Manufacturing method of surface-enhanced Raman scattering (SERS) substrate

A surface-enhanced Raman and substrate technology, applied in the field of Raman spectroscopy, achieves large specific surface area, improved effect, and reduced light reflectivity

Inactive Publication Date: 2015-12-09
INST OF ELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
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Although this patent utilizes plasma treatment, it only uses the etchi...

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  • Manufacturing method of surface-enhanced Raman scattering (SERS) substrate
  • Manufacturing method of surface-enhanced Raman scattering (SERS) substrate
  • Manufacturing method of surface-enhanced Raman scattering (SERS) substrate

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Embodiment Construction

[0028] The invention can realize the adjustment of the metal nanorod gap by adjusting the oxygen plasma etching treatment time and the sputtering metal thickness; the adjustment of the metal nanorod diameter can be realized by changing the sputtering thickness.

[0029] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0030] In the first exemplary embodiment of the present invention, a method for preparing a surface-enhanced Raman scattering substrate is provided. Figure 1A It is a flowchart of a method for preparing a surface-enhanced Raman scattering substrate according to an embodiment of the present invention. Such as Figure 1A As shown, the preparation method of the surface-enhanced Raman scattering substrate in this embodiment includes:

[0031] Step A: Fabricate a pol...

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Abstract

The invention provides a manufacturing method of a surface-enhanced Raman scattering (SERS) substrate. The manufacturing method comprises the following steps: A, acquiring a high-molecular polymer film, wherein the high-molecular polymer film is made of a high-molecular polymer material which can be subjected to oxygen plasma etching; B, performing oxygen plasma etching treatment on the high-molecular polymer film to form nanorod arrays which are arranged vertically upwards; and C, covering the surfaces of the nanorod arrays with a metal layer having SERS activity to form metal nanorod arrays which are arranged upwards in order to finish manufacturing of the SERS substrate. In the method, the sizes and gaps of metal nanorods can be controlled at a nanoscale, so that the manufactured SERS substrate has a large specific surface area; the adsorption of molecules to be tested is facilitated; and the reduction of luminous reflectance and intercoupling of electric fields among the metal nanorods are facilitated. Thus, the Roman scattering enhancing effect can be enhanced greatly through the SERS substrate.

Description

technical field [0001] The invention relates to the technical field of Raman spectroscopy, in particular to a method for preparing a surface-enhanced Raman scattering substrate. Background technique [0002] Surface-enhanced Raman scattering (SERS), as an analytical technique, has important application potential in chemical analysis and biological detection. The substrate with higher enhancement effect, lower detection limit and better consistency is the basis for its application. [0003] At present, the widely recognized SERS enhancement mechanisms mainly include electromagnetic enhancement and chemical enhancement, and electromagnetic enhancement is the main reason. The effect of electromagnetic enhancement mainly depends on the surface plasmon oscillation of the metal, so the surface structure with rough structure and electric field coupling between metal particles is most suitable for SERS substrates. [0004] Utilizing silicon and aluminum to prepare rough structures...

Claims

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Application Information

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IPC IPC(8): B81C1/00
Inventor 范祥祥何秀丽高晓光贾建李建平
Owner INST OF ELECTRONICS CHINESE ACAD OF SCI
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