The invention discloses a preparation method of an ultra-smooth nanocrystalline
tungsten coating on the surface of an emitter, the
tungsten coating is prepared by adopting a magnetron
sputtering method, and the specific process is as follows: pretreating an emitter workpiece, then placing the emitter workpiece in a
vacuum chamber, pre-vacuumizing, then introducing
inert gas, cleaning the surface of the emitter workpiece by utilizing gas
ion reverse
sputtering, and finally removing the surface of the emitter workpiece. And then adjusting the
gas pressure, bombarding and cleaning the surface of the emitter workpiece by using
metal ions, and finally
sputtering and depositing to form the
tungsten coating. The tungsten coating is prepared through the magnetron sputtering technology, the tungsten coating has the characteristics of being compact in structure, good in combination and uniform and smooth in surface, the
mechanical property and
structural stability of the tungsten coating in the high-temperature service environment can be guaranteed, the deposition technology is simple, the preparation efficiency is high, and the tungsten coating is green and free of
pollution, in addition, preparation of the tungsten coating composed of different phases can be achieved, and the application prospect is wide. The application requirements in the fields of
electronic industry,
nuclear industry and the like are met.