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74 results about "Triple bond" patented technology

A triple bond in chemistry is a chemical bond between two atoms involving six bonding electrons instead of the usual two in a covalent single bond. The most common triple bond, that between two carbon atoms, can be found in alkynes. Other functional groups containing a triple bond are cyanides and isocyanides. Some diatomic molecules, such as dinitrogen and carbon monoxide, are also triple bonded. In skeletal formula the triple bond is drawn as three parallel lines (≡) between the two connected atoms.

Benzotriazole light conversion agent, light conversion adhesive film composition, light conversion adhesive film and packaging device

The invention provides a benzotriazole light conversion agent, a light conversion adhesive film composition, a light conversion adhesive film and a packaging device. The benzotriazole light conversion agent has a structure as shown in a formula (I). Compared with a traditional benzotriazole light conversion agent, the benzotriazole light conversion agent has higher light conversion efficiency; carbon-carbon triple bonds are respectively introduced between a benzotriazole group and substituent groups R2 and R2'on two sides of the benzotriazole group, and R2 and R2 'are limited as specific types of aryl groups, so that a D (aryl)-A (benzotriazole group)-D (aryl)-like structure can be converted into a D (aryl)-pi (alkynyl)-A (benzotriazole group)-pi (alkynyl)-D (aryl) structure, and the structural formula of the benzotriazole compound is as shown in the specification. Therefore, the conjugation range and conjugation degree of molecules are effectively expanded, and the purposes of enhancing the absorption strength and widening the absorption wave band range are achieved. (I)
Owner:HANGZHOU FIRST APPLIED MATERIAL CO LTD

processing liquid

The present invention relates to a processing liquid containing an effective ingredient and water, wherein the effective ingredient contains the following component (A), the following component (B), and the following component (C), • component (A): one or more compounds selected from a specific acetylenic diol and an alkylene oxide adduct thereof, • component (B): a compound containing a copolymerization site of ethylene oxide and another alkylene oxide, and not having a carbon-carbon triple bond, • component (C): a compound containing a copolymerization site of ethylene oxide and another alkylene oxide, not having a carbon-carbon triple bond, and having a higher cloud point than the component (B) at 1 mass% aqueous solution, the content of the component (A) and the total content of the component (B) and the component (C) are in a specific range based on the total amount of the effective ingredient, and the content ratio (A) / (C) of the component (A) and the component (C) and the content ratio (B) / (C) of the component (B) and the component (C) are in a specific range in terms of mass ratio.
Owner:IDEMITSU KOSAN CO LTD

Method for rapidly determining K.2. 2.2. 2 content in FDG card sleeve kit leacheate

The invention relates to a method for rapidly determining the content of K.2. 2.2. 2 in an FDG card sleeve kit leacheate, and belongs to the technical field of radiopharmaceutical analysis. The method comprises the following steps: selecting a 1110 + / -5 cm <-1 > peak as a quantitative characteristic peak of K.2.2. 2, wherein the peak corresponds to symmetric stretching vibration of a C-O-C ether bond in a K.2.2. 2 molecule; selecting a 2253 + / -3cm <-1 > peak as an internal standard peak, wherein the peak corresponds to C = N triple bond stretching vibration of acetonitrile in the leacheate; preparing a K.2. 2.2. 2 gradient solution with the concentration of 0.05 to 5 mg / mL, and fixing the concentration of K2CO3 to be 0.5 to 2 mg / mL; the method comprises the following steps: acquiring a spectrum by adopting an ATR technology, setting the resolution ratio to be 4cm <-1 > and the scanning frequency to be 32, and establishing a K.2. 2.2. 2 linear model according to the ratio of A1110 / A2253; eliminating baseline drift by adopting a second derivative spectrum; and a PLS algorithm is adopted to correct trace interference of K2CO3.
Owner:GUANGZHOU ATOM HIGH TECH RADIOPHARMACEUTICAL CO LTD

Positive resist composition and pattern forming process

A positive resist composition is provided comprising a base polymer comprising repeat units (a) having two triple bonds and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced LWR, and improved CDU is formed therefrom.
Owner:SHIN ETSU CHEMICAL CO LTD

Resist composition and pattern forming process

A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of triple bond-bearing tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.
Owner:SHIN ETSU CHEMICAL CO LTD

Film forming method and film forming apparatus

A film forming method includes preparing a substrate having a first region in which a metal film or an oxide film of the metal film is exposed, and a second region in which an insulating film is exposed, supplying, to the substrate, an organic compound containing, in a head group, a triple bond between carbon atoms represented by Chemical Formula (1) described in the specification, causing the organic compound to be selectively adsorbed in the first region among the first region and the second region, and cleaving the triple bond in the first region and forming a hydrophobic film having a honeycomb structure of carbon atoms through polymerization.
Owner:TOKYO ELECTRON LTD

Composition for treating semiconductor device, manufacturing method of modified substrate, manufacturing method of laminate, manufacturing method of electronic device, and compound

The present invention provides a composition for treating a semiconductor device, which is capable of forming a coating film having excellent ALD inhibition properties. The composition for treating a semiconductor device of the present invention contains a compound which has a specific functional group bonded or adsorbed to a substrate and has a carbon-carbon triple bond, and a solvent, in which the specific functional group is a basic functional group or an acidic functional group.
Owner:FUJIFILM CORP

An electrochemical device and an electronic device

This application provides an electrochemical device and an electronic device. The electrochemical device includes a negative electrode and an electrolyte. The negative electrode includes a negative electrode material layer, which comprises a silicon-based material. The silicon-based material includes silicon element, and the mass percentage of silicon element is 30% to 60% based on the total mass of the negative electrode material layer. The electrolyte comprises a compound of formula I and fluoroethylene carbonate, wherein R1 and R2 are each independently selected from substituted or unsubstituted C1 to C5 alkyl groups and substituted or unsubstituted C6 to C5 alkyl groups. 10 The aryl group; when substituted, the substituent in the alkyl or aryl group is a fluorine atom, and A is selected from carbon-carbon double bonds, carbon-carbon triple bonds, or nitrogen-nitrogen double bonds. By selecting compound of formula I as a pre-film additive and combining it with fluoroethylene carbonate, the long-term cycling stability and high-temperature storage performance of the electrochemical device are improved.
Owner:NINGDE AMPEREX TECHNOLOGY LTD

Isonitrile inhibitors in ald

Methods and apparatuses for using molecules having a carbon-nitrogen triple bond as inhibitors on metal-containing surfaces to selectively deposit dielectric material on a dielectric surface on a substrate surface having a metal-containing surface and a dielectric surface are provided. A method for processing substrates comprises providing a substrate having a first material and a second material thereon to a process chamber, exposing the substrate to an isonitrile inhibitor to adsorb onto the first material to inhibit deposition on the first material, and depositing a dielectric film on the second material.
Owner:LAM RES CORP

A method for preparing one-dimensional graphyne chain

The present invention discloses a method for preparing one-dimensional graphyne chains. In this method, a silver single crystal substrate with a (110) crystal plane is selected as a substrate. Precursor molecules, PBDA, are deposited onto the surface of the silver single crystal substrate via molecular beam epitaxy to obtain a self-assembled sample. This self-assembled sample is then gradually annealed to induce molecular polymerization, thereby obtaining one-dimensional graphyne chains connected by carbon-carbon triple bonds. This method provides a method for preparing one-dimensional graphyne chains with high scientific research value and broad application potential.
Owner:KUNMING UNIV OF SCI & TECH

Resist underlayer film-forming composition

A resist underlayer film-forming composition includes: a polymer; and a solvent, in which the polymer has, in a side chain, one or two or more polymerizable multiple bonds selected from the group consisting of a carbon-carbon double bond, a carbon-carbon triple bond, a carbon-nitrogen double bond, and a carbon-nitrogen triple bond.
Owner:NISSAN CHEM CORP

Silica microsphere and preparation method thereof

The invention provides a silicon dioxide microsphere and a preparation method thereof. The preparation method of the silicon dioxide microspheres comprises the following steps: carrying out first reaction on a first silane coupling agent and a second silane coupling agent to obtain a silane coupling agent containing a bridge group; mixing the silane coupling agent containing the bridge group with a first solution, adding an acid agent, and carrying out hydrolysis reaction; adding an alkaline agent into the solution after the hydrolysis reaction, and carrying out condensation reaction to obtain silicon dioxide microspheres; wherein a group contained in the first silane coupling agent comprises at least one of a carbon-carbon double bond, a carbon-carbon triple bond and an isocyanate group; the group contained in the second silane coupling agent comprises at least one of sulfydryl, amino, hydroxyl and epoxy group.
Owner:YONGJIANG LAB

Adsorbent material

PCT designated stageWO2026139827A1Physical chemistryPyrrolidine
An adsorbent material and a process for producing it adapted to capture carbon dioxide directly from a gaseous mixture comprising a carbonaceous substrate with at least one double or triple bond among carbon atoms to which at least one pyrrolidine ring is covalently bound are provided.
Owner:CARPECARBON SRL SOCIETA BENEFIT +1

Synthetic method for improving mechanical property of amidoxime resin

The invention relates to a synthesis method for improving the mechanical property of amidoxime resin, and belongs to the technical field of new material preparation. The method comprises the following steps: mixing a monomer containing carbon-nitrogen triple bonds, styrene, a dispersing agent, water, an initiator, a pore-foaming agent and a cross-linking agent to obtain a mixed material; sequentially carrying out first heat treatment and second heat treatment on the mixed material in a nitrogen environment to carry out suspension polymerization reaction to obtain an amidoxime resin precursor; mixing the amidoxime resin precursor, hydrazine hydrate and a first solvent to carry out a secondary cross-linking reaction to improve the cross-linking density and mechanical strength of an amidoxime resin skeleton so as to obtain a hydrazine hydrate modified highly-crosslinked precursor; and under a set pH condition, mixing the hydrazine hydrate modified highly-crosslinked precursor, hydroxylamine hydrochloride and a second solvent, and carrying out an amidoxime reaction to obtain the amidoxime resin.
Owner:ZHENGZHOU NON FERROUS METALS RES INST CO LTD OF CHALCO

Composition for resist underlayer film formation, resist underlayer film, method for forming resist pattern, and method for manufacturing semiconductor device

A composition for resist underlayer film formation, which contains a resin (G) having a complex structural unit and a solvent, the complex structural unit having a structural unit (A) having an aromatic ring, and a structural unit (B) having one or more carbon atoms, the resin (G) being a resin obtained by a reaction of generating a covalent bond between a carbon atom constituting the aromatic ring of the structural unit (A) and a carbon atom in the structural unit (B), the structural unit (A) containing a structural unit (A-I) containing at least a nitrogen atom and a carbon-carbon triple bond, the structural unit (B) containing a structural unit (B-I) having a non-aromatic hydrocarbon ring, the number of carbon atoms constituting the non-aromatic hydrocarbon ring of the structural unit (B-I) being 5 to 30.
Owner:NISSAN CHEM CORP

Alpha-hydroxyisobutyric acid ester compound and fragrance composition

A fragrance composition containing a compound represented by Formula (1) as an active ingredient:where in Formula (1), R1 represents a chain hydrocarbon group having from 7 to 20 carbons, and may be linear or branched, and a saturated group or an unsaturated group, and when R1 is an unsaturated group, R1 may have one or more carbon-carbon double bond(s) or carbon-carbon triple bond(s).
Owner:MITSUBISHI GAS CHEM CO INC

Electrolyte containing organic nitrile additive and application

The invention discloses an electrolyte containing an organic nitrile additive and application, and belongs to the field of lithium batteries. In particular to an organic nitrile electrolyte suitable for a high-voltage system, the electrolyte contains an organic nitrile substance, the molecular structure general formula of the nitrile substance is R-XC-CN, X is the number of hydrogen connected with carbon adjacent to a carbon-nitrogen triple bond, the number of the hydrogen is smaller than or equal to 1 (namely 0 or 1), and R-XC is a chain-shaped or annular organic group. By using the electrolyte containing the nitrile substance additive, the cycling stability of the electrolyte under high voltage can be obviously improved.
Owner:DALIAN INSTITUTE OF CHEMICAL PHYSICS CHINESE ACADEMY OF SCIENCES

A method for preparing powder coating for coiled steel

This invention discloses a method for preparing powder coatings for coiled steel, comprising the following steps: S1, weighing the following raw materials by mass percentage: linear polyester; epoxy resin; curing agent; diamond coating wax powder; leveling agent; benzoin; pigment; filler; by modifying the epoxy resin with polycarboxylic acid and further modifying it with sulfonyl chloride, the polarity of the coating can be increased due to the high reactivity and polarity of the sulfonyl group. When the sulfonyl group reacts with the benzene ring in the linear polyester, it leads to the destruction of structures such as conjugated double bonds or triple bonds, thereby increasing the polarity and chemical stability of the coating. The increase in polarity can change the intermolecular interaction forces, increase the regularity and order of the molecules, and the increase in chemical stability can inhibit the occurrence of chemical reactions, thereby reducing the reaction of electron transitions on π→π orbitals, avoiding the problems of yellowing and degradation caused by transition reactions under ultraviolet radiation, and improving the anti-aging effect of the coating.
Owner:ZHANGJIAGANG JIANGNAN POWDER COATING

Resin, photosensitive resin composition and cured product thereof, and electronic component and display device using the cured product

The present invention addresses the problem of providing a resin which is advantageous in terms of dielectric constant, water absorption, and heat resistance. In order to solve the problem, the present invention provides a resin having at least a repeating unit represented by formula (1) and a repeating unit represented by formula (2), the repeating unit represented by formula (1) being 30 mol% or more but less than 100 mol% when all repeating units contained in the resin are taken as 100 mol%. (R1 represents a hydrogen atom or a methyl group) (X1 represents-O-or-NH-, and Y1 represents a monovalent organic group having 2-30 carbon atoms and having a carbon-carbon double bond or a carbon-carbon triple bond)
Owner:TORAY INDUSTRIES INC

Fermentation material

The present invention relates to a spray-dried fermentation material comprising at least 8 wt.% of acetylated derivatives of sphingosine base of formula (1) wherein R1 is a C11-C24 hydrocarbyl group, which may be saturated or contain one or more double bonds and / or triple bonds, and / or which may contain one or more functional groups, preferably selected from the group consisting of hydroxyl groups, R2 is hydrogen or-OH, the bond may be a double bond or a single bond when R2 is hydrogen or a single bond when R2 is-OH, and wherein the acetylated derivative of the sphingosine base comprises a mixture of triacetylated and diacetylated derivatives of the sphingosine base in a corresponding ratio of about 1: 0.2 to about 0.2: 1. A method of producing the spray-dried fermentation material and cells capable of fermenting the acetylated derivative of sphingosine base are disclosed.
Owner:CATAYA BIO (SHANGHAI) CO LTD

A pyrazole bridged phosphine ligand, its binuclear complex and application thereof

The application discloses a pyrazole bridged phosphine ligand, a binuclear complex thereof and application, and belongs to the field of metal organic synthesis, and a structural formula of the pyrazole bridged phosphine ligand is shown as formula (4), wherein R1 is selected from hydrogen, a substituted or unsubstituted alkyl, a substituted or unsubstituted alkoxy, a substituted or unsubstituted aromatic group or an aromatic group derivative, and R2 is selected from a substituted or unsubstituted aromatic group or an aromatic group derivative. The ligand has higher electron density at a metal center, so that a pi backbonding is more easily formed, and thus activation of a double bond and a triple bond small molecule is more favorable. In addition, the application further provides a D3-pz-D3 type binuclear complex with the pyrazole bridged phosphine ligand as a ligand, which can be applied to alkyne polymerization, and catalytic reaction conditions are mild and economic efficiency is better.
Owner:SHANGHAI TECH UNIV

Chemical solution, method for treating object to be treated, and method for producing semiconductor device

The present invention provides chemical solution which is capable of selectively removing a silicon germanium-containing material having a high germanium concentration from an object to be treated containing two kinds of silicon germanium-containing materials that have different compositions. The present invention also provides a method for treating an object to be treated and a method for manufacturing a semiconductor device using the chemical solution. Chemical solution according to the present invention is used for an object to be treated containing two silicon-germanium-containing materials that have different germanium concentrations, and removes at least a portion of one of the silicon-germanium-containing materials that has a high germanium concentration. This chemical solution contains a fluoride ion source, an oxidizing agent, a specific unsaturated compound that has a double bond or a triple bond, and water.
Owner:FUJIFILM CORP

Phenolic active ester epoxy resin curing agent as well as preparation method and application thereof

PendingCN121045483APolymer scienceMethacryloyl chloride
The invention discloses a phenolic active ester epoxy resin curing agent and a preparation method and application thereof, and belongs to the technical field of epoxy resin curing agents. The specific scheme is as follows: the phenolic active ester epoxy resin curing agent is a polymer containing a phenolic skeleton, and the polymer is obtained by acylating a phenolic resin polymer; an acylation reagent used for acylation comprises any one of an acryloyl chloride acylation reagent, a methacryloyl chloride acylation reagent, an aromatic alkenyl acyl chloride acylation reagent and an aromatic alkynyl acyl chloride acylation reagent. Double bonds or triple bonds are introduced into the polymer through alkenyl and alkynyl acyl chloride, the crosslinking density is increased, and then the mechanical property and thermal property of the polymer are improved. The phenolic resin reacts with an acylation reagent containing unsaturated bonds to prepare the epoxy resin curing agent which has the advantages of good heat resistance, heat and humidity resistance, low hygroscopicity and good binding force with metal.
Owner:HARBIN ENG UNIV

A phosphorus-based material hybrid polymer coating, and a preparation method and application thereof

The application belongs to the field of high polymers and provides a phosphorus-based material hybrid polymer coating. The phosphorus-based material hybrid polymer coating comprises the following components in parts by weight: 80-105 parts of resin, 2-10 parts of phosphorus-based material photoinitiator, 1-5 parts of photoinitiator, and 1-2 parts of leveling agent, wherein the resin comprises unsaturated double / triple bonds and acrylate units. In the application, a long-acting super-hydrophilic polymer heterogeneous network coating of phosphorus-based material hybrid is designed and prepared by constructing P-C bonds under UV curing. Unlike physical blending, the covalent P-C bonds between the phosphorus-based material and the polymer are generated through UV-induced radical reaction, resulting in the phosphorus-based material being firmly embedded in the polymer structure. The migration of the phosphorus-based material is regulated by UV, so that the phosphorus-based material is enriched on the surface of the coating. The phosphorus-based material can effectively prevent water from penetrating into the coating by its good water absorption capacity.
Owner:SHENZHEN INST OF ADVANCED TECH CHINESE ACAD OF SCI

A process for the preparation of 1,2-benzisoxazole

This application provides a method for preparing 1,2-benzisoxazole derivatives. This method is the first to develop a C-H activation strategy for generating 1,2-benzisoxazole using N-phenoxyamide as a substrate and acetic halide as a coupling agent under rhodium(III) catalysis. Under inert solvent conditions, and with the combined action of a transition metal catalyst and an oxidant, the acetic halide undergoes ortho-C-H bond alkynylation under the guidance of N-phenoxyamide, followed by intramolecular amine metallation of the carbon-carbon triple bond of the acetic acid. Finally, under the action of a base, deacylation and β-OH elimination occur, yielding a multifunctional 1,2-benzisoxazole derivative. Currently, the synthesis of 1,2-benzisoxazole remains challenging due to the scarcity of synthetic methods and limitations on specific substrates (multi-step synthesis, poor functional group compatibility, etc.). This reaction is expected to provide a new approach for the development and application of 1,2-benzisoxazole derivatives. It should be noted that the obtained product can also be applied to hole transport materials for perovskite solar cells. Specifically, a donor-acceptor structure is formed by combining a triphenylamine group with excellent hole transport capability and a benzoxazole group that can act as an electron acceptor. This molecule achieves a power conversion efficiency of 16.01%.
Owner:KANGLONG CHEM (TIANJIN) PHARM PREPARATION

Methods and materials for enhanced barrier performance and reduced via resistance

Embodiments of the disclosure relate to methods and materials for forming barrier layers with enhanced barrier performance and / or reduced via resistance. Some embodiments of the disclosure provide methods for passivating a metal surface by exposing the metal surface to a metal complex comprising an organic ligand with at least three carbon atoms and a double or triple bond that eta bonds with a central metal atom. Some embodiments provide barrier layers within vias which enable a reduction in resistance of at least 25% as a result of thinner barrier layers with equivalent barrier properties.
Owner:APPLIED MATERIALS INC

A pharmaceutical composition for effectively preventing deactivation and enhancing the targeting activity of SN triple-bond compounds, and a method for preparing the same

The pharmaceutical composition capable of effectively preventing deactivation and enhancing targeting activity of SN triple-bond structured compound, comprises an SN triple-bond structured compound, a stabilizer protectant, and a pharmaceutical excipient. The pharmaceutical composition of the present disclosure can ensure that the SN triple-bond structured compound is located in the environment lacking proton and water and being hydrophobic, improve its targeting ability and acid avoidance properties, and avoid its reaction with other easy-to-react reactants, thus laying the foundation for applying the pharmaceutical composition to medications for resisting tumors and the like.
Owner:SHANGHAI JZIY BIOTECHNOLOGY CO LTD

Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium

We provide fluorinated ether compounds that can form a lubricating layer with excellent wear resistance even when thin, and with minimal reduction in film thickness due to shedding. The fluorinated ether compound is represented by the following formula: R 1 -R 2 -O-CH2-R 3 -CH2-O-R 4 -R 5 (R 3 It is a perfluoropolyether chain. R 1 and R 5 R can be any of the following: alkyl groups that may have substituents, or hydrocarbon groups that have double or triple bonds. 2 and R 4 Each is a divalent linker containing one or more heteroatoms, has one or more polar groups, and is associated with R. 1 and R 5 The terminal part of the bonding side is a heteroatom. R 2 and R 4 At least one of them contains more than one secondary amine structure. R 1 -R 2 - and -R 4 -R 5 (At least one of them has one or more cyano groups).
Owner:RESONAC CORP

A low-concentration colloidal palladium activating solution, its preparation method and application

PendingCN122279553ADodecaneAlkoxy group
This invention discloses a low-concentration colloidal palladium activation solution, its preparation method, and its applications. The solution comprises 0.02-0.08 g / L palladium chloride, 20-60 ml / L hydrochloric acid, 100-150 g / L sodium chloride, 150-250 g / L tin salt, 1-10 g / L tannic acid (antioxidant), 0.5-5 g / L alkoxy ethers containing carbon-carbon triple bonds (wetting agent), 0.1-1 g / L dodecylpyridine chloride (charge adjuster), and the balance deionized water. The preparation method involves stepwise dissolution, high-temperature reaction under carbon dioxide protection, and high-pressure homogenization. The final product's colloidal particle size is controlled to be D90≤40 nm, D50≤20 nm, and the Zeta potential is between -50 and -40 mV. This invention combines specific formulations, preparation processes, and strict physical property indicators, enabling colloidal palladium activation solutions to possess both excellent stability and catalytic activity at extremely low palladium content (≤50ppm), making them applicable to horizontal production lines. Moreover, it is low-cost, simple in process, and can be mass-produced.
Owner:SHANG RUIYUAN CHEM TECH