The invention provides an application method of an ALD-SnO2
electron transport layer in a large-area trans-
perovskite assembly, which comprises the following steps of: 1, performing ultrasonic cleaning on a transparent conductive substrate greater than or equal to 10cm * 10cm by using an alkaline detergent, rinsing by using deionized water, dehydrating by using isopropanol, and performing
ultraviolet ozone treatment for 20-30 minutes to remove organic residues; 2, tetrabutyltin and deionized water are used as precursors in an ALD reaction cavity, a SnO2 bottom layer is deposited at 140-180 DEG C,
tin source pulse is carried out for 0.8-1.2 s,
oxygen source pulse is carried out for 0.3-0.6 s, purge is carried out for 8-12 s, and circulation is carried out 60-90 times till the
wavelength is 6-9 nm; 3, trimethylaluminum is introduced, aluminum source pulse is linearly and progressively increased for 0.02-0.1 s to achieve 0.5%-2% gradient
doping, and a 3-5 nm layer is formed through 40-70 times of circulation; 4, after
oxygen plasma treatment is conducted for 6 min to 12 min, a 0.15 mg / mL to 0.25 mg / mL 2-mercaptopyrimidine
ethanol solution is spin-coated, and annealing is conducted for 12 min to 18 min at the temperature
ranging from 90 DEG C to 110 DEG C; and step 5, preparing a
perovskite layer with the assistance of a
gas phase, and sequentially depositing a NiOx
electrode and an
Ag electrode to complete the
assembly. The method solves the problems that the existing ALD-SnO2 is limited in application precursor selection, single in
doping strategy and poor in large-area adaptability.