The base
polymer of a
resist material contains a
polymer compound including a first unit represented by a general formula of the following
Chemical Formula 4 and a second unit represented by a general formula of the following
Chemical Formula 5: wherein R1, R2 and R3 are the same or different and are a
hydrogen atom, a
fluorine atom, or a straight-chain
alkyl group, a branched or cyclic
alkyl group or a fluoridated
alkyl group with a
carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a
carbon number not less than 0 and not more than 20; R5 and R6 are the same or different and are a
hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a
carbon number not less than 1 and not more than 20, or a
protecting group released by an acid; R7 is a
methylene group, an
oxygen atom, a
sulfur atom or -SO2-; R8, R9, R10 and R11 are the same or different and are a
hydrogen atom, a
fluorine atom, a hydroxyl group, -0R13, CO2R13, -R2-OR13 or -R12-CO2R13, at least one of R8, R9, R10 and R11 including -OR13, -CO2R13, -R12-OR13 or -R12-CO2R13 (wherein R 2 is a straight-chain alkylene group, a branched or cyclic alkylene group or a fluoridated alkylene group with a carbon number not less than 1 and not more than 20 and R13 is a
hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a
protecting group released by an acid); 0<a<1; 0<b<1; and c is 0 or 1.