The application discloses a nano-imprint alignment
processing method and device, wherein the method comprises the following steps: obtaining pictures of a template and a
wafer which are stacked in a nano-imprint process and are photographed by an alignment camera; extracting a first sub-picture and a second sub-picture from the pictures, wherein the first sub-picture comprises a first alignment mark and the second sub-picture comprises a second alignment mark; determining a plane included angle between a plane where a camera coordinate
system is located and a plane where a specified coordinate
system is located based on the first sub-picture; calculating coordinates of the second alignment mark in the specified coordinate
system according to coordinates of the second alignment mark in the camera coordinate system, the plane included angle, an installation inclination angle and an
offset distance; and determining an alignment deviation of the
wafer and the template according to the coordinates of the second alignment mark in the specified coordinate system and coordinates of the first alignment mark in the specified coordinate system. By using the above method, the
wafer and the template can be precisely aligned, the alignment method is simplified, and the alignment cost is reduced.