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1487 results about "Alkyl ether" patented technology

Environmental protection urea-formaldehyde resin and preparation method thereof

A novel environmental protective urea-formaldehyde resin and a preparation method belong to the field of wood processing adhesives. The urea-formaldehyde resin is formed by the reaction of urea, formaldehyde, aldehyde, one or more stabilizers and modifier according to the route of weak base-weak acid-weak base. The method firstly controls the F / U feed ratio, the pH value and the temperature during the reaction process to reduce the content of free formaldehyde in the resin; then the aldehyde is introduced to allow the resin to generate the stable alkyl ether (-(CH2)n-O-(CH2)n-) structure, thus reducing the content of methylene-ether bond (-CH2-O-CH2-) in the resin structure, simultaneously reducing the using amount of the formaldehyde and further greatly reducing the release amount of the formaldehyde during the using process of a plate from the two aspects; in addition, the introduction of a long chain and polyaldehyde can ensure the resin to have great bonding strength and water resistance. The urea-formaldehyde resin which is prepared by the invention has the advantages of low content of free formaldehyde, simple process, low cost, etc., the release amount of the formaldehyde of the plate which is prepared by using the adhesive achieves the E0 level standard, and the high bonding strength can be maintained after being boiled in hot water.
Owner:BEIJING UNIV OF CHEM TECH

Fluorinated photoresist materials with improved etch resistant properties

InactiveUS20060105269A1Amenable to free-radical copolymerizationReduce polydispersityRadiation applicationsPhotomechanical apparatusPhotoresistCarbonate
A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula:
where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ester, amide or carbonate linkage; R3 represents a linear or branched alkylene group or semi- or perfluorinated linear or branched alkylene group with 1 or more carbon atoms; R4 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perflourinated aliphatic group; R5 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group; n represents an integer of 1 or more; and OR12 represents OH or at least one acid labile group selected from a tertiary alkyl carbonate, a tertiary alkyl ester, a tertiary alkyl ether, an acetal and a ketal. A method of patterning a substrate is also disclosed, wherein the method includes: applying the photoresist composition mentioned above to the substrate to form a film; patternwise exposing the film to an imaging radiation source; and developing areas of the film to form a patterned substrate.
Owner:GLOBALFOUNDRIES INC
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