The invention discloses a preparation method for a HfS2
single crystal nanosheet, and belongs to the field of preparation of
semiconductor materials. The method comprises the following steps: (1) putting an S source and an Hf source in an upstream area of a
quartz tube, placing an embedded
quartz tube of which an inner
diameter is smaller than that of the
quartz tube in a downstream area, and placing a
mica substrate into the embedded quartz tube; (2) performing vacuumizing on the interior of the quartz tube, introducing an
inert gas to make pressure in the tube keep an
atmospheric pressure environment, and introducing a carrier gas flow and a protective gas; and 3) heating the S source and the Hf source to
evaporation, performing a reaction for 5-15 minutes under conditions that the temperature is 800-980 DEG C, a distance d between the
mica substrate and the lower wall of the embedded quartz tube is 0.5-2.5mm, performing natural cooling on the quartz tube to a
room temperature, and taking out the substrate. According to the invention, parameters such as the distance d between the
mica substrate and the lower wall of the embedded quartz tube and a
deposition temperature are optimized, thus controllable growth of the HfS2
nanosheet with a thickness of 0.8-15nm and a side length of about 5 micrometers is realized.