The invention discloses a preparation method of a TBC
battery electrode grid line, the
electrode grid line and a TBC battery, and belongs to the technical field of solar cells, and the preparation method comprises the following steps: carrying out double-sided
polishing on a
silicon wafer; sequentially depositing a tunneling
oxide layer and an intrinsic
polycrystalline silicon layer on the back surface of the
silicon wafer, and performing
boron diffusion; digging an N region and a PN connection partition region on the back surface of the
silicon wafer; sequentially depositing a tunneling
oxide layer and an intrinsic
polycrystalline silicon layer on the back surface of the silicon wafer, and performing
phosphorus diffusion on the basis of the tunneling
oxide layer and the intrinsic
polycrystalline silicon layer; digging a P region and a GAP region on the back surface of the silicon wafer, and digging a hole channel by using a second
laser; removing the
borosilicate glass layer and the phosphorosilicate glass layer in the pore channel area; sequentially depositing an aluminum oxide layer and a
silicon nitride layer on the surface of the silicon wafer; printing non-burn-through
slurry in the main grid areas of the P area and the N area through the silk
screen printing plate; and carrying out
laser-assisted
sintering on the auxiliary grid line pore channel region. The completeness of a
passivation film layer structure on the back surface of the battery piece is ensured, meanwhile, the contact area of a
metal electrode and a silicon substrate is reduced, and
metal contact recombination is effectively reduced.