The invention discloses a
deposition chamber structure and MPCVD equipment, and belongs to the field of
diamond synthesis equipment. According to the technical scheme, the
deposition chamber structure comprises a base, a tubular
quartz window is fixedly arranged on the base, an upper cover is connected to the upper portion of the
quartz window in a sealed mode, a
metal ring is arranged on the outer side of the
quartz window in a sleeving mode, and a plurality of transversely-arranged and vertically-arranged
microwave feed-in gaps are formed in the middle area of the
metal ring; the outer side of the middle area of the
metal ring is sleeved with a
resonance metal cavity, the
resonance metal cavity is used for being connected with a
microwave source, a growth base table capable of lifting in a multi-stage mode is arranged in the quartz window, the
microwave feed-in dimension is increased, and
plasma which is large in
discharge area, uniform, stable and high in
energy density is formed above the growth base table in a
coupling mode. And the growth base table can be lifted in a multi-stage manner, so that the deposition quality of the growth sample is optimized, the deposition area of the growth sample is expanded, and the preparation of the high-quality large-size
diamond crystal is realized.