The invention relates to the technical field of
infrared scene
simulation, in particular to an
infrared scene generation
chip, a preparation method thereof and an
infrared scene generation device. The infrared scene generation
chip is used for an infrared scene generation device, the infrared scene generation device is provided with an
infrared window and a visible light window, the infrared scene generation
chip comprises a substrate and a
pixel array, the substrate is a
silicon carbide substrate, the substrate and the
infrared window are oppositely arranged, the
pixel array is arranged on the side, facing the visible light window, of the substrate, and the
pixel array is arranged on the side, facing the visible light window, of the substrate. The infrared scene generation chip is configured to convert visible light incident from the visible light window into infrared light, and the infrared light is suitable for being emitted from the
infrared window. According to the arrangement, the
silicon carbide substrate has relatively
high transmittance for infrared light, so that the infrared scene generation chip is more suitable for a transmission-type infrared scene generation device, and the
thermal conductivity and the stability of the infrared scene generation chip are improved.