The present invention relates to a method for manufacturing an optical
system (100) of a lithographic apparatus (1), the optical
system (100) comprising an optical component (102) having an optically
effective surface (106) and a substrate (104). In the method, a) for the substrates (104', 204a, 204b, 204c) of one or more optical components (102, 202a, 202b, 202c), the zero-crossing temperature (ZCT', ZCT a 、ZCT b 、ZCT c ) of the coefficient of
thermal expansion (ρ') of the substrate (104', 204a, 204b, 204c) as a function of the location (r) of the substrate (104', 204a, 204b, 204c), and the normalized distribution functions (g, h a 、h b 、h c ) are each provided (step S2); b) for each of the provided distribution functions (g, h a 、h b 、h c ) and a plurality of mutually different predetermined average zero-crossing temperatures (M j ), the imaging error (F i ) of the optical
system (102) is calculated by computer implementation respectively (step S3); c) among the plurality of average zero-crossing temperatures (M j ), at least one selected average zero-crossing temperature (M i ) for the substrate (104) of the optical component (102) to be manufactured is specified as the one for which the calculated imaging error (F aw ) is less than a predetermined threshold value (SW) (step S4).