570results about How to "Large grain" patented technology

To provide a laser apparatus and a laser annealing method with which a crystalline semiconductor film with a larger crystal grain size is obtained and which are low in their running cost. A solid state laser easy to maintenance and high in durability is used as a laser, and laser light emitted therefrom is linearized to increase the throughput and to reduce the production cost as a whole. Further, both the front side and the back side of an amorphous semiconductor film is irradiated with such laser light to obtain the crystalline semiconductor film with a larger crystal grain size.

The present invention provides a high quality thin film comparable to a bulk single crystal and providres a semiconductor device with superior characteristics. A channel layer 11, for example, is formed of a semiconductor such as zinc oxide ZnO or the like. A source 12, a drain 13, a gate 14 and a gate insulating layer 15 are formed on the channel layer 111 to form an FET. For a substrate 16, a proper material is selected depending on a thin film material of the channel layer 11 in consideration of compatibility of both lattice constants. For example, if ZnO is used for the semiconductor of the channel layer as a base material, ScAlMgO₄ or the like can be used for the substrate 16.

There is provided a parallel processing computer for executing a plurality of threads concurrently and in parallel. The computer includes: a thread activation controller for determining whether or not each of threads, which are exclusively executable program fragments, is ready-to-run, to put the thread determined ready-to-run into a ready thread queue as ready-to-run thread; and a thread execution controller having a pre-load unit, an EU allocation and trigger unit, a plurality of thread execution units and a plurality of register files including a plurality of registers, and the pre-load unit, prior to when each ready-to-run thread in the ready thread queue is executed, allocates a free register file of the plurality of register files to the each ready-to-run thread, to load initial data for the each ready-to-run thread into the allocated register file, and the EU allocation and trigger unit, when there is a thread execution unit in idle state of the plurality of thread execution unit, retrieves ready-to-run thread from the top of the ready thread queue, and to allocate the retrieved ready-to-run thread to the thread execution unit in idle state, and to couple the register file loaded the initial data for the ready-to-run thread with the allocated thread execution unit in idle state, and to trigger the ready-to-run thread. The plurality of thread execution units execute the triggered threads concurrently in parallel.

Barrier layers for conductive features and methods of formation thereof are disclosed. A first barrier material is deposited on top surfaces of an insulating material, and a second barrier material is deposited on sidewalls of the insulating material, wherein the second barrier material is different than the first barrier material. The first barrier material induces grain growth of a subsequently deposited conductive material at a first rate, and the second barrier material induces grain growth of the conductive material at a second rate, wherein the second rate is slower than the first rate.

A hot-rolled austenitic manganese steel strip having a chemical composition in percent by weight of 0.4%≦C≦1.2%, 12.0%≦Mn≦25.0%, P≧0.01% and Al≦0.05% has a product of elongation at break in % and tensile strength in MPa of above 65,000 MPa %, in particular above 70,000 MPa %. A cold-rolled austenitic manganese steel strip having the same chemical composition achieves a product of elongation at break in % and tensile strength in MPa of above 75,000 MPa %, in particular above 80,000 MPa %.

A surface roughness of a polycrystalline semiconductor film to be formed by a laser annealing method is reduced. A transmittance distribution filter is disposed at the optical system of a laser annealing apparatus. The transmittance distribution filter controls an irradiation light intensity distribution along a scanning direction of a substrate formed with an amorphous silicon semiconductor thin film to have a distribution having an energy part equal to or higher than a fine crystal threshold on a high energy light intensity side and an energy part for melting and combining only a surface layer. This transmittance distribution filter is applied to an excimer laser annealing method, a phase shift stripe method or an SLS method respectively using a general line beam to thereby reduce the height of protrusions on a polycrystalline surface.

A first laser beam is emitted from a first laser oscillator in a pulsed manner at a high repetition frequency, and converged onto a substrate by a first intermediate optical system 2 so as to form a slit-like first beam spot. A second laser beam is emitted from a second laser beam oscillator in a pulsed manner to rise precedent to and fall subsequent to the first laser beam, and converged onto the substrate by a second intermediate optical system so as to form a second beam spot similar in configuration to the first beam spot and to contain the first beam spot. Crystallization of a semiconductor thin film on the substrate is carried out while the substrate or the first, second beam spots are moved. Thereby, the whole semiconductor thin film is formed into a crystal surface that has grown in one direction and free from ridges. Thus, the semiconductor thin film has an extremely flat surface, extremely few defects, large crystal grains and high throughput.

When a photosensor was conventionally provided in a display device, separate modules manufactured in separate steps were installed in the same case. However, decreases in the number of parts and in cost could not be achieved, and a compact size and thinning of the display device was not proceeded. A photosensor is realized by a TFT provided on an insulating substrate. Photocurrent caused by incidence of external light onto a TFT when the TFT is turned-off is detected so that the TFT is used as a photosensor. By performing laser-annealing for a semiconductor layer of the photosensor, an average grain size of crystal particles of the semiconductor layer of the photosensor is made larger than those of a crystal particle of a display portion and a light emission element, thereby improving crystal properties. Thus, a generation efficiency of the photocurrent of the photosensor can be increased.

A micro-welding process is used to apply erosion and wear resistant coatings to the internal diameter of gun barrels. The applied coatings are then treated by methods such as honing and/or rotary forging. The protective micro-welded coatings may comprise ceramic, cermet and/or refractory metal materials, and may be used with rifled or smooth gun barrels of various sizes.

The present invention provides a method and apparatus for plating a conductive material to a substrate and also modifying the physical properties of a conductive film while the substrate is being plated. The present invention further provides a method and apparatus that plates a conductive material on a workpiece surface in a “proximity” plating manner while a pad type material or other fixed feature is making contact with the workpiece surface in a “cold worked” manner. In this manner, energy stored in the cold worked regions of the plated layer is used to accelerate and enhance micro-structural recovery and growth. Thus, large grain size is obtained in the plated material at a lower annealing temperature and a shorter annealing time.

The invention discloses a manufacturing method of a low-temperature polycrystalline silicon (poly-Si) thin film transistor (TFT). The method is characterized by: forming an amorphous silicon (a-Si) layer on a substrate; carrying out hydrogen relief treatment on the a-Si layer so that the a-Si layer becomes a microgranular; then, forming the a-Si layer which does not be performed with grain refining on the a-Si layer of the microgranular; and then carrying out the hydrogen relief treatment on the a-Si layer so that the a-Si layer becomes the microgranular; and continuously repeating so as to form the a-Si layer and carrying out the hydrogen relief treatment so as to form the a-Si layer with multilayer micromeritics; finally, carrying out excimer laser annealing (ELA) so that the a-Si layer with the multilayer micromeritics crystallizes into a poly-Si layer. After the poly-Si layer becomes the a-Si layer of the multilayer micromeritic through pretreatment, the ELA is performed so that the crystalline grain of the poly-Si layer becomes larger and a carrier mobility is high.

The invention discloses a perovskite solar cell and a preparation method thereof. The perovskite solar cell comprises a transparent conductive substrate, a hole transport layer, a decoration layer, a perovskite layer, an electron transport layer, a barrier layer and a metal electrode. The surfaces of PEDOT: PSS, NiOx and the hole transport layer are decorated by ionic liquid based on imidazole, atomic force microscope graphs before and after the decoration are compared, and the decorated surface appearance is more smooth, which is conducive to inhibiting the compounding of dark current. The perovskite layer is a new perovskite material 3MAI: PbAc2.xH2O (x is not smaller than 0 and is not greater than 3), and is prepared by quickly preheating a substrate and heating a perovskite precursor solution, namely instant heating assisted spray coating technology (HASP) at a low temperature (lower than 100 DEG C), which is conducive to increasing the grain size of perovskite and reducing the defects between perovskite grains so as to greatly improve the efficiency of the perovskite battery. The photoelectric conversion efficiency of the final battery device is greater than 19%, the flexible device efficiency is 10.8%, no hysteresis effect is formed, and thus the preparation method has a broad application prospect.

The invention relates to the field of manufacturing technology of polycrystalline silicon ingot furnaces, aiming to provide an ingot furnace thermal field structure based on multi-heater and an operation method. The ingot furnace thermal field structure comprises a crucible arranged in a furnace chamber; a thermal field of the crucible comprises a top heater, a side heater, a heat exchanger table located on the bottom of the crucible and a bottom heater located on the bottom of the heat exchange table; an infrared temperature measuring instrument coordinates with the top heater and the side heater; the infrared temperature measuring instrument or a thermoelectric couple coordinates with the bottom heater. An operation process of the operation method comprises a heating stage, a melting stage, a crystal growing stage, an annealing stage and a cooling stage. The ingot furnace thermal field structure and the operation method can effectively monitor the temperature of various portions of the thermal field, regulate power output of various heaters, establish more reasonable temperature gradient, adapt to high-feeding capacity and large-size ingot trend, enable crystal nucleus to form more uniformly during early time of crystal growth, enlarge crystals, reduce crystal boundary, improve crystal direction, reduce energy consumption and finally improve quality of crystal ingots.

The present invention discloses a rice large-grain gene GW2 and the application thereof, the GW2 gene can be used to control the grain size of the crop, improve the yield or quality of the crop, regulate the cycle duration of cellular mitosis, and used as a molecular marker to identify the species of the crop to be a large-grain one or a small-grain one. The present invention also discloses a method to ameliorate the crop. The gene GW2 has a wide prospect on high-yield breeding of crops such as rice.

A method of manufacturing a semiconductor device includes irradiating a region to be crystallized of a non-monocrystalline semiconductor film with laser beam modulated by an optical modulator to have light intensity distribution having a minimum light intensity line or minimum light intensity spot to crystallize the region, and heating the crystallized region by irradiating light from a flash lamp onto the crystallized region.

A method of manufacturing a bottom gate thin film transistor (“TFT”) in which a polycrystalline channel region having a large grain size is formed relatively simply and easily. The method of manufacturing a bottom gate thin film transistor includes forming a bottom gate electrode on a substrate, forming a gate insulating layer on the substrate to cover the bottom gate electrode, forming an amorphous semiconductor layer, an N-type semiconductor layer and an electrode layer on the gate insulating layer sequentially, etching an electrode region and an N-type semiconductor layer region formed on the bottom gate electrode sequentially to expose an amorphous semiconductor layer region, melting the amorphous semiconductor layer region using a laser annealing method, and crystallizing the melted amorphous semiconductor layer region to form a laterally grown polycrystalline channel region.

A method for forming a semiconductor device including a semiconductor layer, formed of a silicon-based deposited film containing crystals by plasma-enhanced CVD, includes the steps of applying a bias voltage between a high-frequency electrode and a substrate with the high-frequency electrode being negative when the semiconductor layer is formed; detecting sparks occurring on the high-frequency electrode or the substrate; and controlling at least one condition, selected from the group consisting of high-frequency power, bias voltage, bias current, pressure, gas flow rate, and interelectrode distance, based on the results of the detection so that the number of sparks with durations of 100 ms or more is 1 or less sparks per minute.

An amorphous silicon layer and at least a heat-retaining layer are formed on a substrate in turn. Wherein, the heat-retaining layer is controlled to have an anti-reflective thickness for reducing the threshold laser energy to effect the melting of the amorphous silicon layer. Then, a laser irradiation process is performed to transform the amorphous silicon layer into a polycrystalline silicon layer. During the laser irratiation process, a portion of the laser energy transmits the heat-retaining layer to effect the melting of the amorphous silicon layer, and another portion of the laser energy is absorbed by the heat-retaining layer.