The invention discloses an HJT battery and a preparation method thereof. The battery comprises an N-type silicon wafer, wherein intrinsic noncrystalline silicon layers are arranged on the illuminatedface and shady face of the N-type silicon wafer respectively; a P-type doped noncrystalline silicon layer and an N-type doped noncrystalline silicon layer are arranged on the intrinsic noncrystallinesilicon layers respectively; an IMO layer and an ITO layer are arranged on the P-type doped noncrystalline silicon layer in sequence; an ITO conducting film layer is arranged on the N-type doped noncrystalline silicon layer; and metal gate electrodes are arranged on the ITO layer and the ITO conducting film layer respectively. The preparation method comprises the following steps: carrying out texturing cleaning on the N-type silicon wafer; and carrying out deposition/preparation of the intrinsic noncrystalline silicon layers, the P-type doped noncrystalline silicon layer, the N-type doped noncrystalline silicon layer, the IMO layer, the ITO layer, the ITO conducting film layer and the metal gate electrodes. The HJT battery has excellent electrochemical performance, and has extremely important meanings for improving the application range of heterojunction batteries, and the preparation method has the advantages of simple technology, low volume production threshold, low preparation cost,high production efficiency and the like.