Polymer plane nano-channel production method
A production method and polymer technology, which are applied in the fields of micro-nanofluidic chip manufacturing, analytical chemistry, medicine, and life sciences, can solve the problems of complex process and long production cycle, and achieve simple production process, low cost and short cycle. Effect
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[0016] Embodiments of the present invention will be described in detail below in conjunction with technical solutions and drawings. as attached figure 1 , 2 , 3, 4, 5 and 6, a layer of copper with a thickness of about 80nm is sputtered on the polymer substrate 1 using the JS3X-80B magnetron sputtering station produced by Beijing Chuangweina Technology Co., Ltd. Film 2; adopt the model of Delta 80RC produced by SUSS MicroTec Company in Germany to spin-coat a layer of positive photoresist produced by AZ ElectronicMaterials Company on the surface of the copper film and be the positive photoresist of AZ MiR701. / min, and pre-bake on a hot plate at 55°C for 1 hour, then cover the mask plate on the photoresist 3, and use the UV photolithography machine model MA / BA6 produced by SUSS MicroTec, Germany, to photoresist 3 Expose for 30 seconds, put it into the developer solution for development, and obtain a photoresist pattern a with a width of micron order, and put it on a hot plate ...
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