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794results about How to "Weight control" patented technology

Unmanned plane undercarriage control system

ActiveCN101767649ASimple mechanical structureSimple electric drive equipmentUndercarriagesElectric driveLoad carrying
The invention discloses an unmanned plane undercarriage control system which comprises a control mechanism, a drive part, a control part, a sensor part, an undercarriage arm and a damper rod, wherein, the control mechanism has a worm wheel and worm structure, one end of the rocker of the control mechanism is fixedly connected with the worm wheel and the other end is connected with one end of the damper rod, the other end of the damper rod is connected with the upper part of the undercarriage arm through a pin roll, one end of the worm is connected with the drive part, the sensor part is arranged in the upper limit hole and the lower limit hole of the control mechanism, the control mechanism is fixedly arranged on the load-carrying structure of the plane body, the upper end of the undercarriage arm is connected with the plane body through a load-carrying rotating shaft on the plane body and the lower end of the undercarriage arm is connected with the front wheel of the plane, the control part is arranged on the avionics frame of the plane and respectively abutted with the drive part and the drive part through cables. The invention uses the simple mechanical structure, the simple electric drive apparatus and the spring-type damper rod and needs no supplementary structures or power-assisted devices for support, having a small volume and occupying little space. The invention can realize locking of the undercarriage up and down stations under the coordination of the worm wheel and worm structure, the crank link mechanism and the brushless motor static brake resistance.
Owner:CAIHONG DRONE TECH CO LTD

Fluorinated photoresist materials with improved etch resistant properties

InactiveUS20060105269A1Amenable to free-radical copolymerizationReduce polydispersityRadiation applicationsPhotomechanical apparatusPhotoresistCarbonate
A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula:
where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ester, amide or carbonate linkage; R3 represents a linear or branched alkylene group or semi- or perfluorinated linear or branched alkylene group with 1 or more carbon atoms; R4 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perflourinated aliphatic group; R5 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group; n represents an integer of 1 or more; and OR12 represents OH or at least one acid labile group selected from a tertiary alkyl carbonate, a tertiary alkyl ester, a tertiary alkyl ether, an acetal and a ketal. A method of patterning a substrate is also disclosed, wherein the method includes: applying the photoresist composition mentioned above to the substrate to form a film; patternwise exposing the film to an imaging radiation source; and developing areas of the film to form a patterned substrate.
Owner:GLOBALFOUNDRIES INC
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