The application discloses an EBR
solvent and a rectification preparation process thereof, and belongs to the technical field of
semiconductor material
processing; wherein the EBR
solvent comprises the following components in percentage: 95-98% of
propylene glycol methyl
ether acetate and 2-5% of propylene glyyl methyl
ether. The EBR
solvent is prepared by rectification
recovery of waste liquid generated in a
dilution cleaning process, and the main steps are as follows: S1,
sedimentation filtration: filtering
solid impurities in the waste liquid; S2, preliminary water removal: removing part of water in the filtered waste liquid through a common
distillation tank to obtain primary waste liquid
raw material; S3, feeding: introducing the primary waste liquid
raw material into a rectification
tower for intermittent
distillation purification; S4, water removal: removing water in the primary waste liquid
raw material by using an extractant; S5, extractant
reflux; S6, extractant extraction: after the water is removed, the extractant is extracted; and S7, EBR
solvent extraction. The application solves the problem that the purity of the effective component EBR solvent in the
photoresist cleaning waste liquid is not high, and the recycling effect is poor.