The invention provides a crack-free
lithium niobate film based on a
Si substrate and a growth method and application thereof, and belongs to the field of ferroelectric film growth methods. According to the crack-free
lithium niobate thin film based on the
Si substrate, the substrate is selected from a
Si substrate, and a target material is selected from congruent
lithium niobate
ceramic doped with 2.0 mol%-5.0 mol% of
erbium and congruent
lithium niobate ceramic doped with 5.0 mol% of iron prepared by a
solid-
phase reaction method, or is selected from congruent
lithium niobate crystal doped with 2.0 mol% of
erbium and congruent
lithium niobate crystal doped with 5.0 mol% of iron prepared by a
Czochralski method, or is selected from congruent
lithium niobate crystal doped with 5.0 mol% of
erbium and congruent
lithium niobate crystal doped with 5.0 mol% of iron prepared by a
Czochralski method. The lithium niobate thin film shows a lithium niobate (006) characteristic
diffraction peak and a lithium-deficient phase LiNb3O8 (-602) characteristic
diffraction peak, the surface of the lithium niobate thin film is flat, smooth and crack-free, the problem of surface
cracking of a Si-based lithium niobate thin film for a long time is solved, and the lithium niobate thin film can be used for preparing micro-cavities, electro-optical modulators, photoelectric detectors, super-surface micro-
nano devices and the like and has wide application prospects. And a foundation is laid for manufacturing and researching an integrated device on a lithium niobate film sheet.