Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method

A solar cell and grid electrode technology, applied in the application field, can solve the problems of increasing the recombination probability of surface emitter carriers, increasing the reflectivity of the front surface to incident light, reducing the efficiency of the emitter performance cell, and achieving pattern and size Flexible and variable, the effect of improving carrier collection efficiency, good light transmittance and electrical conductivity

Active Publication Date: 2013-10-23
SOUTH CHINA NORMAL UNIVERSITY
View PDF3 Cites 20 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this large-scale grid line electrode has a significant shadow effect on the front surface of the battery, increasing the reflectance of the front surface to incident light (~15% of the total surface reflectance); and these grid lines are very large. To obtain better conductivity, the emitter on the surface of the battery is heavily doped with n++, resulting in a significant increase in the recombination probability of the surface emitter carrier, reducing the short-wave absorption rate of the battery, the

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method
  • Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method
  • Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0044] Example 1

[0045] This embodiment provides a method for preparing a solar cell silver wire grid electrode on the surface of a polished silicon substrate based on a photolithography mask method and a liquid phase method, such as figure 1 As shown, where (1) the photoresist template is made; (2) the silicon substrate reacts with the silver nitrate and hydrofluoric acid mixed solution; (3) silver particles are produced on the exposed silicon substrate between the photoresist The deposition to form silver grid lines. Such as figure 2 As shown; (4) remove the photoresist on the surface of the silicon substrate with a film remover; (5) leave the grid lines formed by closely arranged silver particles on the surface of the silicon substrate; (6) high temperature annealing treatment. (7) The closely arranged silver particles communicate with each other to form a silver wire grid electrode. Where as Figure 4 with Image 6 Shown. It includes four main steps: one is to make a ph...

Example Embodiment

[0060] Example 2

[0061] This embodiment provides a method for preparing micron silver wire grid electrodes for solar cells on the surface of a textured single crystal silicon substrate based on a photolithography mask method and a liquid phase method, such as figure 1 As shown, where (1) the photoresist template is made; (2) the silicon substrate reacts with the silver nitrate and hydrofluoric acid mixed solution; (3) silver particles are produced on the exposed silicon substrate between the photoresist (4) Use a remover to remove the photoresist on the surface of the silicon substrate; (5) Leave a gate line formed by densely arranged silver particles on the surface of the silicon substrate; (6) High temperature annealing deal with. (7) The closely arranged silver particles communicate with each other to form a micron silver wire grid electrode. It includes four main steps: one is to make a photoresist template, the other is to deposit silver particles on a specific area on t...

Example Embodiment

[0075] Example 3

[0076] This embodiment provides a method for preparing a silver wire grid electrode on the surface of a textured polysilicon substrate based on a photolithography mask method and a liquid phase method, such as figure 1 As shown, where (1) the photoresist template is made; (2) the silicon substrate reacts with the silver nitrate and hydrofluoric acid mixed solution; (3) silver particles are produced on the exposed silicon substrate between the photoresist (4) Use a remover to remove the photoresist on the surface of the silicon substrate; (5) Leave a gate line formed by densely arranged silver particles on the surface of the silicon substrate; (6) High temperature annealing Sintering treatment. (7) The closely arranged silver particles communicate with each other to form a micron silver wire grid electrode. It includes four main steps: one is to make a photoresist template, the other is to deposit silver particles on a specific area on the surface of the silic...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Sizeaaaaaaaaaa
Diameteraaaaaaaaaa
Sheet resistanceaaaaaaaaaa
Login to view more

Abstract

The invention discloses a method for preparing a solar cell silver wire grid electrode based on a photolithographic mask method and a liquid phase method. The method disclosed by the invention comprises the following steps: (1) a photoresist template is manufactured: photoresist is uniformly coated on the surface of a silicon substrate by using a spin-coating method, and designed specific graphics on a mask are copied on the silicon substrate through the steps of exposure, development, hardening and the like; (2) Ag particles are deposited by using a chemical method: an electrochemical reaction method is used for depositing the Ag particles on the photoresist template; (3) the photoresist template is removed: the photoresist is removed by using a photoresist remover; and (4) the annealing and sintering are carried out, and after the closely arrayed Ag particles are heated at high temperature, the Ag electrode is formed by mutual communication. The micron-level Ag electrode prepared according to the method has excellent electroconductive performance and a lower reflecting rate, moreover, the preparation process is simple, resource consumption is less, the Ag electrode can well replace a silk screen printed electrode, the efficiency of a solar cell can be improved, and the cost can be lowered.

Description

technical field [0001] The invention belongs to the technical fields of photovoltaic application and touch display, and in particular relates to a method for preparing a silver wire grid electrode of a solar cell based on a photolithography mask method and a liquid phase method. Background technique [0002] Solar energy is an inexhaustible clean energy. With the depletion of non-renewable energy sources such as coal and oil, the research, development and utilization of solar cells are undoubtedly the current hot spots. Improving the photoelectric conversion efficiency of solar cells and reducing the preparation cost are the directions of research and development of solar cells. The transparent conductive front electrode is one of the important components in solar cells, which directly affects the fill factor and short-circuit current of the cell device, and then affects the photoelectric conversion efficiency of the cell. Generally speaking, a transparent conductive elect...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L31/18G03F7/20
CPCY02P70/50
Inventor 高进伟黄苑林
Owner SOUTH CHINA NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap