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68results about How to "High χ value" patented technology

Selected processing for non-equilibrium light alloys and products

A new class of light or reactive elements and monophase alpha'-matrix magnesium- and aluminum-based alloys with superior engineering properties, for the latter being based on a homogeneous solute distribution or a corrosion-resistant and metallic shiny surface withstanding aqueous and saline environments and resulting from the control during synthesis of atomic structure over microstructure to net shape of the final product, said alpha'-matrix being retained upon conversion into a cast or wrought form. The manufacture of the materials relies on the control of deposition temperature and in-vacuum consolidation during vapor deposition, on maximized heat transfer or casting pressure during all-liquid processing and on controlled friction and shock power during solid state alloying using a mechanical milling technique. The alloy synthesis is followed by extrusion, rolling, forging, drawing and superplastic forming for which the conditions of mechanical working, thermal exposure and time to transfer corresponding metastable alpha'-matrix phases and microstructure into product form depend on thermal stability and transformation behavior at higher temperatures of said light alloy as well as on the defects inherent to a specific alloy synthesis employed. Alloying additions to the resulting alpha'-monophase matrix include 0.1 to 40 wt. % metalloids or light rare earth or early transition or simple or heavy rare earth metals or a combination thereof. The eventually more complex light alloys are designed to retain the low density and to improve damage tolerance of corresponding base metals and may include an artificial aging upon thermomechanical processing with or without solid solution heat and quench and annealing treatment for a controlled volume fraction and size of solid state precipitates to reinforce alloy film, layer or bulk and resulting surface qualities. Novel processes are employed to spur production and productivity for the new materials.
Owner:HEHMANN FRANZ

Engineered CO2-Fixing Chemotrophic Microorganisms Producing Carbon-Based Products and Methods of Using the Same

Disclosed herein are microorganisms containing exogenous or heterologous nucleic acid sequences, wherein the microorganisms are capable of growing on gaseous carbon dioxide, gaseous hydrogen, syngas, or combinations thereof. In some embodiments the microorganisms are chemotrophic bacteria that produce or secrete at least 10% of lipid by weight. Also disclosed are methods of fixing gaseous carbon into organic carbon molecules useful for industrial processes. Also disclosed are methods of manufacturing chemicals or producing precursors to chemicals useful in jet fuel, diesel fuel, and biodiesel fuel. Exemplary chemicals or precursors to chemicals useful in fuel production are alkanes, alkenes, alkynes, fatty acid alcohols, fatty acid aldehydes, desaturated hydrocarbons, unsaturated fatty acids, hydroxyl acids, or diacids with carbon chains between six and thirty carbon atoms long. Also disclosed are microorganisms and methods using disclosed microorganisms for the production of butanediol and its chemical precursors in low-oxygen or anaerobic fermentation. Also disclosed are microorganisms and methods using disclosed microorganisms for generating hydroxylated fatty acids in microbes through the transfer of enzymes that are known to hydroxylate fatty acids in plants or microbes. Also disclosed are microorganisms and methods using disclosed microorganisms for the production of shorter-chain fatty acids in microbes through the introduction of exogenous fatty acyl-CoA binding proteins.
Owner:KIVERDI INC

Mask Decomposition for Double Dipole Lithography

Method and apparatus for generating a pair of layouts suitable for forming exposure mask to use in a double dipole lithographic process are disclosed. With some implementations, a y-dipole layout and an x-dipole layout are generated by decomposing a target layout. Subsequently, an optical proximity correction process is implemented on the y-dipole layout and the x-dipole layout. The decomposition may designate ones of the edge segments in the target layout at major edge segments and other ones of the edge segments as minor edge segments. A higher feedback value may then be assigned to the minor edges than the major edges. Subsequently, a few iterations of an optical proximity correction process that utilizes a smaller than intended mask rule constraint value and the assigned feedback values is implemented on the target layout. The minor edges separated by a distance of less than the intended mask rule constraint distance are then collapsed. After which, a few iterations of the optical proximity correction process are allowed to iterate. In further implementations, once the y-dipole and x-dipole layouts have been generated. An additional optical proximity correction process is implemented on the layouts. During this optical proximity correction process, a higher feedback values is again assigned to the minor edge segments. At a point during the optical proximity correction process, minor edges within portions of the layouts that have a bias value larger than a predetermined value are expanded back from their collapsed position.
Owner:SIEMENS PRODUCT LIFECYCLE MANAGEMENT SOFTWARE INC
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