The invention discloses a
thermopile sensor based on
monocrystalline silicon and a metasurface and a preparation method of the
thermopile sensor. The preparation method comprises the following steps: cleaning and
drying a
silicon wafer on an insulating layer, and
etching the
monocrystalline silicon on the top layer to form a strip-shaped
thermocouple strip; the method comprises the following steps: depositing a
silicon dioxide layer on the upper layer of a
thermocouple strip,
etching to form an interconnected through hole, depositing a first
metal layer, filling the interconnected through hole,
etching and reserving a part interconnected with the
thermocouple strip and a part located in a thermocouple region, and sequentially depositing a
passivation layer and a second
metal layer on the first
metal layer, and etching the second metal layer to form a metasurface, etching the
passivation layer to form a local opening, and performing cavity etching on the
silicon wafer under the insulating layer to obtain the
thermopile sensor with the thermopile suspension
film structure. According to the preparation method, the
Seebeck coefficient is improved by preparing the
monocrystalline silicon thermocouple structure, the
infrared absorption efficiency is improved by preparing the metasurface structure, and the detected output
voltage is improved while the
chip size and the
process complexity are not increased.