The invention discloses alkali-free glass with low reheat
shrinkage rate as well as a preparation method and application thereof, and the glass is prepared from the following raw materials in percentage by
mass: 60 to 65 percent of SiO2, 17 to 21 percent of Al2O3, 0 to 2 percent of B2O3, 4 to 8 percent of SrO, 3 to 5 percent of CaO, 4 to 7 percent of MgO, 0 to 3 percent of BaO and 0 to 2 percent of SnO. The alkali-free glass which is high in strain point, low in
softening point and high in
ultraviolet transmittance and meets the requirement of a
polycrystalline silicon process is prepared by adopting an overflow down-draw method process under a conventional annealing condition according to a
raw material ratio, on one hand, by increasing the content of SiO2, the strain point of the glass is increased, and the reheat
shrinkage rate is reduced at the same time; on the other hand, BaO is introduced to regulate the density of the glass and improve the strain point temperature of the glass, the reheat
shrinkage rate (600 DEG C / 1h) of the prepared alkali-free glass is below 35ppm, the strain point reaches above 707 DEG C, the
softening point temperature is about 820 DEG C, the
thermal expansion coefficient is 3.4 * 10 <-6 >-4.0 * 10 <-6 > / DEG C, the density is 2.52-2.57 g / cm < 3 >, the
hardness is 685-712kgf / mm < 2 >, and the
transmittance reaches above 74% when the visible light
wavelength lambda is 308nm.