The invention provides a method for growing a
gallium nitride single crystal array with an adjustable
band gap through an in-situ confinement reaction, which comprises the following steps of: attaching and pressing an asymmetric wettability micro-column template and a substrate, injecting a
gallium source which is fluid from a hole in one side of the substrate, and directionally transmitting and flowing the
gallium source along the top end of a micro-column under the confinement action of the micro-column template to obtain a gallium source array; heating the gallium source array in a
nitrogen source
atmosphere to enable the gallium source array and a
nitrogen source to be subjected to an in-situ
chemical reaction to obtain a
gallium nitride pattern array; and after cooling and annealing, stripping the
gallium nitride single crystal pattern array from the micro-column template to obtain an in-situ growth
gallium nitride pattern array. The gallium source array is obtained by adjusting the proportion of gallium and
indium or aluminum and the like, and the gallium
nitride pattern doped with
indium or aluminum and the like and adjustable in
band gap grows through in-situ reaction; according to the method, the
doping metal proportion can be flexibly regulated and controlled to regulate and control the
crystal property, the used template can be repeatedly utilized, the cost is low, operation is convenient, materials and devices are safe and easy to obtain, and large-scale industrialization is expected to be achieved.