Preparation method of solar cell with elimination of printing wave line
A solar cell, wave pattern technology, applied in printing, circuits, printing devices, etc., can solve problems such as affecting the appearance quality of batteries, and achieve the effect of simple operation and easy industrialization
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Embodiment 1
[0023] The invention provides a method for preparing a solar cell that eliminates printing waves, the steps of which are:
[0024] a. Surface texturing
[0025] The incoming monocrystalline silicon wafers are inserted into the textured flower basket along the cutting mark downward, and then the silicon wafers loaded into the flower basket are pre-cleaned. The pre-cleaning adopts ultrasonic waves and adds a certain amount of cleaning and decontaminating agent. Afterwards, the silicon wafer was placed in a sodium hydroxide solution with a temperature of 75°C and a mass percent concentration of 2% for surface texturing, and an appropriate amount of texturing catalyst was added to form a uniform texture on the surface of the silicon wafer with a crystal orientation. The "pyramid" suede structure with a consistent size of 1-3um makes the surface have a good light trapping effect.
[0026] b. Diffusion
[0027] Insert the textured silicon wafer into the quartz boat along the cutt...
Embodiment 2
[0037] The difference between this example and Example 1 is that in step a, the silicon wafer is placed in a sodium hydroxide solution with a temperature of 80° C. and a concentration of 1% by mass to perform a surface texturing process. In step g, a screen printing screen is used to print the back electrode paste and then the back electric field paste on the back, and then dry them at a temperature of 200° C. respectively. The printed silicon wafers are sent to the sintering furnace, and after being dried at a temperature of about 250°C, the silicon wafers are transported into an atmosphere with a surface temperature ranging from 500°C to 800°C for sintering. Other steps are with embodiment 1.
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