9 results about "Oxygen plasma etching" patented technology

The invention discloses a corrosion-resistant composite material for an industrial ton bag and a preparation method of the corrosion-resistant composite material. The preparation method of the composite material comprises the following steps: firstly, carrying out plasma activation treatment on polypropylene fibers to improve the surface activity of the polypropylene fibers, then immersing the polypropylene fibers into a graphene oxide dispersion liquid, carrying out drying and heat setting to form a graphene reinforced support layer, and then carrying out plasma etching through carbon tetrafluoride and oxygen to construct a micro-nano dual-scale structure on the surfaces of the fibers so as to obtain the graphene reinforced composite material. And finally, performing high-pressure emulsification on fluorinated polyolefin emulsion containing polyethylene, fluoroelastomer, nano silicon dioxide and the like, blade-coating the surface of the fiber with the emulsified fluorinated polyolefin emulsion, and performing hot-pressing compounding. Through multi-layer synergistic modification, the mass change rate of the composite material in a strong acid and strong alkali environment is lower than 1%, the strength retention rate exceeds 89% after ultraviolet aging for 500 h, the peel strength reaches 8.2 N / 25 mm, the composite material has excellent corrosion resistance, aging resistance and interface bonding force, and the service life of the ton bag in a severe environment is effectively prolonged.

A method for preparing porous diamond is disclosed, aiming to address the problems of high cost and low efficiency in existing methods for preparing porous diamond. The preparation method includes: 1. Cleaning the diamond and then pre-treating it by hydrogen-oxygen plasma etching at 900-950℃; 2. Sequentially depositing a titanium film and an iron film onto the diamond using magnetron sputtering; 3. Placing the titanium-iron film-coated diamond in an MPCVD device, increasing the gas pressure and power, and performing metal-catalyzed hydrogen-oxygen plasma etching at 950-1000℃; 4. Immersing the etched diamond in a mixed acid solution for high-temperature acid washing. This invention directly prepares a porous structure on the diamond surface, resulting in a denser and more uniform porous structure with a three-dimensional etched structure. The diameter of ordinary pores in the porous structure is approximately 1-20 μm, and the diameter of macropores is approximately 50 μm or more, significantly increasing the specific surface area of ​​the diamond.

The disclosure describes optical elements including pseudorandom-shaped meta-atoms as well as related methods of manufacture. In some implementations, a method includes patterning a resist layer to form a pattern of features in the resist layer. The resist layer is disposed on a substrate that includes an optical sublayer disposed on a support. The substrate further includes a hard mask sublayer disposed on the optical sublayer. The method includes performing a first oxygen plasma etch to impart a pseudorandom shape to the features in the resist layer, and subsequently performing a plurality of etching operations to cause the pseudorandom-shaped features to be transferred into the optical sublayer of the substrate.

The invention relates to a super-hydrophobic acid and alkali resistant fabric and a processing method thereof, the processing method comprises fabric pretreatment and surface modification treatment, the fabric pretreatment is to perform oxygen plasma etching on the fabric; the surface modification treatment is plasma surface activation-impregnation-plasma induced crosslinking treatment, and chemical bond fracture and reconstruction occur on the surfaces of the fabric and the modified material under the action of plasma, so that surface activation of the acid and alkali resistant nano material, chemical bond combination between the fabric and the nano material and crosslinking polymerization of silicon resin are realized; on one hand, the nanoparticles can be better dispersed in the silicon resin, and on the other hand, the interface bonding strength between the fabric and the nanoparticles can be improved. The process is reasonable in design and simple to operate, and the prepared fabric not only has excellent low surface energy and is endowed with good droplet adhesion resistance, but also has good acid and alkali resistance and corrosion resistance, can be applied to multiple protection fields, and has high practicability.

The application belongs to the technical field of electrohydrodynamic jet printing, and discloses a high-profile insulating substrate single-electrode high-resolution electrohydrodynamic jet printing method, a high-resolution functional pattern and application of the high-resolution functional pattern. The method comprises the following steps: S1, cleaning an insulating substrate, and then placing the insulating substrate in an oxygen plasma etching machine to perform surface hydroxylation; S2, preparing a metal oxide nanolayer on the surface of the hydroxylated insulating substrate; and S3, printing a high-resolution functional pattern on the surface of the insulating substrate covered with the metal oxide nanolayer by using an electrohydrodynamic jet printing technology. The application can solve the problem of instability of an electrohydrodynamic jet on a high-insulation non-planar substrate, and realize jet printing preparation of a functional pattern on a planar or curved insulating substrate.

The application discloses a preparation process of a bamboo fiber-based light-conversion light-suppression weed-degradation mulching film, and belongs to the technical field of agricultural environmental protection materials. The mulching film adopts a double-layered structure, wherein an upper layer is a spectrum-selective light-conversion light-suppression layer, and a lower layer is a water-retention controllable degradation layer. The bamboo fiber is subjected to composite treatment of alkali activation and oxygen plasma etching, a light-triggered Schiff base crosslinking system and a benzoxazine-titanium dioxide hybrid light conversion body are introduced, and the film is prepared through a layered flow casting-in-situ ultraviolet light crosslinking composite process. The application realizes the physical weed suppression and light-conversion light-promotion synergy without herbicides, the mulching film can be fully degraded in soil, the mechanical properties and degradation period of the film are adapted to the use requirements of crops in the field, and the problems of white pollution of traditional mulching films, dependence on chemical agents for weed suppression and single function are solved.

The application belongs to the technical field of semiconductor optoelectronic devices and micro-nano processing, and particularly relates to an axial micro-column array heterojunction photodetector chip and a preparation method thereof. The specific method is as follows: on a substrate with a bottom electrode, a perovskite layer and an organic semiconductor layer are formed by spin coating and heat treatment in sequence; a sacrificial layer and a UV glue layer are spin coated on the organic semiconductor layer in sequence; the UV glue layer is imprinted by using a PDMS elastic template with a micro-hole array, the template is removed after ultraviolet exposure and curing, and a UV glue micro-column array is obtained; a UV glue micro-hole array mask is formed by oxygen plasma etching, and the pattern is transferred to the sacrificial layer; a metal layer is evaporated, and a metal dot array mask is formed on the surface of the organic semiconductor layer by a stripping process; the metal dot array mask is used as an etching mask, two-step ICP reactive ion etching is carried out by using different etching gases, the organic semiconductor layer and the perovskite layer are etched in sequence, and the bottom electrode is exposed, so that an axial micro-column array heterojunction is finally formed.

A method for treating paper substrates to impart double-sided properties using plasma-enhanced chemical vapor deposition (PECVD) and plasma etching. The method involves receiving a paper substrate and performing a PECVD treatment on one side with a coating of hexamethyldisiloxane or ganoin under atmospheric pressure. The opposite side undergoes an oxygen plasma etching treatment. This dual treatment results in the paper substrate having a hydrophobic coating on one side and enhanced biodegradability on the other. The resulting biomaterial offers an environmentally sustainable packaging solution by combining moisture resistance and degradability within a single substrate. Classes: B65D and C08J

The invention discloses a long-life spatial mechanism lubricating film with a reservoir structure and a preparation method of the long-life spatial mechanism lubricating film, and belongs to the technical field of surface treatment. The long-life space lubrication film with the reservoir structure comprises a magnetron sputtering Ti base layer, a magnetron sputtering composite plasma-assisted chemical vapor deposition Ti-DLC gradient layer, a plasma-assisted chemical vapor deposition undoped hydrogen-containing DLC functional layer, an oxygen plasma etching micro-pattern layer and a magnetron sputtering Ti / MoS2 layer which are sequentially designed on the surface of a substrate. The long-life space lubrication film with the reservoir structure has high hardness and space environment lubrication performance, and the DLC serving as a bottom functional layer of a whole film system can remarkably improve the bearing capacity and wear resistance of the film in a heavy load environment. The micro-pattern of a reservoir with proper density and shape is etched on the DLC film, so that the macro-mechanical property of the DLC film is not damaged, and the micro-pattern can be used as a storage of the MoS2 lubricating film.