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2288 results about "Carbon deposit" patented technology

Method for preparing alcohols by selectively hydrogenating aldehydes

The invention relates to a method for preparing alcohols by selectively hydrogenating aldehydes, belonging to hydrogenation technologies. In order to meet the requirements of people on two aspects, i.e. the improving of the selectivity on preparing the alcohols by hydrogenating the aldehydes and the prolonging of the service life of a catalyst currently, the method proposes that: the aldehydes are taken as raw materials; the reaction temperature is 20-300 DEG C; the reaction pressure is 0.1-7.0 MPa; the weight space velocity of the aldehydes is 0.02-20 h<-1>; the aldehydes and hydrogen gas are in contact with a hydrogenation catalyst; and the aldehydes are produced into corresponding alcohols through selectively hydrogenating. In the method, the hydrogenation catalyst comprises a carrier, a metal active component and silane groups; the silane groups are grafted through a silylanizing treatment; and the content of the silane groups in the total weight of the catalyst is 0.05 wt% to 25 wt%. Compared with the existing method, with the adoption of the catalyst in the method provided by the invention, the selectivity is high, the amount of byproducts, such as ethers, esters and acetals is greatly lowered; and meanwhile, the generation amount of carbon deposit is little, so that the catalyst has longer service life.
Owner:CHINA PETROLEUM & CHEM CORP +1

Starting method of reaction-regenerative device for preparing low carbon olefin form methanol

The invention relates to a starting method for a reaction-regeneration device which uses methanol to prepare low-carbon olefin, mainly comprising the following steps: a. using an auxiliary combustion chamber to heat air, and then entering the reaction-regeneration device; heating the dense phase temperature of a regenerator to 400-600 DEG C, and heating the temperature of a reactor reaction zone to 150-350 DEG C; b. switching the catalyst from a catalyst storage tank into the regenerator, and injecting the combustion oil to maintain the temperature of the regenerator; c. switching the catalyst from the regenerator into the reactor, and establishing reaction catalyst circulation between the reactor and the regenerator; d. heating the reactor reaction zone to a temperature not less than 350 DEG C, and putting the raw materials containing the methanol in the reactor to contact with the catalyst so as to generate the products containing low-carbon olefin and also form a carbon deposit on the catalyst; e. stop injecting combustion oil to the regenerator; f. stop using the auxiliary combustion chamber. The method has short starting period and light catalyst damage degree, which can be used for low-carbon olefin industrial production.
Owner:CHINA PETROLEUM & CHEM CORP +1

Deposited carbon cleaning agent for internal-combustion engine

The invention discloses a deposited carbon cleaning agent for an internal-combustion engine, which relates to an environmentally-friendly, safe and resource saving carbon deposit cleaning agent and comprises the following matters: 5 to 16 weight percent of polyoxyethylene ether surfactant, 5 to 10 weight percent of emulsifier, 0 to 5 weight percent of inorganic alkali, 0 to 4 weight percent of corrosion inhibitor and 65 to 90 weight percent of water. In the invention, the polyoxyethylene ether surfactant is used to soften the deposited carbon to make the attached deposited carbon loose and deformed; the emulsifier makes liquid penetrate the contact parts between the deposited carbon and parts easily, so that the deposited carbon can be stripped and the softening and cleaning effects of the product on the deposited carbon stains are improved; the inorganic alkali can decompose part of lipoid substance in the deposited carbon, so the cleaning effect is improved; and the corrosion inhibitor can reduce the corrosion of the parts in the cleaning process. The cleaning agent has excellent washing effect on deposited carbon on parts made of various materials. The cleaning agent uses water as a solvent instead of toxic solvent such as benzenes, phenol aromatic hydrocarbons and halogenated hydrocarbon. The prepared deposited carbon cleaning agent for the internal-combustion engine has the advantages of low cost, high detergency, quick deposited carbon removal and good effect.
Owner:YANGZHOU POLYTECHNIC INST

Method for preparing p-xylene and co-producing light olefins by toluene and methylating reagent

The invention relates to a fluidized bed reaction method for preparing para-xylene and coproducing low-carbon olefin with high selectivity by reacting toluene and a methylated reagent. The method adopts fluidized bed reaction technology and uses a catalyst to highly selectively produce the para-xylene and simultaneously highly selectively coproduce ethylene and propylene. The method is characterized in that the raw materials, namely the toluene and the methylated reagent enter a vaporizer for mixing and gasification, pass through a distribution plate, enter a fluidized bed reactor, and are taken as a fluidizing medium and subjected to catalysis with a fluidized catalyst; and gaseous mixture products after reaction are exhausted from the top of a tower and separated. The selectivity of the para-xylene in products in a xylene isomer is more than 99 weight percent, and the selectivity of the ethylene and the propylene in low-carbon hydrocarbon between C1 and C5 is more than 90 weight percent. The carbon deposit catalyst in the reactor continuously enters a regenerator for regeneration and activation and enters the reactor for recycling, can be continuously regenerated and has stable activity; and the method has simple technological flow and is easy to realize large-scale industrialization.
Owner:DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI

Ultra quick quenching oil and preparation method thereof

InactiveCN102212662AFast coolingFast medium temperature cooling speedQuenching agentsPolybutyleneAntioxidant
The invention relates to ultra quick quenching oil and a preparation method thereof. The ultra quick quenching oil comprises the following raw materials in percentage by weight: 80 to 97 percent of refined mineral oil, 1 to 10 percent of cooling catalyst, 1 to 5 percent of antioxidant and 1 to 6 percent of anionic surfactant. The kinematic viscosity of the refined mineral oil at the temperature of 40 DEG C is 6 to 9 mm<2>/s; the cooling catalyst is a mixture of oily phenolic resin and polybutylene; the antioxidant is alkylated diphenylamine; and the anionic surfactant is petroleum sodium sulfonate. The preparation method of the ultra quick quenching oil is simple and convenient; the obtained quenching oil has the advantages of ultra high cooling speed, good thermal oxidation stability, long service life and continuous and stable property retention; little peculiar smell, smog and carbon deposit are produced, and the take-out consumption of a workpiece is low; and after the workpiece is quenched by adopting the quenching oil, the workpiece has the advantages of high and uniform surface hardness, deep quenching layer, low deformation, metallographic structure, good mechanical property and good brightness, the surface of the workpiece does not become black, and the workpiece is easily cleaned.
Owner:上海德润宝特种润滑剂有限公司

Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography

A method for fabricating a sub-micron structure of etch-resistant metal / semiconductor compound on a substrate of semiconductor material comprises the step of depositing onto the substrate a layer of metal capable of reacting with the semiconductor material to form etch-resistant metal / semiconductor compound, and the step of producing a focused electron beam. The focused electron beam is applied to the layer of metal to locally heat the metal and semiconductor material and cause diffusion of the metal and semiconductor material in each other to form etch-resistant metal / semiconductor compound. The focused electron beam is displaced onto the layer of metal to form the structure of etch-resistant metal / semiconductor compound. Finally, the layer of metal is wet etched to leave on the substrate only the structure of metal / semiconductor compound. Following wet etching of the layer of metal, an oxygen plasma etch can be conducted to remove a carbon deposit formed at the surface of the structure of etch-resistant metal / semiconductor compound. Also, the substrate may be subsequently etched to remove a thin layer of metal rich semiconductor material formed at the surface of the substrate by reaction, at room temperature, of the metal and semiconductor material with each other.
Owner:SCOPRA SCI & GENIE SEC
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