re-using the solvent stripped off in the extruder;compounding the abovementioned solvent-freed hotmelt pressure sensitive adhesive with tackifying resins, fillers, stabilizers, crosslinkers or other additives in a second extruder at a moderate melt temperature;transferring the blended solvent-free self-adhesive pressure sensitive adhesive to a downstream coating unit.

A continuous micro-reaction device for preparing meta-aramid resin comprises a prepolymerization system, a polycondensation system, an after-treatment system and a heat exchange system, wherein the prepolymerization system, the polycondensation system and the after-treatment system are connected in sequence, and the heat exchange system is connected with the prepolymerization system and the polycondensation system to control temperatures of the prepolymerization system and the polycondensation system. The continuous micro-reaction device is characterized in that the prepolymerisation system comprises a raw material storage device, a micro-mixer and a micro-reactor which are connected in sequence; the polycondensation system comprises a multistage micro-screw device, and the micro-reactor is connected with multistage micro-screw device. The continuous micro-reaction device for preparing the meta-aramid resin improves the heat transfer effect at the polycondensation stage and the mass transfer effect at the polycondensation stage during preparation of the meta-aramid resin, and achieves the purpose of improving the performance of a meta-aramid resin product. The invention further provides a continuous micro-reaction method for preparing the meta-aramid resin and the product.

Polymerization of fluoroolefin monomers proceeds in a supercritical carbon dioxide solvent at high monomer loading levels to provide a high molecular weight polymer with low polydispersity and / or a unimodal molecular weight distribution.

An enzymatic process for preparing aliphatic polycarbonates via terpolymerization or transesterification using a dialkyl carbonate, an aliphatic diester, and an aliphatic diol or triol reactant. A catalyst having an enzyme capable of catalyzing an ester hydrolysis reaction in an aqueous environment is subsequently added to the reaction mixture. Next, polymerization of the reaction proceeds for an allotted time at a temperature≦100° C. Finally, the copolymer is isolated from an the catalyst via filtration.

A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula:where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ester, amide or carbonate linkage; R3 represents a linear or branched alkylene group or semi- or perfluorinated linear or branched alkylene group with 1 or more carbon atoms; R4 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perflourinated aliphatic group; R5 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group; n represents an integer of 1 or more; and OR12 represents OH or at least one acid labile group selected from a tertiary alkyl carbonate, a tertiary alkyl ester, a tertiary alkyl ether, an acetal and a ketal. A method of patterning a substrate is also disclosed, wherein the method includes: applying the photoresist composition mentioned above to the substrate to form a film; patternwise exposing the film to an imaging radiation source; and developing areas of the film to form a patterned substrate.

Liquid toner compositions having utility in electrographic applications. Organosol liquid toner compositions comprise binder particles dispersed in a nonaqueous liquid carrier, wherein the particles are derived from ingredients comprising one or more crosslinkable amphipathic copolymer(s). The organosol is easily combined with additional ingredients, such as one or more visual enhancement additives and other desired ingredients, and subjected to mixing processes to form a liquid toner composition. Methods of making and electrographically printing liquid toners derived from these organosols are also described.

Provided are a polymerization catalyst composition for ethylene oxide which can give polyethylene oxide having a molecular weight lower than that of the prior art and a relatively narrow molecular weight distribution, and a process for the production of polyethylene oxide by the use of the catalyst composition. The catalyst composition makes it possible to produce polyethylene oxide having a molecular weight ranging from about 20,000 to 200,000 through direct polymerization in a high yield with economic advantage, and is characterized by comprising an organoaluminum compound and at least one member selected from among alkali metal alkoxides and alkali metal hydroxides. According to the process, polyethylene oxide having a molecular weight failing within the above range can be produced by the use of the catalyst composition under the same polymerication conditions as those of the prior art.

The invention provides liquid toner compositions in which the polymeric binder is chemically grown in the form of copolymeric binder particles dispersed in a liquid carrier. The polymeric binder includes one amphipathic copolymer that comprises the residue of a Soluble High Tg Monomer. The toners described herein exhibit surprisingly low fusion temperatures, yet are surprisingly resistant to blocking, are non-tacky and are resistant to marring and undesired erasure.

Methods, compounds, and medicinal formulations utilizing biocompatible polymers for delivery of a drug, particularly for solubilizing, stabilizing and / or providing sustained release of drug from topical, implantable, and inhalation systems. Many of the methods, compounds, and medicinal formulations are particularly suitable for oral and / or nasal inhalation and use polymers of the formula —[X—R1—C(O)]— wherein each R1 is an independently selected organic group that links the —X— group to the carbonyl group, and each X is independently oxygen, sulfur, or catenary nitrogen.

A process for preparing a blocked derivatized poly(4-hydroxystryrene)-DPHS having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer; and (iv) reacting said polymer with a vinyl ether, a dialkyl dicarbonate, or a mixture of vinyl ether and a dialkyl dicarbonate to form the blocked DPHS. New compositions of matter which comprise the blocked derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition and MEMS, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, toner resins for photocopying, antireflective coatings, and the like.

The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Phenol aralkyistion polymers can be prepared by reaction among a phenolic monomer, at least one styrenic monomer and an aryl diolefin. A phenolic monomer can be initially aralkylated in the presence of an acid catalyst with a first portion of at least one styrenic monomer to obtain an aralkylated phenol. The aralkylated phenol thereafter can be reacted with an aryl diolefin to obtain a phenol aralkylation polymer. Optionally, (though preferably) the phenol aralkylation polymer is further aralkylated with a second portion of at least one styrenic monomer. By employing specific catalyst concentrations, reactant concentrations, reaction temperatures, and reaction times, the formation of mono-functional and non-functional by-products is substantially reduced.

A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl(CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.