Core/shell nano particle grinding agent polishing solution composition and method for preparing same

Abstract

The present invention relates to one kind of core-shell type nanometer particle abrasive polishing liquid composition and its preparation process, and belongs to the field of surface polishing technology. The polishing liquid includes abrasive, oxidant and water, and features the abrasive is core-shell type nanometer composite particle abrasive, which has traditional abrasive, such as superfine alumina, silica, zirconia, cerium oxide, titania, ferric oxide, diamond or silicon nitride, as inner core, and hydrophilic segment polymer or compound containing organic functional group as shell. The polishing liquid is suitable for chemical and mechanical polishing of memory hard disc chip and aluminum magnetic disc, and has the advantages of reduced surface roughness and waviness, reduced surface mechanical damage and effective elimination of micro default.

Description

technical field [0001] The invention relates to a core / shell type nanoparticle abrasive polishing liquid composition and a preparation method thereof. The polishing liquid is a chemical mechanical polishing liquid, which is mainly used in the polishing process of a memory hard disk substrate, and belongs to the surface polishing processing technology. field. Background technique [0002] In recent years, with the rapid increase in the capacity and density of memory hard disks, the flying height of computer magnetic heads has been reduced to about 10 nanometers, and it is expected that the next generation will be reduced to 7-8 nanometers. As the head and disk operate so close, the demands on the surface quality of the disk are also increasing. If the surface roughness and corrugation of the hard disk are too large, the magnetic head will collide with the surface of the magnetic disk during high-speed operation, which will damage the magnetic head or the magnetic medium on t...

AI Technical Summary

Problems solved by technology

[0003] At present, chemical mechanical polishing technology is generally used to polish the surface of hard disk substrates. Abrasives are the main components of chemical mechanical polishing fluids. The abrasives currently used are all selected from solid inorganic particles such as alumina, zirconia, diamond, and silicon oxide. , cerium oxide, titanium oxide, iron oxide, silicon nitride, etc., in the hard disk substrate polishing process, there are the following problems: first, the dispersion stability of the particles, due to the small particle size, large surface activity, the interaction between particles The force is strong. During the storage process, the dispersed nanoparticles will inevitably aggregate to different degrees, generate large particles, and then precipitate, resulting in the failure of the polishing fluid. At the same time, the existence of large particles is the root cause of polishing scratches. One; on the other hand, abrasive particles such as nano-diamond, aluminum oxide, zirconia, silicon nitride, etc., have relatively high hardness, and the damage to the surface during the polishing process is serious, which not only causes large surface roughness, but also Surface defects such as polishing scratches and pits are prone to appear